Abstract: Disclosed is a pin lifting device for moving and positioning a substrate. The pin lifting device includes a coupling, a supporting pin configured to support the substrate, and a drive unit which configure to drive the coupling. The pin lifting device includes a separating means for separating a process atmosphere area from an external atmosphere area. The drive unit is at least partially in the external atmosphere area and the coupling is in the process atmosphere area. The coupling includes a linearly extending recess defining a central receiving axis. The recess has a width substantially orthogonally to the receiving axis. A clamping section delimited axially with respect to the receiving axis has a clamping element, in an unloaded receiving state, defines a clamping width that is smaller than the recess width, and the clamping width is variable as a function of a force acting radially on the clamping element.

Abstract: A device (1) for homogenizing a gas distribution in a process chamber (2). The device (1) has a aperture shield (3) and a linear drive (4) for moving the aperture shield (3) in a reciprocating manner in two mutually opposite linear movement directions (5) between two terminal positions. The aperture shield (3) is able to be heated by at least one heating installation (6) of the device (1), and the aperture shield (3) by way of at least one interposed compensation element (7) of the device (1) is connected to the linear drive (4). The compensation element (7) enables a relative movement between the aperture shield (3) and the linear drive (4) in at least one direction (8) transverse, preferably orthogonal, to the linear movement directions (5) of the aperture shield (3).

Abstract: Disclosed is a pin lifting device for moving and positioning a substrate. The pin lifting device includes a coupling, a supporting pin configured to support the substrate, and a drive unit which configure to drive the coupling. The pin lifting device includes a separating means for separating a process atmosphere area from an external atmosphere area. The drive unit is at least partially in the external atmosphere area and the coupling is in the process atmosphere area. The coupling includes a linearly extending recess defining a central receiving axis. The recess has a width substantially orthogonally to the receiving axis. A clamping section delimited axially with respect to the receiving axis has a clamping element, in an unloaded receiving state, defines a clamping width that is smaller than the recess width, and the clamping width is variable as a function of a force acting radially on the clamping element.