Abstract: The present disclosure generally relates to navigating a collection of media items. In accordance with one embodiment, in response to receiving an input, a device displays a first view of a collection of media items, including concurrently displaying a representation of a first time period and a representation of a second time period. In accordance with a determination that a current time is associated with a first recurring temporal event: the representation of the first time period includes a first representative media item and the representation of the second time period includes a second representative media item. In accordance with a determination that the current time is associated with a second recurring temporal event, the representation of the first time period includes a third representative media item and the representation of the second time period includes a fourth representative media item.

Abstract: An apparatus comprises a wheel and an indicator. The wheel includes a plurality of wedges and a linking element. The plurality of wedges bear respective awards, and the linking element is configured to link a subset of at least two wedges of the plurality of wedges. The indicator is configured to designate a wedge within the plurality of wedges. In response to the designated wedge being within the subset, a combination of the awards associated with the at least two wedges of the plurality of wedges are awarded.

Abstract: An apparatus comprises a wheel and an indicator. The wheel includes a plurality of wedges and a linking element. The plurality of wedges bear respective awards, and the linking element is configured to link a subset of at least two wedges of the plurality of wedges. The indicator is configured to designate a wedge within the plurality of wedges. In response to the designated wedge being within the subset, a combination of the awards associated with the at least two wedges of the plurality of wedges are awarded.

Abstract: A multi-workpiece chamber includes at least two processing stations, for exposing workpieces to a treatment process. A partition cooperates with the chamber such that the partition is disengagably removable from the chamber and re-engagable with the chamber for selectively dividing the processing stations. The partition is configured to provide for non-line-of-sight travel of certain ones of the process related products between the processing stations. An exhaust arrangement divides exhaust flow into at least two approximately equal exhaust flow portions that leave the multi-workpiece chamber in a way which enhances uniformity of the treatment process for the stations. A partition configuration is described including a partition portion between the stations and a baffle portion extending into an exhaust arrangement. A modified partition arrangement is provided for use in establishing a modified exchange characteristic of the process related products.

Abstract: As part of a system for processing workpieces, a workpiece support arrangement, separate from a process chamber arrangement supports at least two workpieces at least generally in a stacked relationship to form a workpiece column. A transfer arrangement transports at least two of the workpieces between the workpiece column and the process chamber arrangement by simultaneously moving the two workpieces at least generally along first and second transfer paths, respectively, that are defined between the workpiece column and the first and second process stations. The transfer arrangement can simultaneously move untreated and treated workpieces. Vertical motion swing arms and coaxial swing arms are described. A pair of spaced apart swing arms, the workpiece column and the processing stations can cooperatively define a pentagonal shape. Timing belt backlash elimination, a dual degree of freedom slot valve and low point chamber pumping, for removing chamber contaminants, are also described.

Abstract: A customizable chamber spectral response is described which can be used at least to tailor chamber performance for wafer heating, wafer cooling, temperature measurement, and stray light. In one aspect, a system is described for processing a treatment object having a given emission spectrum at a treatment object temperature which causes the treatment object to produce a treatment object radiated energy. The chamber responds in a first way to the heating arrangement radiated energy and in a second way to the treatment object radiated energy that is incident thereon. The chamber may respond in the first way by reflecting the majority of the heat source radiated energy and in the second way by absorbing the majority of the treatment object radiated energy. Different portions of the chamber may be treated with selectively reflectivity based on design considerations to achieve objectives with respect to a particular chamber performance parameter.

Abstract: A more uniform plasma process is implemented for treating a treatment object using an inductively coupled plasma source which produces an asymmetric plasma density pattern at the treatment surface using a slotted electrostatic shield having uniformly spaced-apart slots. The slotted electrostatic shield is modified in a way which compensates for the asymmetric plasma density pattern to provide a modified plasma density pattern at the treatment surface. A more uniform radial plasma process is described in which an electrostatic shield arrangement is configured to replace a given electrostatic shield in a way which provides for producing a modified radial variation characteristic across the treatment surface. The inductively coupled plasma source defines an axis of symmetry and the electrostatic shield arrangement is configured to include a shape that extends through a range of radii relative to the axis of symmetry.

