Patents by Inventor Daniel E. Lundy

Daniel E. Lundy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7364834
    Abstract: A polymer having ?,? unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: April 29, 2008
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Edgardo Anzures, Daniel E. Lundy
  • Patent number: 7323290
    Abstract: A dry film photoresist includes a functional polymer. The functional polymer has ?,?-unsaturated groups and groups that generate a free radical upon exposure to actinic radiation.
    Type: Grant
    Filed: March 18, 2003
    Date of Patent: January 29, 2008
    Assignee: Eternal Technology Corporation
    Inventors: Robert K. Barr, Edgardo Anzures, Daniel E. Lundy
  • Patent number: 7148265
    Abstract: A polymer having ?,? unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.
    Type: Grant
    Filed: March 18, 2003
    Date of Patent: December 12, 2006
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Edgardo Anzures, Daniel E. Lundy
  • Patent number: 7072565
    Abstract: Provided are compositions which include a polymer, having units of the formula (RSiO1.5), wherein R is a substituted or unsubstituted organic group, and a plurality of functional end groups. A first component is provided for altering the solubility of the composition in a dried state upon activation. A second component contains a plurality of functional groups chosen from epoxides, oxetanes, vinyl ethers and combinations thereof. The second component is present in an effective amount to improve flexibility of the composition in a dried state before and after activation. Also provided are flexible optical waveguides, methods of forming flexible optical waveguides and electronic devices that include a flexible optical waveguide.
    Type: Grant
    Filed: April 14, 2005
    Date of Patent: July 4, 2006
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James G. Shelnut, Nicola Pugliano, Matthew L. Moynihan, Hai Bin Zheng, Daniel E. Lundy, Nathan Pawlowski
  • Patent number: 7072563
    Abstract: Provided are compositions suitable for use in forming a flexible optical waveguide. The compositions include a polymer, having units of the formula (RSiO1.5), wherein R is a substituted or unsubstituted organic group, and a plurality of functional end groups. A first component is provided for altering the solubility of the composition in a dried state upon activation. A second component contains a plurality of functional groups chosen from hydroxy, amino, thiol, sulphonate ester, carboxylate ester, silyl ester, anhydride, aziridine, methylolmethyl, silyl ether, and combinations thereof. The second component is present in an effective amount to improve flexibility of the composition in a dried state before and after activation. Also provided are flexible optical waveguides, methods of forming flexible optical waveguides and electronic devices that include a flexible optical waveguide.
    Type: Grant
    Filed: November 19, 2004
    Date of Patent: July 4, 2006
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James G. Shelnut, Nicola Pugliano, Matthew L. Moynihan, Hai Bin Zheng, Daniel E. Lundy, Nathan Pawlowski
  • Patent number: 6900003
    Abstract: A composition and method to reduce photolithographic residue and scum formation on a substrate or in a solution, and to reduce or prevent foam formation. The composition contains a diphenyl oxide compound in combination with an antifoam agent. The composition may be added to developer solutions and stripper solutions used in manufacturing printed wiring boards.
    Type: Grant
    Filed: April 7, 2003
    Date of Patent: May 31, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Edgardo Anzures, Daniel E. Lundy, Robert K. Barr, Corey O'Connor
  • Patent number: 6887654
    Abstract: A composition and method to reduce or to prevent residue and scum formation on a substrate or in a solution. The composition contains an aromatic alkoxylate in combination with a polyol or ether or ester of a polyol. The composition also reduces or prevents foam formation such as in developing processes in the manufacturing of printed wiring boards.
    Type: Grant
    Filed: May 7, 2003
    Date of Patent: May 3, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Daniel E. Lundy, Robert K. Barr, Edgardo Anzures, Edward J. Brady, James G. Shelnut
  • Publication number: 20040101778
    Abstract: A compound having a photoinitiator component joined to a hydrophilic carrier component. The carrier component may contain sufficient hydrophilicity such that the entire compound is water-soluble or water-emulsifiable. The compounds may be employed in light sensitive formulations such as photoresists.
    Type: Application
    Filed: September 30, 2003
    Publication date: May 27, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Robert K. Barr, Edgardo Anzures, Daniel E. Lundy
  • Publication number: 20040063027
    Abstract: A polymer having &agr;,&bgr; unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.
    Type: Application
    Filed: March 18, 2003
    Publication date: April 1, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Robert K. Barr, Edgardo Anzures, Daniel E. Lundy
  • Publication number: 20040063030
    Abstract: A photoresist which contains a hydrophilic compound that generates a free-radical polymerization initiator upon exposure to actinic radition. The hydrophilic compound may be employed as a binder polymer or cross-linking agent in a photoresist.
    Type: Application
    Filed: September 30, 2003
    Publication date: April 1, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Robert K. Barr, Edgardo Anzures, Daniel E. Lundy
  • Publication number: 20040063026
    Abstract: A dry film photoresist includes a functional polymer. The functional polymer has &agr;,&bgr;-unsaturated groups and groups that generate a free radical upon exposure to actinic radiation.
    Type: Application
    Filed: March 18, 2003
    Publication date: April 1, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Robert K. Barr, Edgardo Anzures, Daniel E. Lundy
  • Publication number: 20040018453
    Abstract: A composition and method to reduce photolithographic residue and scum formation on a substrate or in a solution, and to reduce or prevent foam formation. The composition contains a diphenyl oxide compound in combination with an antifoam agent. The composition may be added to developer solutions and stripper solutions used in manufacturing printed wiring boards.
