Abstract: Systems and methods that allow robots to perform tasks for users are provided. A robot may comprise one or more robotic arms and/or a mobile base. The arms may be controlled by electric actuators and may have six or more degrees of freedom. The robot may have sensors which can be accessed remotely. Robots may have varying levels of autonomy, including, for example, full teleoperation (in which a human can have detailed control over the robot) or full autonomy (in which the robot can complete a task without any human intervention). Various entities can interact with individual robots or groups of robots over a network, locally, directly or in person, or any combination thereof. A management system can allow entities to control and/or monitor the robots.

Abstract: A remote control has a physical subsystem and a graphical subsystem. The physical subsystem has a hardware command processor and one or more physical input devices. The hardware command processor determines an input for an audio command based on activation of the one or more physical input devices. Further, the hardware command processor translates the audio command into a format understood by an audio monitoring system. In addition, the hardware command processor sends the translated audio command to the audio monitoring system so that the audio monitoring system adjusts one or more audio output devices based on the audio command. The audio monitoring system is remotely situated from the physical subsystem. Further, the graphical subsystem has a display screen and a display processor rendering a graphical user interface on the display screen.

Abstract: System and method for single-action time and attendance record generation and processing via computing devices. The record is generated via a computing device (“Client System”) and received by a server system or other computing device (“Server System”). The user utilizes the Client System to execute a simultaneous or near-simultaneous process of authenticating his or her identity, recording time data and location data, and then sending this data to the server system.

Abstract: Novel systems and methods are disclosed for electronic key provisioning and access management in connection with mobile devices. The electronic keys can be time-denominated and event-denominated, thereby increasing the security and ease of use of access management for physical or virtual resources. The access management is granted in a protocol based on biometric features, contextual data, electronic keys, or a combination thereof.

Abstract: System and method for single-action time and attendance record generation and processing via computing devices. The record is generated via a computing device (“Client System”) and received by a server system or other computing device (“Server System”). The user utilizes the Client System to execute a simultaneous or near-simultaneous process of authenticating his or her identity, recording time data and location data, and then sending this data to the server system.

Abstract: Novel systems and methods are disclosed for electronic key provisioning and access management in connection with mobile devices. The electronic keys can be time-denominated and event-denominated, thereby increasing the security and ease of use of access management for physical or virtual resources. The access management is granted in a protocol based on biometric features, contextual data, electronic keys, or a combination thereof.

Abstract: Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

Abstract: Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

Abstract: Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

Abstract: Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

Abstract: Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

Abstract: Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

Abstract: Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

Abstract: Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

Abstract: Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

Abstract: Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

Abstract: Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding aspects of photolithographic process, preferences relating to resulting pattern (e.g. restriction to rectilinear patterns), robustness against process variations, as well as restrictions imposed relating to practical and economic manufacturability of photomasks.

Abstract: A system and associated methodology allow for monitoring ocular parameters of a patient. Parameters that may be monitored in this regard include ocular perfusion, retinal oxygen saturation and ocular pressure. In one implementation, a device for monitoring the desired parameters includes a contact lens with fiber optic pathways mounted thereon. Light of multiple wavelengths can be transmitted into the patient's eyes via input optical pathways. Output optical pathways are associated with a camera for obtaining images of an area of interest within the patient's eyes. The images can be processed to obtain information regarding ocular perfusion and/or oxygen saturation. Changes in this regard can be used to identify a condition of interest.

Abstract: A system and method for searching the Internet is presented wherein the search results are ordered and selected using one or more preference tools. One such tool consists of the user defining a reference index number that is employed to prioritize and re-rank at least some of the sites obtained by the search, comparing each site's parameters to the reference index number. Each index number includes several parameters in a preset order, each parameter being assigned a quantized relevance based on particular search criteria. Another tool makes use of at least one bundle of websites having particular user-settings designating credibility or trustworthiness. Websites from the search results are then accepted or ordered based on the contents of the bundles. Other tools adjust search criteria based on a desired number of search results and separate browser cookies into (1) those personally trusted and (2) all other cookies that are routinely purged.

Abstract: A method for determining a mask pattern to be used on a photo-mask in a photolithographic process is described. During the method, a target pattern that includes at least one continuous feature is provided. Then a mask pattern that includes a plurality of distinct types of regions corresponding to the distinct types of regions of the photo-mask is determined. Note that the mask pattern includes at least two separate features corresponding to at least the one continuous feature. Furthermore, at least the two separate features are separated by a spacing having a length and the spacing overlaps at least a portion of at least the one continuous feature.