Abstract: The invention provides a novel conductive film and a multilayered conductive structure, comprising a plurality of metal nanowires arranged in clusters and having an average aspect ratio of least 100,000, optionally decorated by metal nanoparticles. It is also disclosed a process for preparation of a conductive film comprising metal nanowires by surfactant/template assisted method which involves the use of a precursor solution based on surfactant (such as CTAB), metal precursor (such as HAuCl4 and AgNO3) and reducing agent (such as metal borohydride or sodium ascorbate).

Abstract: A conductive nanowire film having a high aspect-ratio metal is described. The nanowire film is produced by inducing metal reduction in a concentrated surfactant solution containing metal precursor ions, a surfactant and a reducing agent. The metal nanostructures demonstrate utility in a great variety of applications.

Abstract: A conductive nanowire film having a high aspect-ratio metal is described. The nanowire film is produced by inducing metal reduction in a concentrated surfactant solution containing metal precursor ions, a surfactant and a reducing agent. The metal nanostructures demonstrate utility in a great variety of applications.

Abstract: A conductive nanowire film based on a high aspect-ratio metal is disclosed. The nanowire film is produced by inducing metal reduction in a concentrated surfactant solution containing metal precursor ions, a surfactant and a reducing agent. The metal nanostructures demonstrate utility in a great variety of applications.

Abstract: The invention provides a novel conductive film and a multilayered conductive structure, comprising a plurality of metal nanowires arranged in clusters and having an average aspect ratio of least 100,000, optionally decorated by metal nanoparticles. It is also disclosed a process for preparation of a conductive film comprising metal nanowires by surfactant/template assisted method which involves the use of a precursor solution based on surfactant (such as CTAB), metal precursor (such as HAuCl4 and AgN03) and reducing agent (such as metal borohydride or sodium ascorbate).

Abstract: The invention provides a novel conductive film and a multilayered conductive structure, comprising a plurality of metal nanowires arranged in clusters and having an average aspect ratio of least 100,000, optionally decorated by metal nanoparticles. It is also disclosed a process for preparation of a conductive film comprising metal nanowires by surfactant/template assisted method which involves the use of a precursor solution based on surfactant (such as CTAB), metal precursor (such as HAuC14 and AgN03) and reducing agent (such as metal borohydride or sodium ascorbate).

Abstract: The invention provides a novel conductive film and a multilayered conductive structure, comprising a plurality of metal nanowires arranged in clusters and having an average aspect ratio of least 100,000, optionally decorated by metal nanoparticles. It is also disclosed a process for preparation of a conductive film comprising metal nanowires by surfactant/template assisted method which involves the use of a precursor solution based on surfactant (such as CTAB), metal precursor (such as HAuC14 and AgN03) and reducing agent (such as metal borohydride or sodium ascorbate).

Abstract: A conductive nanowire film based on a high aspect-ratio metal is disclosed. The nanowire film is produced by inducing metal reduction in a concentrated surfactant solution containing metal precursor ions, a surfactant and a reducing agent. The metal nanostructures demonstrate utility in a great variety of applications.