Patents by Inventor Daniel Benz
Daniel Benz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9535336Abstract: A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.Type: GrantFiled: May 22, 2014Date of Patent: January 3, 2017Assignee: Carl Zeiss SMT GmbHInventors: Sascha Bleidistel, Yim-Bun Patrick Kwan, Florian Bach, Daniel Benz, Severin Waldis, Armin Werber
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Patent number: 9523922Abstract: An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.Type: GrantFiled: June 25, 2014Date of Patent: December 20, 2016Assignee: Carl Zeiss SMT GmbHInventors: Florian Bach, Daniel Benz, Severin Waldis, Armin Werber, Berndt Warm
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Publication number: 20140333912Abstract: A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.Type: ApplicationFiled: May 22, 2014Publication date: November 13, 2014Applicant: Carl Zeiss SMT GmbHInventors: Sascha Bleidistel, Yim-Bun Patrick Kwan, Florian Bach, Daniel Benz, Severin Waldis, Armin Werber
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Publication number: 20140307239Abstract: An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.Type: ApplicationFiled: June 25, 2014Publication date: October 16, 2014Inventors: Florian Bach, Daniel Benz, Severin Waldis, Armin Werber, Berndt Warm
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Patent number: 8797507Abstract: An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.Type: GrantFiled: March 9, 2011Date of Patent: August 5, 2014Assignee: Carl Zeiss SMT GmbHInventors: Florian Bach, Daniel Benz, Severin Waldis, Armin Werber, Berndt Warm
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Patent number: 8767176Abstract: A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.Type: GrantFiled: March 21, 2011Date of Patent: July 1, 2014Assignee: Carl Zeiss SMT GmbHInventors: Sascha Bleidistel, Yim-Bun Patrick Kwan, Florian Bach, Daniel Benz, Severin Waldis, Armin Werber
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Patent number: 8717531Abstract: A mirror serves for guiding a radiation bundle. The mirror has a basic body and a coating of a reflective surface of the basic body, the coating increasing the reflectivity of the mirror. A heat dissipating device serves for dissipating heat deposited in the coating. The heat dissipating device has at least one Peltier element. The coating is applied directly on the Peltier element. A temperature setting apparatus has at least one temperature sensor for a temperature of the reflective surface. A regulating device of the Temperature setting apparatus can be connected to the at least one Peltier element and is signal-connected to the at least one temperature sensor. The result is a mirror in which a heat dissipating capacity of the heat dissipating device is improved.Type: GrantFiled: February 18, 2010Date of Patent: May 6, 2014Assignee: Carl Zeiss SMT GmbHInventors: Severin Waldis, Florian Bach, Daniel Benz, Armin Werber, Wilfried Noell, Dirk Heinrich Ehm, Stefan Wiesner, Dieter Kraus
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Patent number: 8241019Abstract: A pump element includes a pump element housing defining a pump chamber having an inlet and an outlet, and at least a first movable element movable in the pump chamber between a first and a second position. During a movement of the first movable element in the direction from the first to the second position, a flow resistance of a flow path from the first movable element through the inlet is larger than a flow resistance of a flow path between the pump element housing and the first movable element. During a movement of the first movable element in the direction from the second position to the first position, a flow resistance of a flow path from the first movable element through the outlet is smaller than a flow resistance of the flow path between the pump element housing and the first movable element. Thus, during a reciprocating movement of the first movable element between the first and the second position, a net flow through the outlet takes place.Type: GrantFiled: March 27, 2007Date of Patent: August 14, 2012Assignee: Hahn-Schickard-Gesellschaft Fuer Angewandte Forschung e.V.Inventors: Heinz Kueck, Daniel Benz, Frank Wolter
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Publication number: 20110181852Abstract: A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.Type: ApplicationFiled: March 21, 2011Publication date: July 28, 2011Applicant: CARL ZEISS SMT GmbHInventors: Sascha Bleidistel, Yim-Bun Patrick Kwan, Florian Bach, Daniel Benz, Severin Waldis, Armin Werber
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Publication number: 20110181850Abstract: An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.Type: ApplicationFiled: March 9, 2011Publication date: July 28, 2011Applicant: CARL ZEISS SMT GMBHInventors: Florian Bach, Daniel Benz, Severin Waldis, Armin Werber, Berndt Warm
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Publication number: 20100261120Abstract: A mirror serves for guiding a radiation bundle. The mirror has a basic body and a coating of a reflective surface of the basic body, the coating increasing the reflectivity of the mirror. A heat dissipating device serves for dissipating heat deposited in the coating. The heat dissipating device has at least one Peltier element. The coating is applied directly on the Peltier element. A temperature setting apparatus has at least one temperature sensor for a temperature of the reflective surface. A regulating device of the Temperature setting apparatus can be connected to the at least one Peltier element and is signal-connected to the at least one temperature sensor. The result is a mirror in which a heat dissipating capacity of the heat dissipating device is improved.Type: ApplicationFiled: February 18, 2010Publication date: October 14, 2010Applicant: CARL ZEISS SMT AGInventors: Severin Waldis, Florian Bach, Daniel Benz, Armin Werber, Wilfried Noell, Dirk Heinrich Ehm, Stefan Wiesner, Dieter Kraus
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Publication number: 20090180905Abstract: A pump element includes a pump element housing defining a pump chamber having an inlet and an outlet, and at least a first movable element movable in the pump chamber between a first and a second position. During a movement of the first movable element in the direction from the first to the second position, a flow resistance of a flow path from the first movable element through the inlet is larger than a flow resistance of a flow path between the pump element housing and the first movable element. During a movement of the first movable element in the direction from the second position to the first position, a flow resistance of a flow path from the first movable element through the outlet is smaller than a flow resistance of the flow path between the pump element housing and the first movable element. Thus, during a reciprocating movement of the first movable element between the first and the second position, a net flow through the outlet takes place.Type: ApplicationFiled: March 27, 2007Publication date: July 16, 2009Inventors: Heinz Kueck, Daniel Benz, Frank Wolter