Patents by Inventor Daniel G. Coronell

Daniel G. Coronell has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process of forming a semiconductor device
    Patent number: 6165567
    Abstract: A film is formed over a substrate using a physical vapor deposition method. When using ionized metal plasma physical vapor deposition, the deposition chamber configuration or operating parameters are adjusted to achieve the desired film characteristics. If the film is to be substantially uniform in thickness across a substrate, the deposition species density is made higher at locations away from the center of the substrate.
    Type: Grant
    Filed: April 12, 1999
    Date of Patent: December 26, 2000
    Assignee: Motorola, Inc.
    Inventors: Peter Lowell George Ventzek, Daniel G. Coronell, Michael J. Hartig, John C. Arnold
  • Process for nitrogen trifluoride synthesis
    Patent number: 5637285
    Abstract: The present invention is directed to a method for the synthesis of nitrogen trifluoride from elemental fluorine gas and a source of ammonia in a gas-liquid phase reaction comprising;3 F.sub.2 +NH.sub.4 H.sub.(x-1) F.sub.x .fwdarw.NF.sub.3 +(3+x)HFwherein the melt ratio HF/NH.sub.3 represented by x in the above formula is at least 2.55 and the reaction liquid is agitated or mixed with a mixing apparatus with power input to the mixing apparatus at a high level equivalent to or greater than 1000 watts per cubic meter. This improved synthesis method allows for enhanced nitrogen trifluoride yields of 70% or greater.
    Type: Grant
    Filed: January 30, 1996
    Date of Patent: June 10, 1997
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Daniel G. Coronell, Thomas H.-L. Hsiung, Howard P. Withers, Jr., Andrew J. Woytek