Abstract: A guard barrier arrangement is used in an O-ring seal arrangement to limit reactive species in coming into contact with an O-ring. The arrangement is supported in a chamber passage for exposure to the reactive species. An o-ring is compressed so as to peripherally resiliently bias the guard ring arrangement further into the chamber passage configuration toward the chamber interior to limit access of the reactive species to the o-ring. The passage configuration can use a narrowing surface arrangement against which the barrier arrangement is urged. The barrier can include an annular configuration that can change responsive to being biased into the chamber passage configuration.

Abstract: Absorbent articles for inhibiting the production of exoproteins from Gram positive bacteria are disclosed. The absorbent articles include an effective amount of a precursor compound having the general formula: wherein R1 is selected from the group consisting of R7 is —OCH2—; X is 0 or 1; R5 is a substituted or unsubstituted aromatic ring or a monovalent saturated or unsaturated, substituted or unsubstituted, branched or straight chain hydrocarbyl moiety that may or may not be substituted with hetero atoms; R6 is selected from the group consisting of an amino acid, a methyl ester of an amino acid, and an ethyl ester of an amino acid; R2, R3, and R4 are independently selected from the group consisting of H, OH, COOH.

Abstract: Non-absorbent articles for inhibiting the production of exoproteins from Gram positive bacteria are disclosed. The non-absorbent articles include an effective amount of a precursor compound having the general formula: wherein R1 is selected from the group consisting of R7 is —OCH2—; X is 0 or 1; R5 is a substituted or unsubstituted aromatic ring or a monovalent saturated or unsaturated, substituted or unsubstituted, branched or straight chain hydrocarbyl moiety that may or may not be substituted with hetero atoms; R6 is selected from the group consisting of an amino acid, a methyl ester of an amino acid, and an ethyl ester of an amino acid; R2, R3, and R4 are independently selected from the group consisting of H, OH, COOH.

Abstract: As part of a system for processing workpieces, a workpiece support arrangement, separate from a process chamber arrangement supports at least two workpieces at least generally in a stacked relationship to form a workpiece column. A transfer arrangement transports at least two of the workpieces between the workpiece column and the process chamber arrangement by simultaneously moving the two workpieces at least generally along first and second transfer paths, respectively, that are defined between the workpiece column and the first and second process stations. The transfer arrangement can simultaneously move untreated and treated workpieces. Vertical motion swing arms and coaxial swing arms are described. A pair of spaced apart swing arms, the workpiece column and the processing stations can cooperatively define a pentagonal shape. Timing belt backlash elimination, a dual degree of freedom slot valve and low point chamber pumping, for removing chamber contaminants, are also described.

Abstract: A process and system for heating semiconductor substrates in a processing chamber on a susceptor as disclosed. In accordance with the present invention, the susceptor includes a support structure made from a material having a relatively low thermal conductivity for suspending the wafer over the susceptor. The support structure has a particular height that inhibits or prevents radial temperature gradients from forming in the wafer during high temperature processing. If needed, recesses can be formed in the susceptor for locating and positioning a support structure. The susceptor can include a wafer supporting surface defining a pocket that has a shape configured to conform to the shape of a wafer during a heat cycle.

Abstract: In accordance the present invention a package assembly 10 for the storage and distribution of a plurality of mints 14 is provided comprising a bottom container 12 for the storage of the plurality of mints 14, the bottom container 12 comprising a bottom container base 16 and a plurality of bottom container sidewalls 18. The package assembly 10 also includes an upper cover 24 including an upper cover top surface 36. The upper cover 24 is mountable to the bottom container 12. An arched longitudinal detent 38 is formed in the upper cover 24. The arched longitudinal detent 38 is comprised of a detent surface 40 having a detent width 42, a detent length 44 and a detent depth 46. A delivery orifice 54 is formed through a portion of the arched longitudinal detent 38 and has an orifice width 56 and an orifice length 58. The orifice width 56 and the orifice length 58 are sized to allow one of the plurality of mints 14 to pass through the delivery orifice 54.

