Patents by Inventor Daniel Gaess

Daniel Gaess has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and process for treating liquids containing chlorosilanes
    Patent number: 9802837
    Abstract: Chlorosilane-containing process streams are treated by vaporizing the process stream, contacting the vaporized process stream with an alkaline medium in a scrubber, the scrubbing liquid being maintained at a pH of 9-13 by introduction of alkaline medium, and feeding the scrubbing medium to a waste treatment plant containing at least one mixing tank in which the pH is adjusted to the range of 7-9 by addition of mineral acid, separating solids by means of a centrifuge, and isolating separated solids.
    Type: Grant
    Filed: March 19, 2014
    Date of Patent: October 31, 2017
    Assignee: WACKER CHEMIE AG
    Inventors: Sebastian Liebischer, Daniel Braeunling, Daniel Gaess, Jeffery Thompson
  • APPARATUS AND PROCESS FOR TREATING LIQUIDS CONTAINING CHLOROSILANES
    Publication number: 20160068408
    Abstract: Chlorosilane-containing process streams are treated by vaporizing the process stream, contacting the vaporized process stream with an alkaline medium in a scrubber, the scrubbing liquid being maintained at a pH of 9-13 by introduction of alkaline medium, and feeding the scrubbing medium to a waste treatment plant containing at least one mixing tank in which the pH is adjusted to the range of 7-9 by addition of mineral acid, separating solids by means of a centrifuge, and isolating separated solids.
    Type: Application
    Filed: March 19, 2014
    Publication date: March 10, 2016
    Inventors: Sebastian LIEBISCHER, Daniel BRAEUNLING, Daniel GAESS, Jeffery THOMPSON
  • Tantalum and niobium compounds
    Patent number: 7667038
    Abstract: The present invention relates to specific, novel tantalum and niobium compounds which can serve as starting materials for the preparation of chemical vapour deposition (CVD) precursors.
    Type: Grant
    Filed: October 10, 2008
    Date of Patent: February 23, 2010
    Assignee: H. C. Starck GmbH
    Inventors: Knud Reuter, Daniel Gaess, Jörg Sundermeyer
  • NOVEL TANTALUM AND NIOBIUM COMPOUNDS
    Publication number: 20090099361
    Abstract: The present invention relates to specific, novel tantalum and niobium compounds which can serve as starting materials for the preparation of chemical vapour deposition (CVD) precursors.
    Type: Application
    Filed: October 10, 2008
    Publication date: April 16, 2009
    Applicant: H. C. Starck GmbH
    Inventors: Knud Reuter, Daniel Gaess, Jorg Sundermeyer
  • TANTALUM AND NIOBIUM COMPOUNDS AND THEIR USE FOR CHEMICAL VAPOUR DEPOSITION (CVD)
    Publication number: 20080038466
    Abstract: The present invention relates to special, novel tantalum and niobium compounds, the use thereof for the deposition of tantalum- or niobium-containing layers by means of chemical vapour deposition and the tantalum- or niobium-containing layers produced by this process.
    Type: Application
    Filed: August 9, 2007
    Publication date: February 14, 2008
    Applicant: H. C. Starck GmbH
    Inventors: Knud Reuter, Stephan Kirchmeyer, Daniel Gaess, Michael Pokoj, Jorg Sundermeyer, Wolfgang Stolz, Thomas Ochs, Kerstin Volz