Patents by Inventor Daniel Aubin

Daniel Aubin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Isolation of novolak resin by low temperature sub surface forced steam distillation
    Patent number: 6165675
    Abstract: A water insoluble, aqueous alkali soluble novolak resin, process for producing such a novolak resin, a photoresist containing such a novolak resin, and a method for producing a semiconductor device, wherein the resin is isolated by sub surface forced steam distillation.
    Type: Grant
    Filed: April 2, 1998
    Date of Patent: December 26, 2000
    Assignee: Clariant Finance (BVI) Limited
    Inventors: M. Dalil Rahman, Daniel Aubin
  • Image formation utilizing photosensitive compositions containing low metal content p-cresol oligomers
    Patent number: 5858627
    Abstract: Process for producing a photosensitizer comprising a diazo ester of a p-cresol oligomer where at least one of the hydroxy groups on the p-cresol ring has been esterified with diazo-sulfonyl chloride comprising from about 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride, or a mixture thereof; and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitive the photoresist composition, a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition, and a suitable solvent.
    Type: Grant
    Filed: August 29, 1997
    Date of Patent: January 12, 1999
    Assignee: Clariant Finance (BVI) Limited
    Inventors: M. Dalil Rahman, Dinesh N. Khanna, Daniel Aubin, Douglas McKenzie
  • Quinone diazide compositions containing low metals p-cresol oligomers and process of producing the composition
    Patent number: 5837417
    Abstract: Process for producing a photosensitizer comprising a diazo ester of a p-cresol oligomer where at least one of the hydroxy groups on the p-cresol ring has been esterified with diazo-sulfonyl chloride comprising from about 60 to 100 mole % 2,1,4 or 2,1,5-diazo sulfonyl chloride, or a mixture thereof; and a photoresist comprising an admixture of the photosensitizer, which is present in the photoresist composition in an amount sufficient to uniformly photosensitive the photoresist composition, a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition, and a suitable solvent.
    Type: Grant
    Filed: December 30, 1994
    Date of Patent: November 17, 1998
    Assignee: Clariant Finance (BVI) Limited
    Inventors: M. Dalil Rahman, Dinesh N. Khanna, Daniel Aubin, Douglas McKenzie
  • Isolation of novolak resin by low temperature sub surface forced steam distillation
    Patent number: 5750632
    Abstract: A water insoluble, aqueous alkali soluble novolak resin, process for producing such a novolak resin, a photoresist containing such a novolak resin, and a method for producing a semiconductor device, wherein the resin is isolated by sub surface forced steam distillation.
    Type: Grant
    Filed: December 30, 1994
    Date of Patent: May 12, 1998
    Assignee: Clariant Finance (BVI) Limited
    Inventors: M. Dalil Rahman, Daniel Aubin