Abstract: Techniques are provided to convert utility power having an unstable utility frequency into supply power having a stable frequency, which can be distributed and utilized as a system reference. For example, a system comprises a power generator and a power distribution system. The power generator is configured to convert utility power having an unstable utility frequency to supply power having a stable frequency component. The power distribution system is coupled to an output of the power generator, and is configured to distribute the supply power having the stable frequency component to at least one power consumer which is configured to utilize the stable frequency component of the supply power as a reference frequency.

Abstract: In general, the subject matter described herein relates to wettable materials that can be used to expose a liquid phase to a gas phase. An example method includes: providing a material including a polymeric substrate and at least one of: a silicate coating disposed over the polymeric substrate; or a polar mineral additive dispersed within the polymeric substrate at a loading from about 1% to about 25%, by weight; and using the material in a chemical process in which the material is at least partially covered by a liquid phase and the liquid phase is exposed to a gas phase.

Abstract: A bias supply system and methods are disclosed. The bias supply system comprises an output node, a return node, and a bias supply configured to apply an asymmetric periodic voltage waveform between the output node and the return node. A variable capacitance is coupled between the output node and the return node, and a controller is coupled to the variable capacitance. The controller is configured to receive a setting that defines a slope of a workpiece voltage, monitor electrical parameters at the output node to obtain an indication of an actual slope of the workpiece voltage, and control the variable capacitance so the actual slope of the workpiece voltage approaches the slope defined by the setting.

Abstract: A document object may be transmitted to a plurality of user devices. The document object may include at least one field for display of a content object of a group of content objects. The field may be associated with an identifier corresponding to the group of content objects. When the document object is accessed, then the access may trigger a request to a server, which may select a content object of the group of content objects using a content object identification function. The content object identification function may be dynamically updated based at least in part on the document object being accessed by one or more of the plurality of user devices. Responsive to the request, a unique content object identifier corresponding to the selected content object may be transmitted to the user device and displayed at the accessed document object.

Abstract: An apparatus and method to produce a waveform. The apparatus includes a first node, a first power supply coupled to a second node, a first switch that couples the second node to the first node, and responsive to the first switch being closed, a peak voltage is applied at the first node. The apparatus also includes a second switch that couples a third node to the first node, and responsive to the second switch being closed, a voltage step is applied at the first node. In addition, a second power supply is coupled to the first node to produce a ramped voltage at the first node.

Abstract: Systems and methods for plasma processing are disclosed. An exemplary system may include a plasma processing chamber including a source to produce a plasma in the processing chamber and at least two bias electrodes arranged within the plasma processing chamber to control plasma sheaths proximate to the bias electrodes. A chuck is disposed to support a substrate, and a source generator is coupled to the plasma electrode. At least one bias supply is coupled to the at least two bias electrodes, and a controller is included to control the at least one bias supply to control the plasma sheath(s) proximate to the bias electrodes.

Abstract: The present application provides an adjustable inlet guide vane angle monitoring device for monitoring an angular position of an inlet guide vane mounted about a compressor of a gas turbine engine. The adjustable inlet guide vane angle monitoring device may include a position sensor attached to the inlet guide vane, a sensor plate attached to the position sensor, and a limit switch positioned about the sensor plate. The position sensor determines the angular position of the inlet guide vane and the limit switch prevents movement of the inlet guide vane upon detection of the sensor plate.

Abstract: Systems and methods for plasma processing are disclosed. An exemplary system may include a plasma processing chamber including a source to produce a plasma in the processing chamber and at least two bias electrodes arranged within the plasma processing chamber to control plasma sheaths proximate to the bias electrodes. A chuck is disposed to support a substrate, and a source generator is coupled to the plasma electrode. At least one bias supply is coupled to the at least two bias electrodes, and a controller is included to control the at least one bias supply to control the plasma sheaths proximate to the bias electrodes.

Abstract: Systems and methods for plasma processing are disclosed. An exemplary system may include a plasma processing chamber including a source to produce a plasma in the processing chamber and at least two bias electrodes arranged within the plasma processing chamber to control plasma sheaths proximate to the bias electrodes. A chuck is disposed to support a substrate, and a source generator is coupled to the plasma electrode. At least one bias supply is coupled to the at least two bias electrodes, and a controller is included to control the at least one bias supply to control the plasma sheaths proximate to the bias electrodes.

Abstract: Due to the threat of virus attacks and ransom ware, an apparatus and methods for protecting backup storage devices from malicious software virus attacks is explored. An independent backup storage system is connected to a primary storage server over an undiscoverable communications line. The backup storage system is a read-only backup storage system most of the time buffering the backup storage system from a virus or attack on the primary storage server. The backup storage system changes from a read-only backup storage system to a read/write backup storage system only during a backup window of time where data is backed up to the backup storage system. A snapshot of the backup data is maintained in the backup storage system and can be made available at numerous points of time in the past if the data primary storage server becomes corrupted.

