Abstract: The invention provides alkene fluoroalkanol and fluorinated polyol precursors to fluoroalkanol-substituted ?,?-unsaturated esters. The fluoroalkanol-substituted ?,?-unsaturated esters are olefins that can be readily polymerized to provide fluoroalkanol-substituted polymers useful in lithographic photoresist compositions. Also provided are methods for synthesizing the alkene fluoroalkanol and fluorinated polyol precursors.

Abstract: A class of lithographic photoresist combinations is disclosed which is suitable for use with visible light and does not require a post-exposure bake step. The disclosed photoresists are preferably chemical amplification photoresists and contain a photosensitizer having the structure of formula (I): where Ar1 and Ar2 are independently selected from monocyclic aryl and monocyclic heteroaryl, R1 and R2 may be the same or different, and have the structure —X—R3 where X is O or S and R3 is C1-C6 hydrocarbyl or heteroatom-containing C1-C6 hydrocarbyl, and R4 and R5 are independently selected from the group consisting of hydrogen and —X—R3, or, if ortho to each other, may be taken together to form a five- or six-membered aromatic ring, with the proviso that any heteroatom contained within Ar1, Ar2, or R3 is O or S. The use of the disclosed photoresists, particularly for the manufacture of holographic diffraction gratings, is also disclosed.

Abstract: The invention provides alkene fluoroalkanol and fluorinated polyol precursors to fluoroalkanol-substituted ??-unsaturated esters. The fluoroalkanol-substituted ??-unsaturated esters are olefins that can be readily polymerized to provide fluoroalkanol-substituted polymers useful in lithographic photoresist compositions. Also provided are methods for synthesizing the alkene fluoroalkanol and fluorinated polyol precursors.

Abstract: The invention provides alkene fluoroalkanol and fluorinated polyol precursors to fluoroalkanol-substituted ?,?-unsaturated esters. The fluoroalkanol-substituted ?,?-unsaturated esters are olefins that can be readily polymerized to provide fluoroalkanol-substituted polymers useful in lithographic photoresist compositions. Also provided are methods for synthesizing the alkene fluoroalkanol and fluorinated polyol precursors.

Abstract: A method for configuring channels of a dual channel SCSI chip is provided which includes setting at least one bit in a first configuration space within a first channel control in the dual channel SCSI chip where the first configuration space returns a device identification information when accessed by an operating system. The method also includes setting at least one bit in a second configuration space within a second channel control in the dual channel SCSI chip where the second configuration space returns data indicating that the second configuration space does not contain any device identification information when accessed by the operating system. The first channel control is detected and managed by the operating system, and the second channel control is not detected by the operating system and is managed by a device processor.

Abstract: Disclosed is a computer system which includes multiple levels of bootstrap code. The first level of bootstrap code is stored in a non-volatile storage means associated with a host processor. A second non-volatile storage means is provided which stores a second level of bootstrap code. A processor means, separate from the host processor, controls access by the host system to both the first and second non-volatile storage means. The second non-volatile storage means in the preferred embodiment is electrically writable and erasable by the host computer system, by the processor means associated with the second non-volatile storage means, or by an input device provided for that purpose.