Patents by Inventor Daniel David Kostelnick

Daniel David Kostelnick has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of treating metal nitride films to reduce silicon migration therein
    Patent number: 5712193
    Abstract: A method of treating the surface of a metal nitride barrier layer on an integrated circuit to reduce the movement of silicon through the barrier. The metal nitride barrier (such as TiN) is exposed to a nitrogen plasma, thereby improving the barrier properties of the metal nitride barrier.
    Type: Grant
    Filed: December 30, 1994
    Date of Patent: January 27, 1998
    Assignee: Lucent Technologies, Inc.
    Inventors: Glen Roy Hower, Daniel David Kostelnick, Yih-Cheng Shih