Abstract: A polymer having ?,? unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.

Abstract: A dry film photoresist includes a functional polymer. The functional polymer has ?,?-unsaturated groups and groups that generate a free radical upon exposure to actinic radiation.

Abstract: A polymer having ?,? unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.

Abstract: Provided are compositions suitable for use in forming a flexible optical waveguide. The compositions include a polymer, having units of the formula (RSiO1.5), wherein R is a substituted or unsubstituted organic group, and a plurality of functional end groups. A first component is provided for altering the solubility of the composition in a dried state upon activation. A second component contains a plurality of functional groups chosen from hydroxy, amino, thiol, sulphonate ester, carboxylate ester, silyl ester, anhydride, aziridine, methylolmethyl, silyl ether, and combinations thereof. The second component is present in an effective amount to improve flexibility of the composition in a dried state before and after activation. Also provided are flexible optical waveguides, methods of forming flexible optical waveguides and electronic devices that include a flexible optical waveguide.

Abstract: Provided are compositions which include a polymer, having units of the formula (RSiO1.5), wherein R is a substituted or unsubstituted organic group, and a plurality of functional end groups. A first component is provided for altering the solubility of the composition in a dried state upon activation. A second component contains a plurality of functional groups chosen from epoxides, oxetanes, vinyl ethers and combinations thereof. The second component is present in an effective amount to improve flexibility of the composition in a dried state before and after activation. Also provided are flexible optical waveguides, methods of forming flexible optical waveguides and electronic devices that include a flexible optical waveguide.

Abstract: A composition and method to reduce photolithographic residue and scum formation on a substrate or in a solution, and to reduce or prevent foam formation. The composition contains a diphenyl oxide compound in combination with an antifoam agent. The composition may be added to developer solutions and stripper solutions used in manufacturing printed wiring boards.

Abstract: A composition and method to reduce or to prevent residue and scum formation on a substrate or in a solution. The composition contains an aromatic alkoxylate in combination with a polyol or ether or ester of a polyol. The composition also reduces or prevents foam formation such as in developing processes in the manufacturing of printed wiring boards.

Abstract: A compound having a photoinitiator component joined to a hydrophilic carrier component. The carrier component may contain sufficient hydrophilicity such that the entire compound is water-soluble or water-emulsifiable. The compounds may be employed in light sensitive formulations such as photoresists.

Abstract: A dry film photoresist includes a functional polymer. The functional polymer has &agr;,&bgr;-unsaturated groups and groups that generate a free radical upon exposure to actinic radiation.

Abstract: A photoresist which contains a hydrophilic compound that generates a free-radical polymerization initiator upon exposure to actinic radition. The hydrophilic compound may be employed as a binder polymer or cross-linking agent in a photoresist.

Abstract: A polymer having &agr;,&bgr; unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking.

Abstract: A composition and method to reduce photolithographic residue and scum formation on a substrate or in a solution, and to reduce or prevent foam formation. The composition contains a diphenyl oxide compound in combination with an antifoam agent. The composition may be added to developer solutions and stripper solutions used in manufacturing printed wiring boards.

Abstract: A composition and method to reduce or to prevent residue and scum formation on a substrate or in a solution. The composition contains an aromatic alkoxylate in combination with a polyol or ether or ester of a polyol. The composition also reduces or prevents foam formation such as in developing processes in the manufacturing of printed wiring boards.

Abstract: A stable concentrate and method to reduce or prevent residue and scum formation on a substrate. The stable concentrate has an alkaline component in combination with another compound in a sufficient amount to reduce or prevent the formation of residue and scum on a substrate. The stable concentrate may be employed in developing processes in the manufacturing of printed wiring boards.

Abstract: A cleaning composition composed of a non-chelating organic acid, salt or ester thereof, and a chelating organic acid, salt or ester thereof that may be used to clean residue and scum from a substrate. The cleaning composition is suitable for cleaning residue and scum derived from photoresist.

Abstract: A cleaning composition and method for removing built-up residue and scum on a substrate.

Abstract: A negative-acting photoimageable composition useful as a primary imaging resist in the manufacture of printed circuit boards comprises an acid-functional binder polymer, a photopolymerizable component, and a photoinitiator chemical system, in which all or a portion of the photopolymerizable component comprises a (meth)acrylate functional urethane oligomer, wherein the (meth)acrylate functionality is separated from the urethane linkage by at least two alkylene oxide groups and at least one ring-opened lactone group for improved flexibility, tenting strength, fine line adhesion, developer scumming, coupled with unexpectedly improved resistance to processing chemicals, such as alkaline developing solutions, acid etching solutions, and acid plating baths, and stripping ability in strong alkaline aqueous stripping solutions.

Abstract: A negative-acting photoimageable composition useful as a primary imaging resist in the manufacture of printed circuit boards comprises an acid-functional binder polymer, a photopolymerizable component, and a photoinitiator chemical system, in which all or a portion of the photopolymerizable component comprises a (meth)acrylate functional urethane oligomer, wherein the (meth)acrylate functionality is separated from the urethane linkage by at least two alkylene oxide groups and at least one ring-opened lactone group for improved flexibility, tenting strength, fine line adhesion, developer scumming, coupled with unexpectedly improved resistance to processing chemicals, such as alkaline developing solutions, acid etching solutions, and acid plating baths, and stripping ability in strong alkaline aqueous stripping solutions.

Abstract: An oligomer is provided having tetraacrylate functionality as well as carboxylic acid functionality. The oligomer is useful as a photopolymerizable binder in photoresists for forming printed circuitry. Particular advantages of the oligomer are found in solder mask-forming compositions which must withstand the conditions of nickel/gold plating.

Abstract: An alkaline aqueous developing solution for developing photoresists or the like contains, as an anti-scum agent: A) between about 0.05 and about 1.0 wt % of a first surfactant or surfactant mixture, the first surfactant(s) having the general formula: R—O—(AO)n—H where AO are alkylene oxide units selected from ethylene oxide units (CH2—CH2—O) and propylene oxide units (CH(CH3)—CH2—O) or (CH2—CH(CH3)—O) and mixtures of ethylene and propylene oxide units, either in the mixture of molecules, where R is a hydrophobic group, n is between about 8 and about 200, and B) as a second surfactant, between about 0.05 and 1.0 wt % of an organic salt having the formula: where R is an alkyl or aryl group, preferably phenyl, A is selected from carboxyl, sulfonyl, phosphonyl and mixtures thereof, preferably sulfonyl. M is a charge-balancing cation, and n is between 1 and about 200, preferably between 2 and about 100.