Abstract: A server that receives, from an image processing device, a request indicating a data file stored on a file server and a predetermined type of processing to be performed on the data file. It is determined whether memory stores information associated with a current session between the image processing device and the server. Based on determining that the information is not stored, initiating a download of the data file, generating a modified version of the downloaded data file and storing the information associated with the current session in the memory. The modified version is provided to the image processing device if the predetermined type of processing is a first type of processing and the downloaded file to the image processing device if the predetermined processing is a second type of processing.

Abstract: A server that receives, from an image processing device, a request indicating a data file stored on a file server and a predetermined type of processing to be performed on the data file. It is determined whether memory stores information associated with a current session between the image processing device and the server. Based on determining that the information is not stored, initiating a download of the data file, generating a modified version of the downloaded data file and storing the information associated with the current session in the memory. The modified version is provided to the image processing device if the predetermined type of processing is a first type of processing and the downloaded file to the image processing device if the predetermined processing is a second type of processing.

Abstract: A diagnostic plasma probe comprises ion sensors for measuring kinetic properties of plasma ions. Ion sensors of the invention include sensors for measuring differential ion flux, ion energy distributions, and ion incidence angle distributions at or near the surface of the probe. The measurement probe is electrically floating so as to cause minimal disruption of the properties of the processing plasma when disposed into a processing environment. A floating electrical bias is applied to the sensors to obtain measurements of ion properties.

Abstract: A diagnostic plasma measurement device is provided having sensors and features disposed using pattern transfer fabrication techniques. A measurement device comprises a primary substrate with sensors for measuring plasma or surface properties disposed by a stepped pattern transfer technique, such as step-and-repeat photolithography, about the surface of the probe. Sensor fields include sensors that measure physical and electrical properties of a plasma, as well as sensors that measure properties of the wafer surface. Fields or components for processing electronics, electrical interconnections, memory, photovoltaic power, and wireless communication are also provided. By utilizing pattern transfer fabrication techniques, the invention generally provides for reduced risks of contamination of a plasma processing environment and increased manufacturability and reliability of the completed sensor device.

Abstract: An in-situ plasma measurement probe comprises a primary substrate, such as a silicon wafer, with sensor devices disposed about the surface of the probe. An electronics module contains electronic components or other elements of the diagnostic probe that require isolation and shielding from the plasma environment. The electronics module is disposed upon the probe substrate and electrically connected to the remote sensor devices through one or more electrical interconnection layers disposed upon the substrate. By integrating and modularizing the electronic components of a sensor probe, the probe design may be optimized for cost effective production techniques while ensuring mechanical, chemical, and thermal compatibility with the wafer or other carrying substrate and the environment to which it is exposed.