Abstract: An apparatus and method to produce a waveform. The apparatus includes a first node, a first power supply coupled to a second node, a first switch that couples the second node to the first node, and responsive to the first switch being closed, a peak voltage is applied at the first node. The apparatus also includes a second switch that couples a third node to the first node, and responsive to the second switch being closed, a voltage step is applied at the first node. In addition, a second power supply is coupled to the first node to produce a ramped voltage at the first node.

Abstract: An apparatus and method to produce a waveform. The apparatus includes a first node, at least one switch that couples a second node to the first node, and responsive to the at least one switch being closed, a peak voltage is produced at the first node before a voltage at the first node drops by a voltage step. A power supply is coupled to the first node to produce, after the voltage step, a ramped voltage at the first node.

Abstract: An apparatus and method to produce a waveform. The apparatus includes a first node, at least one switch that couples a second node to the first node, and responsive to the at least one switch being closed, a peak voltage is produced at the first node before a voltage at the first node drops by a voltage step. A power supply is coupled to the first node to produce, after the voltage step, a ramped voltage at the first node.

Abstract: The present application provides an adjustable inlet guide vane angle monitoring device for monitoring an angular position of an inlet guide vane mounted about a compressor of a gas turbine engine. The adjustable inlet guide vane angle monitoring device may include a position sensor attached to the inlet guide vane, a sensor plate attached to the position sensor, and a limit switch positioned about the sensor plate. The position sensor determines the angular position of the inlet guide vane and the limit switch prevents movement of the inlet guide vane upon detection of the sensor plate.

Abstract: Due to the threat of virus attacks and ransom ware, an apparatus and methods for protecting backup storage devices from malicious software virus attacks is explored. An independent backup storage system is connected to a primary storage server over an undiscoverable communications line. The backup storage system is a read-only backup storage system most of the time buffering the backup storage system from a virus or attack on the primary storage server. The backup storage system changes from a read-only backup storage system to a read/write backup storage system only during a backup window of time where data is backed up to the backup storage system. A snapshot of the backup data is maintained in the backup storage system and can be made available at numerous points of time in the past if the data primary storage server becomes corrupted.

Abstract: Bias scores can be generated from articles. A bias score generator can be configured to aggregate and process articles to identify entities and policies that appear in the articles and to generate sentiment values for the entities and policies. Aspect-based targeted sentiment analysis may be employed to generate the sentiment values. The bias score generator can process the sentiment values to generate a bias score for each article. Bias scores for multiple articles can be combined to generate a media bias score for a source of the articles. Bias loaded words and bias loaded snippets may also be used to generate a media bias score.

Abstract: Due to the threat of virus attacks and ransom ware, an apparatus and methods for protecting backup storage devices from malicious software virus attacks is explored. An independent backup storage system is connected to a primary storage server over an undiscoverable communications line. The backup storage system is a read-only backup storage system most of the time buffering the backup storage system from a virus or attack on the primary storage server. The backup storage system changes from a read-only backup storage system to a read/write backup storage system only during a backup window of time where data is backed up to the backup storage system. A snapshot of the backup data is maintained in the backup storage system and can be made available at numerous points of time in the past if the data primary storage server becomes corrupted.

Abstract: Due to the threat of virus attacks and ransom ware, an apparatus and methods for protecting backup storage devices from malicious software virus attacks is explored. An independent backup storage system is connected to a primary storage server over an undiscoverable communications line. The backup storage system is a read-only backup storage system most of the time buffering the backup storage system from a virus or attack on the primary storage server. The backup storage system changes from a read-only backup storage system to a read/write backup storage system only during a backup window of time where data is backed up to the backup storage system. A snapshot of the backup data is maintained in the backup storage system and can be made available at numerous points of time in the past if the data primary storage server becomes corrupted.

Abstract: Systems and methods for plasma processing are disclosed. An exemplary system may include a plasma processing chamber comprising a source to produce a plasma in the processing chamber and at least two bias electrodes arranged within the plasma processing chamber to control plasma sheaths proximate to the bias electrodes. A chuck is disposed to support a substrate, and a source generator is coupled to the plasma electrode. At least one bias supply is coupled to the at least two bias electrodes, and a controller is included to control the at least one bias supply to control the plasma sheaths proximate to the bias electrodes.

Abstract: Systems and methods for plasma processing are disclosed. An exemplary system may include a plasma processing chamber including a source to produce a plasma in the processing chamber and at least two bias electrodes arranged within the plasma processing chamber to control plasma sheaths proximate to the bias electrodes. A chuck is disposed to support a substrate, and a source generator is coupled to the plasma electrode. At least one bias supply is coupled to the at least two bias electrodes, and a controller is included to control the at least one bias supply to control the plasma sheath(s) proximate to the bias electrodes.