Patents by Inventor Daniel F. Vona, Jr.

Daniel F. Vona, Jr. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Power delivery system
    Patent number: 6970700
    Abstract: A method and apparatus for measuring the characteristics of radio frequency energy in an industrial radio frequency processing system at a plurality of frequencies is disclosed. The method and apparatus measures the characteristics of radio energy using one detector.
    Type: Grant
    Filed: January 31, 2000
    Date of Patent: November 29, 2005
    Assignee: ENI Technology, Inc.
    Inventors: Anthony R. A. Keane, Daniel F. Vona, Jr.
  • Baseband V-I probe
    Patent number: 5770922
    Abstract: An RF probe for a plasma chamber picks up current and voltage samples of the RF power applied to an RF plasma chamber, and the RF voltage and current waveforms are supplied to respective mixers. A local oscillator supplies both mixers with a local oscillator signal at the RF frequency plus or minus about 15 KHz, so that the mixers provide respective voltage and current baseband signals that are frequency shifted down to the audio range. The phase relation of the applied current and voltage is preserved in the baseband signals. These baseband signals are then applied to a stereo, two-channel A/D converter, which provides a serial digital signal to a digital signal processor or DSP. A local oscillator interface brings a feedback signal from the DSP to the local oscillator. The DSP can be suitably programmed to obtain complex Fast Fourier Transforms of the voltage and current baseband samples.
    Type: Grant
    Filed: July 22, 1996
    Date of Patent: June 23, 1998
    Assignee: ENI Technologies, Inc.
    Inventors: Kevin S. Gerrish, Daniel F. Vona, Jr.
  • Baseband RF voltage-current probe
    Patent number: RE38273
    Abstract: An RF probe for a plasma chamber picks up current and voltage samples of the RF power applied to an RF plasma chamber, and the RF voltage and current waveforms are supplied to respective mixers. A local oscillator supplies both mixers with a local oscillator signal at the RF frequency plus or minus about 15 KHz, so that the mixers provide respective voltage and current baseband signals that are frequency shifted down to the audio range. The phase relation to the applied current and voltage is preserved in the baseband signals. These baseband signals are then applied to a stereo, two-channel A/D converter, which provides a serial digital signal to a digital signal processor or DSP. A local oscillator interface brings a feedback signal from the DSP to the local oscillator. The DSP can be suitably programmed to obtain complex Fast Fourier Transforms of the voltage and current baseband samples.
    Type: Grant
    Filed: June 22, 2000
    Date of Patent: October 14, 2003
    Assignee: ENI Technology, Inc.
    Inventors: Kevin S. Gerrish, Daniel F. Vona, Jr.