Patents by Inventor Daniel Bucca

Daniel Bucca has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Thermostet polymers from inorganic arylacetylenic monomers
    Patent number: 5807953
    Abstract: The present invention is a thermoset having the repeating unit: ##STR1## where R.sup.1 and R.sup.2 are independently selected from the group consing of hydrogen, unsubstituted alkyl groups, substituted alkyl groups, unsubstituted aryl groups, and substituted aryl groups, where Ae.sup.1 and Ae.sup.2 are independently selected groups with one or more unsaturated carbon-carbon bond and at least two crosslinking moieties, where Ar.sup.1 and Ar.sup.
    Type: Grant
    Filed: July 26, 1996
    Date of Patent: September 15, 1998
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Daniel Bucca, Teddy M. Keller
  • Inorganic arylacetylenic monomers
    Patent number: 5679818
    Abstract: The present invention is a compound having the formula:R.sup.1 --Ac.sup.1 --Ar.sup.1 --M--Ar.sup.2 --Ac.sup.2 --R.sup.2where R.sup.1 and R.sup.2 are independently selected from the group consing of hydrogen, unsubstituted alkyl groups, substituted alkyl groups, unsubstituted aryl groups, and substituted aryl groups, where Ac.sup.1 and Ac.sup.2 are independently selected alkynyl groups having at least 1 carbon-carbon triple bond, where Ar.sup.1 and Ar.sup.2 are independently selected substituted or unsubstituted aromatic diradicals, and where M has the structure ##STR1## where m is a positive integer, wherein x, p, y, r, n, and z are independently selected integers, where z.noteq.0 when n.noteq.0, and where R.sup.3 through R.sup.14 are independently selected from the group consisting of hydrogen, unsubstituted alkyl groups, substituted alkyl groups, unsubstituted aryl groups, and substituted aryl groups.
    Type: Grant
    Filed: July 26, 1996
    Date of Patent: October 21, 1997
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Daniel Bucca, Teddy M. Keller
  • Quinone diazo compound containing non-metallic atom
    Patent number: 5644038
    Abstract: Quinone diazo compounds having bonded to the diazo ring or directly bonded to a ring of the compound, certain non-metallic atoms that improve the photosensitivity thereof are provided. These quinone diazo compounds are useful as photoactive compounds in photoresist compositions, and particularly positive photoresist composition employed in x-ray or electron beam radiation. Also provided is a method for preparing compounds of the present invention.
    Type: Grant
    Filed: March 15, 1996
    Date of Patent: July 1, 1997
    Assignee: International Business Machines Corporation
    Inventors: Ari Aviram, William Ross Brunsvold, Daniel Bucca, Willard Earl Conley, Jr., David Earle Seeger
  • Process for producing a positive pattern utilizing naphtho quinone diazide compound having non-metallic atom directly bonded to the naphthalene ring
    Patent number: 5567569
    Abstract: Quinone diazo compounds having bonded to the diazo ring or directly bonded to a ring of the compound, certain non-metallic atoms that improve the photosensitivity thereof are provided. These quinone diazo compounds are useful as photoactive compounds in photoresist compositions, and particularly positive photoresist composition employed in x-ray or electron beam radiation. Also provided is a method for preparing compounds of the present invention.
    Type: Grant
    Filed: March 15, 1996
    Date of Patent: October 22, 1996
    Assignee: International Business Machines Corporation
    Inventors: Ari Aviram, William R. Brunsvold, Daniel Bucca, Willard E. Conley, Jr., David E. Seeger
  • Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring
    Patent number: 5552256
    Abstract: Quinone diazo compounds having bonded to the diazo ring or directly bonded to a ring of the compound, certain non-metallic atoms that improve the photosensitivity thereof are provided. These quinone diazo compounds are useful as photoactive compounds in photoresist compositions, and particularly positive photoresist composition employed in x-ray or electron beam radiation. Also provided is a method for preparing compounds of the present invention.
    Type: Grant
    Filed: September 29, 1994
    Date of Patent: September 3, 1996
    Assignee: International Business Machines Corporation
    Inventors: Ari Aviram, William R. Brunsvold, Daniel Bucca, Willard E. Conley, Jr., David E. Seeger