Abstract: As part of a chamber configuration, a window arrangement includes a chamber having an interior. The chamber forms a window aperture having an aperture edge. A window, having a pair of opposing major surfaces and a peripheral sidewall configuration extending between the opposing major surfaces, is received in the window aperture with the peripheral sidewall configuration supported against the aperture edge such that the peripheral sidewall configuration and the aperture edge cooperate in a way which converts at least a portion of a biasing force, that is applied generally normal to the opposing major surfaces of the window, to a direction that is different from, oblique to, or sloped with respect to an applied direction of the biasing force.

Abstract: A multi-workpiece chamber includes at least two processing stations, for exposing workpieces to a treatment process. A partition cooperates with the chamber such that the partition is disengagably removable from the chamber and re-engagable with the chamber for selectively dividing the processing stations. The partition is configured to provide for non-line-of-sight travel of certain ones of the process related products between the processing stations . An exhaust arrangement divides exhaust flow into at least two approximately equal exhaust flow portions that leave the multi-workpiece chamber in a way which enhances uniformity of the treatment process for the stations. A partition configuration is described including a partition portion between the stations and a baffle portion extending into an exhaust arrangement. A modified partition arrangement is provided for use in establishing a modified exchange characteristic of the process related products.

Abstract: A package assembly 10 for the storage and distribution of a plurality of stacked mints 12 is provided. The package assembly 10 includes a cylindrical outer shell 14 including a shell sidewall 16, a shell bottom surface 18, and a shell open top 20. The shell sidewall 16 includes a sidewall inner surface 22 and a sidewall outer surface 24. A vertical control slot 28 is formed in the shell sidewall 16, the vertical control slot 28 having a control slot height 40 and a control slot width 42. At least one retention protrusion 78 is formed onto a slot side edge 34 such that the control slot width 42 is reduced in the location of the at least one retention protrusion 78. A cylindrical inner insert 26 including an insert sidewall 44, an insert top surface 46, and an insert open bottom 48, is formed to house the plurality of stacked mints 12. The cylindrical inner insert 26 is positioned within the cylindrical outer shell 14 such that the insert open bottom 48 faces the shell bottom surface 18.

Abstract: Workpiece processing uses a transfer chamber in cooperation with a process chamber. The workpiece is to be heated to a treatment temperature, at a preheating pressure, and subsequently exposed to a plasma at a treatment pressure, which is less than the preheating pressure. The process chamber pressure does not exceed the preheating pressure, yet very rapid pressure increases can be induced in the process chamber in transitioning from the treatment pressure to the preheating pressure. The transfer chamber pressure can be maintained at the treatment pressure, the preheating pressure or raised to a selected pressure to backfill the process chamber to the preheating pressure. A backfill arrangement can selectively induce rapid pressure increases in the process chamber. A bypass arrangement provides selective pressure communication between the transfer and process chambers and can be used for backfilling the process chamber from the transfer chamber.

Abstract: A USB device controller is disclosed that provides excess processing resources for a peripheral device. The disclosed high speed communication controller controls communications between a host computer and at least one peripheral device. The disclosed communication controller includes a processor for controlling communications on a bus using one or more communication functions, wherein the processor performs at least one function for the peripheral device in addition to the one or more communication functions. Generally, the processor in the communication controller provides processing capacity for use by the peripheral device in addition to processing of the one or more communication functions. The high speed communications can conform, for example, to a USB standard, an IEEE 1394 standard or an IEEE 802.11 standard.

Abstract: As part of a system for processing a workpiece by applying a controlled heat to the workpiece, a heating arrangement includes an array of spaced apart heating elements for use in a confronting relationship with the workpiece to subject the workpiece to a direct radiation that is produced. A radiation shield includes a plurality of members supported for movement between (i) retracted positions, which allow the direct radiation to reach the workpiece, and (ii) extended positions, in which the plurality of members cooperate in way which serves to at least partially block the direct radiation from reaching the workpiece and to absorb radiation emitted and reflected by the workpiece and thereby achieve greater control of the time-temperature profile than previously obtainable. At least certain ones of the members move between adjacent ones of the heating elements in moving those certain members between the retracted and extended positions. Tubular, curved and plate-like member configurations can be used.