Patents by Inventor Daniel C. GLOVER

Daniel C. GLOVER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12341032
    Abstract: Embodiments of methods of performing a selective oxidation process on non-metal surfaces are provided herein. In some embodiments, a method of performing a selective oxidation process on non-metal surfaces includes: forming a first mixture of a carrier gas and a liquid in a mixer having a mixing block coupled to one or more control valves with a mixing line disposed therebetween; flowing the first mixture from the mixer to a vaporizer to vaporize the first mixture outside of an RTP chamber; and delivering the vaporized first mixture to the RTP chamber via a gas delivery line to expose a substrate disposed in the RTP chamber with the vaporized first mixture to perform a selective oxidation process on the substrate at a temperature of about 500 to about 1100 degrees Celsius.
    Type: Grant
    Filed: May 2, 2024
    Date of Patent: June 24, 2025
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Chaitanya Anjaneyalu Prasad, Christopher Sean Olsen, Lara Hawrylchak, Erika Gabrielle Hansen, Daniel C. Glover, Naman Apurva, Tsung-Han Yang
  • Patent number: 12165907
    Abstract: Embodiments of the present disclosure generally relate to apparatus for substrate processing, and more specifically to apparatus for rotating substrates and to uses thereof. In an embodiment, an apparatus for rotating a substrate is provided. The apparatus includes a levitatable rotor comprising a plurality of magnets embedded therein, a plurality of gas bearings positioned to levitate the levitatable rotor, and a stator magnetically coupled to the levitatable rotor, the stator for producing a rotating magnetic field. Apparatus for processing a substrate with the apparatus for rotating substrates as well as methods of use are also described.
    Type: Grant
    Filed: November 19, 2020
    Date of Patent: December 10, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Giridhar Kamesh, Vinodh Ramachandran, Chaitanya A. Prasad, Mohammad Aamir, Daniel C. Glover
  • Publication number: 20240282601
    Abstract: Embodiments of methods of performing a selective oxidation process on non-metal surfaces are provided herein. In some embodiments, a method of performing a selective oxidation process on non-metal surfaces includes: forming a first mixture of a carrier gas and a liquid in a mixer having a mixing block coupled to one or more control valves with a mixing line disposed therebetween; flowing the first mixture from the mixer to a vaporizer to vaporize the first mixture outside of an RTP chamber; and delivering the vaporized first mixture to the RTP chamber via a gas delivery line to expose a substrate disposed in the RTP chamber with the vaporized first mixture to perform a selective oxidation process on the substrate at a temperature of about 500 to about 1100 degrees Celsius.
    Type: Application
    Filed: May 2, 2024
    Publication date: August 22, 2024
    Inventors: Chaitanya Anjaneyalu Prasad, Christopher Sean Olsen, Lara Hawrylchak, Erika Gabrielle Hansen, Daniel C. Glover, Naman Apurva, Tsung-Han Yang
  • Patent number: 11996305
    Abstract: Embodiments of gas distribution modules for use with rapid thermal processing (RTP) systems and methods of use thereof are provided herein. In some embodiments, a gas distribution module for use with a RTP chamber includes: a first carrier gas line and a first liquid line fluidly coupled to a mixer, the mixer having one or more control valves configured to mix a carrier gas from the first carrier gas line and a liquid from the first liquid line in a desired ratio to form a first mixture; a vaporizer coupled to the mixer and configured to receive the first mixture in a hollow internal volume, the vaporizer having a heater configured to vaporize the first mixture; and a first gas delivery line disposed between the vaporizer and the RTP chamber to deliver the vaporized first mixture to the RTP chamber.
    Type: Grant
    Filed: June 29, 2021
    Date of Patent: May 28, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Chaitanya Anjaneyalu Prasad, Christopher Sean Olsen, Lara Hawrylchak, Erika Gabrielle Hansen, Daniel C. Glover, Naman Apurva, Tsung-Han Yang
  • Publication number: 20220415676
    Abstract: Embodiments of gas distribution modules for use with rapid thermal processing (RTP) systems and methods of use thereof are provided herein. In some embodiments, a gas distribution module for use with a RTP chamber includes: a first carrier gas line and a first liquid line fluidly coupled to a mixer, the mixer having one or more control valves configured to mix a carrier gas from the first carrier gas line and a liquid from the first liquid line in a desired ratio to form a first mixture; a vaporizer coupled to the mixer and configured to receive the first mixture in a hollow internal volume, the vaporizer having a heater configured to vaporize the first mixture; and a first gas delivery line disposed between the vaporizer and the RTP chamber to deliver the vaporized first mixture to the RTP chamber.
    Type: Application
    Filed: June 29, 2021
    Publication date: December 29, 2022
    Inventors: Chaitanya Anjaneyalu PRASAD, Christopher Sean OLSEN, Lara HAWRYLCHAK, Erika Gabrielle HANSEN, Daniel C. GLOVER, Naman APURVA, Tsung-Han YANG
  • Publication number: 20220157643
    Abstract: Embodiments of the present disclosure generally relate to apparatus for substrate processing, and more specifically to apparatus for rotating substrates and to uses thereof. In an embodiment, an apparatus for rotating a substrate is provided. The apparatus includes a levitatable rotor comprising a plurality of magnets embedded therein, a plurality of gas bearings positioned to levitate the levitatable rotor, and a stator magnetically coupled to the levitatable rotor, the stator for producing a rotating magnetic field. Apparatus for processing a substrate with the apparatus for rotating substrates as well as methods of use are also described.
    Type: Application
    Filed: November 19, 2020
    Publication date: May 19, 2022
    Inventors: Giridhar KAMESH, Vinodh RAMACHANDRAN, Chaitanya A. PRASAD, Mohammad AAMIR, Daniel C. GLOVER
  • Publication number: 20210249284
    Abstract: A substrate support pedestal connectable to a shaft includes a thermally conductive body, a first fluid channel disposed within an outer zone of the thermally conductive body, and a second fluid channel disposed within an inner zone of the thermally conductive body. The first fluid channel and the second fluid channel are not in fluid communication with each other and are thermally isolated from each other by a thermal barrier within the substrate support channel.
    Type: Application
    Filed: February 12, 2020
    Publication date: August 12, 2021
    Inventors: Chaitanya A. PRASAD, Daniel C. GLOVER, Naman APURVA