    Type: Application
    Filed: April 7, 2003
    Publication date: January 29, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Edgardo Anzures, Daniel E. Lundy, Robert K. Barr, Corey O'Connor
  • Publication number: 20030215755
    Abstract: A composition and method to reduce or to prevent residue and scum formation on a substrate or in a solution. The composition contains an aromatic alkoxylate in combination with a polyol or ether or ester of a polyol. The composition also reduces or prevents foam formation such as in developing processes in the manufacturing of printed wiring boards.
    Type: Application
    Filed: May 7, 2003
    Publication date: November 20, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: Daniel E. Lundy, Robert K. Barr, Edgardo Anzures, Edward J. Brady, James G. Shelnut
  • Publication number: 20030215754
    Abstract: A stable concentrate and method to reduce or prevent residue and scum formation on a substrate. The stable concentrate has an alkaline component in combination with another compound in a sufficient amount to reduce or prevent the formation of residue and scum on a substrate. The stable concentrate may be employed in developing processes in the manufacturing of printed wiring boards.
    Type: Application
    Filed: May 7, 2003
    Publication date: November 20, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: Daniel E. Lundy, Robert K. Barr, Edgardo Anzures
  • Publication number: 20030199406
    Abstract: A cleaning composition composed of a non-chelating organic acid, salt or ester thereof, and a chelating organic acid, salt or ester thereof that may be used to clean residue and scum from a substrate. The cleaning composition is suitable for cleaning residue and scum derived from photoresist.
    Type: Application
    Filed: February 5, 2003
    Publication date: October 23, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: Edgardo Anzures, Robert K. Barr, Daniel E. Lundy, Corey O'Connor
  • Publication number: 20030196685
    Abstract: A cleaning composition and method for removing built-up residue and scum on a substrate.
    Type: Application
    Filed: December 12, 2002
    Publication date: October 23, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: Edgardo Anzures, Robert K. Barr, Daniel E. Lundy, John P. Cahalen
  • Patent number: 6329123
    Abstract: A negative-acting photoimageable composition useful as a primary imaging resist in the manufacture of printed circuit boards comprises an acid-functional binder polymer, a photopolymerizable component, and a photoinitiator chemical system, in which all or a portion of the photopolymerizable component comprises a (meth)acrylate functional urethane oligomer, wherein the (meth)acrylate functionality is separated from the urethane linkage by at least two alkylene oxide groups and at least one ring-opened lactone group for improved flexibility, tenting strength, fine line adhesion, developer scumming, coupled with unexpectedly improved resistance to processing chemicals, such as alkaline developing solutions, acid etching solutions, and acid plating baths, and stripping ability in strong alkaline aqueous stripping solutions.
    Type: Grant
    Filed: July 30, 1999
    Date of Patent: December 11, 2001
    Assignee: Morton International Inc.
    Inventors: Daniel E. Lundy, Robert K. Barr, Edward J. Reardon
  • Patent number: 6322951
    Abstract: A negative-acting photoimageable composition useful as a primary imaging resist in the manufacture of printed circuit boards comprises an acid-functional binder polymer, a photopolymerizable component, and a photoinitiator chemical system, in which all or a portion of the photopolymerizable component comprises a (meth)acrylate functional urethane oligomer, wherein the (meth)acrylate functionality is separated from the urethane linkage by at least two alkylene oxide groups and at least one ring-opened lactone group for improved flexibility, tenting strength, fine line adhesion, developer scumming, coupled with unexpectedly improved resistance to processing chemicals, such as alkaline developing solutions, acid etching solutions, and acid plating baths, and stripping ability in strong alkaline aqueous stripping solutions.
    Type: Grant
    Filed: December 11, 1998
    Date of Patent: November 27, 2001
    Assignee: Norton International, Inc.
    Inventors: Daniel E. Lundy, Robert K. Barr, Edward J. Reardon
  • Patent number: 6268111
    Abstract: An oligomer is provided having tetraacrylate functionality as well as carboxylic acid functionality. The oligomer is useful as a photopolymerizable binder in photoresists for forming printed circuitry. Particular advantages of the oligomer are found in solder mask-forming compositions which must withstand the conditions of nickel/gold plating.
    Type: Grant
    Filed: October 20, 1999
    Date of Patent: July 31, 2001
    Assignee: Rohm and Haas Company
    Inventors: Lincoln Eramo, Jr., Mitchell G. Male, Robert K. Barr, Daniel E. Lundy
  • Patent number: 6248506
    Abstract: An alkaline aqueous developing solution for developing photoresists or the like contains, as an anti-scum agent: A) between about 0.05 and about 1.0 wt % of a first surfactant or surfactant mixture, the first surfactant(s) having the general formula: R—O—(AO)n—H where AO are alkylene oxide units selected from ethylene oxide units (CH2—CH2—O) and propylene oxide units (CH(CH3)—CH2—O) or (CH2—CH(CH3)—O) and mixtures of ethylene and propylene oxide units, either in the mixture of molecules, where R is a hydrophobic group, n is between about 8 and about 200, and B) as a second surfactant, between about 0.05 and 1.0 wt % of an organic salt having the formula: where R is an alkyl or aryl group, preferably phenyl, A is selected from carboxyl, sulfonyl, phosphonyl and mixtures thereof, preferably sulfonyl. M is a charge-balancing cation, and n is between 1 and about 200, preferably between 2 and about 100.
    Type: Grant
    Filed: December 4, 1998
    Date of Patent: June 19, 2001
    Assignee: Nichigo-Morton
    Inventors: Daniel E. Lundy, Robert Barr