Abstract: Systems and methods utilizing RF energy to treat a patient's skin or other target tissues are provided herein. In various aspects, the methods and systems described herein can provide a RF-based treatment in which RF energy can be selectively controlled to facilitate heating uniformity during one or more of body sculpting treatment (lipolysis), skin tightening treatment (laxity improvement), cellulite treatment, all by way of non-limiting examples. In various aspects, the systems may include a flexible applicator comprising a plurality of layers, the plurality of layers comprises a first dielectric layer, a second dielectric layer, and a conductive layer, wherein the first dielectric layer and the second dielectric layer sandwich the conductive layer, the plurality of layers define a plurality of kerfs, an inner region and N regions extending from the inner region, wherein the plurality of kerfs divide the applicator into N regions.

Abstract: Systems and methods utilizing RF energy to treat a patient's skin or other target tissues are provided herein. In various aspects, the methods and systems described herein can provide a RF-based treatment in which RF energy can be selectively controlled to facilitate heating uniformity during one or more of body sculpting treatment (lipolysis), skin tightening treatment (laxity improvement), cellulite treatment, all by way of non-limiting examples. In various aspects, the systems may include a flexible applicator comprising a plurality of layers, the plurality of layers comprises a first dielectric layer, a second dielectric layer, and a conductive layer, wherein the first dielectric layer and the second dielectric layer sandwich the conductive layer, the plurality of layers define a plurality of kerfs, an inner region and N regions extending from the inner region, wherein the plurality of kerfs divide the applicator into N regions.

Abstract: Systems and methods utilizing RF energy to treat a patient's skin or other target tissues are provided herein. In various aspects, the methods and systems described herein can provide a RF-based treatment in which RF energy can be selectively controlled to facilitate heating uniformity during one or more of body sculpting treatment (lipolysis), skin tightening treatment (laxity improvement), cellulite treatment, all by way of non-limiting examples. In various aspects, the systems may include a flexible applicator comprising a plurality of layers, the plurality of layers comprises a first dielectric layer, a second dielectric layer, and a conductive layer, wherein the first dielectric layer and the second dielectric layer sandwich the conductive layer, the plurality of layers define a plurality of kerfs, an inner region and N regions extending from the inner region, wherein the plurality of kerfs divide the applicator into N regions.

Abstract: A method is disclosed including immersing electrodes disposed on a distal end of an electrosurgical wand, the immersing in a cavity defined within walls of a first material, the cavity comprising a conductive fluid different than the first material, and the electrodes comprising a first electrode and a second electrode. The method further includes applying a voltage across the first electrode and the second electrode, the first and second electrode spaced apart on the distal end of the wand such that the conductive fluid resides between the first and second electrodes. The method further includes measuring an impedance of the conductive fluid between the first and second electrodes; and determining temperature of the conductive fluid based on the measured impedance. The method further includes forming plasma proximate to an active electrode distinct from the first and second electrode, the plasma created based on voltage applied to the active electrode.

Abstract: Systems and methods utilizing RF energy to treat a patient's skin or other target tissues are provided herein. In various aspects, the methods and systems described herein can provide a RF-based treatment in which RF energy can be selectively controlled to facilitate heating uniformity during one or more of body sculpting treatment (lipolysis), skin tightening treatment (laxity improvement), cellulite treatment, all by way of non-limiting examples. In various aspects, the systems may include a flexible applicator comprising a plurality of layers, the plurality of layers comprises a first dielectric layer, a second dielectric layer, and a conductive layer, wherein the first dielectric layer and the second dielectric layer sandwich the conductive layer, the plurality of layers define a plurality of kerfs, an inner region and N regions extending from the inner region, wherein the plurality of kerfs divide the applicator into N regions.

Abstract: Continuous mass flow gas replenishment may be implemented in a gas lasing device, such as a gas laser or amplifier, by using a restrictive orifice to bleed one or more gases into a reservoir and/or discharge chamber of the gas laser or amplifier at a predefined mass flow rate. The mass flow rate is a function of the pressure drop across the restrictive orifice resulting from the pressure differential between the depleted gas and the source gas. Thus, gases may be added as needed such that the gas total pressure, as well as the constituent partial pressures, is maintained within a desired range throughout the laser or amplifier fill lifetime. The continuous mass flow gas replenishment may thus make up the lost partial pressure of reactive gases in gas lasing devices in a manner that is less complicated and is less expensive than other continuous flow methodologies.

Abstract: A pre-irradiation system and method may be used in a gas discharge lasing device to provide multiple ultraviolet (UV) pre-irradiation discharges per electrical feed-through into a gas discharge chamber of the lasing device. One or more high-voltage electrical feed-throughs are electrically connected to one or more high-voltage electrodes that provide multiple discharge paths to a current return electrode to allow multiple pre-irradiation discharges per feed-through in response to high-voltage pulses applied via the feed-through(s). The discharge paths may include spark gap discharge paths and/or tracking discharge paths across an insulator. In some embodiments, multiple discharge paths are formed between respective tracking locators on a high voltage electrode and/or a current return electrode. In other embodiments, multiple discharge paths are formed between respective discharge locations on a high voltage electrode surrounded by an insulator, which spark or track to a current return electrode.