Patents by Inventor Daniel Clingerman

Daniel Clingerman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Controlling cure rate with wetted filler
    Patent number: 11214666
    Abstract: Compositions include a polythiol and a wetted filler. The composition comprises from 0.1 wt % to 10 wt % water based on the total weight of the composition. The compositions exhibit an extended working time and a rapid onset of cure. The compositions can be used as sealants.
    Type: Grant
    Filed: April 15, 2020
    Date of Patent: January 4, 2022
    Assignee: PRC-DeSoto International, Inc.
    Inventors: Amy Liane Toolis, Lorraine Hsu, Daniel Clingerman, Justin Martin
  • CONTROLLING CURE RATE WITH WETTED FILLER
    Publication number: 20210324179
    Abstract: Compositions include a polythiol and a wetted filler. The compositions exhibit an extended working time and a rapid onset of cure. The compositions can be used as sealants.
    Type: Application
    Filed: April 15, 2020
    Publication date: October 21, 2021
    Inventors: Amy Liane Toolis, Lorraine Hsu, Daniel Clingerman, Justin Martin
  • Composition and method for metal CMP
    Patent number: 10968366
    Abstract: A chemical mechanical polishing composition for polishing a substrate includes a liquid carrier and cationic metal oxide abrasive particles dispersed in the liquid carrier. The cationic metal oxide abrasive particles have a surface modified with at least one compound consisting of a silyl group having at least one quaternary ammonium group. A method for chemical mechanical polishing a substrate including a metal layer includes contacting the substrate with the above described polishing composition, moving the polishing composition relative to the substrate, and abrading the substrate to remove a portion of the metal layer from the substrate and thereby polish the substrate.
    Type: Grant
    Filed: December 4, 2018
    Date of Patent: April 6, 2021
    Assignee: CMC Materials, Inc.
    Inventors: Steven Kraft, Fernando Hung Low, Daniel Clingerman, Roman A. Ivanov, Steven Grumbine
  • COMPOSITION AND METHOD FOR METAL CMP
    Publication number: 20200172760
    Abstract: A chemical mechanical polishing composition for polishing a substrate includes a liquid carrier and cationic metal oxide abrasive particles dispersed in the liquid carrier. The cationic metal oxide abrasive particles have a surface modified with at least one compound consisting of a silyl group having at least one quaternary ammonium group. A method for chemical mechanical polishing a substrate including a metal layer includes contacting the substrate with the above described polishing composition, moving the polishing composition relative to the substrate, and abrading the substrate to remove a portion of the metal layer from the substrate and thereby polish the substrate.
    Type: Application
    Filed: December 4, 2018
    Publication date: June 4, 2020
    Inventors: Steven KRAFT, Fernando HUNG LOW, Daniel CLINGERMAN, Roman A. IVANOV, Steven GRUMBINE
  • Methods for fabricating a chemical-mechanical polishing composition
    Patent number: 9803106
    Abstract: Methods for fabricating a chemical-mechanical polishing composition include growing colloidal silica abrasive particles in a liquid including an aminosilane compound such that the aminosilane compound becomes incorporated in the abrasive particles. A dispersion including such colloidal silica abrasive particles may be further processed to obtain a chemical-mechanical polishing composition including colloidal silica particles having the aminosilane compound incorporated therein.
    Type: Grant
    Filed: June 25, 2015
    Date of Patent: October 31, 2017
    Assignee: Cabot Microelectronics Corporation
    Inventors: Steven Grumbine, Jeffrey Dysard, Ernest Shen, Mary Cavanaugh, Daniel Clingerman
  • METHODS FOR FABRICATING A CHEMICAL-MECHANICAL POLISHING COMPOSITION
    Publication number: 20150376460
    Abstract: Methods for fabricating a chemical-mechanical polishing composition include growing colloidal silica abrasive particles in a liquid including an aminosilane compound such that the aminosilane compound becomes incorporated in the abrasive particles. A dispersion including such colloidal silica abrasive particles may be further processed to obtain a chemical-mechanical polishing composition including colloidal silica particles having the aminosilane compound incorporated therein.
    Type: Application
    Filed: June 25, 2015
    Publication date: December 31, 2015
    Inventors: Steven Grumbine, Jeffrey Dysard, Ernest Shen, Mary Cavanaugh, Daniel Clingerman