Abstract: A catoptric system having a reference axis and first, second, and third reflectors. The first reflector contains a pattern-source carrying a substantially one-dimensional pattern. A combination of the second and third reflectors is configured to form an optical image of the pattern, with a demagnification coefficient N>1 in extreme UV light, and with only two beams of light that have originated at the first reflector as a result of irradiation of the first reflector with light incident upon it. An exposure apparatus employing the catoptric system and method of device manufacturing with the use of the exposure apparatus.

Abstract: A catoptric system having a reference axis and first, second, and third reflectors. The first reflector contains a pattern-source carrying a substantially one-dimensional pattern. A combination of the second and third reflectors is configured to form an optical image of the pattern, with a demagnification coefficient N>1 in extreme UV light, and with only two beams of light that have originated at the first reflector as a result of irradiation of the first reflector with light incident upon it. An exposure apparatus employing the catoptric system and method of device manufacturing with the use of the exposure apparatus.

Abstract: Shearography systems provide independent setting of fringe frequency and shear magnitude by situating an interferometer with a tiltable reflector proximate a pupil plane of an imaging optical system. Fringe frequency can be selected based on a modified Savart plate. In other examples, a Wollaston prism or a polarization grating is translated with respect to an image sensor to vary shear magnitude while maintaining a substantially fixed fringe frequency.

Abstract: An integrated optical assembly is provided, with enhancements that are particularly useful when the integrated optical assembly forms part of a laser radar system. The integrated optical assembly produces a reference beam that is related to the optical characteristics of a scanning reflector, or to changes in position or orientation of the scanning reflector relative to a source. Thus, if the scanning reflector orientation were to shift from its intended orientation (due e.g. to thermal expansion) or if characteristics of the scanning reflector (e.g. the index of refraction of the scanning reflector) were to change on account of temperature changes, the reference beam can be used to provide data that can be used to account for such changes. In addition, if the scanning reflector were to be positioned in an orientation other than the orientation desired, the reference beam can be used in identifying and correcting that positioning.

Abstract: An optical system includes a first optical system, a second optical system, and a third optical system. The first optical system divides an input beam into a first light and a second light. The second optical system includes a concave reflective surface which reflects the first light. The third optical system directs at least one of the first light reflected from the second optical system and the second light from the first optical system to an output optical path of the third optical system.

Abstract: Collection reflectors with multiple reflector elements defined on a curved surface are used to collect EUV optical radiation from an EUV emitting area. Each of the reflector elements can image the emitting area at or near a corresponding reflective element of a second multi-element reflector that overlaps radiation from each of the multiple reflector element of the collection reflector to illuminate a grating reticle. Systems with such a collection reflector can use fewer optical elements. In addition, grating reticles are defined on a curve substrate an include a plurality of grating phase steps so that the grating reticle provides phase curvature along two axes but with physical curvature along a single axis. Methods of producing varying duty cycle 1D patterns are also disclosed.

Abstract: Electron beam position, size, or shape can be estimated by deflecting the beam to a plurality of apertures, either continuously or step-wise. Beam portions transmitted, absorbed, or scattered can be used to assess position, size, and shape. In other examples, a beam sensing aperture and the beam are oscillated with respect to each other by moving the aperture or varying the beam deflection or both. The beam can be directed to segmented detectors such as a quad detector, and currents in the segments used to assess beam position, shape, or size. The segments can be formed from a single conductive sheet on which the segments are defined but remain attached. After the conductive sheet is secured with an insulative adhesive, portions of the conductive sheet are broken away, leaving aligned segments.

Abstract: A processing machine (10) for building an object (11) from material (12) includes (i) a material bed assembly (16) that supports the material (12); (ii) a material supply assembly (18) that positions the material (12); (iii) an energy system (22) that directs an energy beam (22A) at the material (12) to build the object (11); (iv) a housing assembly (24) that defines at least a portion of a build chamber (29) for the energy beam (22A), the housing assembly (24) being spaced apart a housing gap (30A) from the material (12); and (v) a seal assembly (26) that creates a housing seal (26A) between the housing assembly (24) and the material (12) to seal the housing gap (30A).

Abstract: 3D metrology techniques are disclosed for determining a changing topography of a substrate processed in an additive manufacturing system. Techniques include fringe scanning, simultaneous fringe projections, interferometry, and x-ray imaging. The techniques can be applied to 3D printing systems to enable rapid topographical measurements of a 3D printer powder bed, or other rapidly moving, nearly continuous surface to be tested. The techniques act in parallel to the system being measured to provide information about system operation and the topography of the product being processed. A tool is provided for achieving higher precision, increasing throughput, and reducing the cost of operation through early detection and diagnosis of operating problems and printing defects. These techniques work well with any powder bed 3D printing system, providing real-time metrology of the powder bed, the most recently printed layer, or both without reducing throughput.

Abstract: A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of two optical reflectors disposed sequentially to transfer EUV radiation incident onto the first optical component to the pattern-source the substantially one-dimensional pattern of which is disposed in a curved surface. In one case, such combination includes only two optical reflectors (each may contain multiple constituent components). The combination is disposed in a fixed spatial and optical relationship with respect to the pattern-source, and represents an illumination unit (IU) of a 1D EUV exposure tool that additionally includes a projection optical sub-system configured to form an optical image of the pattern-source on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.

Abstract: Laser radar include two part objective lenses that are used for imaging a target and directing probe beams to the target. Portions of tracer beams that degrade target images are attenuated with dichroic filters that block central portions of tracer beams. Local oscillator beams can be produced with a mixing lens that directs probe beams through a polarizing beam splitter to focus at or on a waveplate so that portions are reflected from the waveplate as local oscillator beams. An imaging system that is confocal with a probe beam is coupled to provide target measurements or to establish a focus of the probe beam.

Abstract: Extreme ultra-violet (EUV) lithography ruling engine specifically configured to print one-dimensional lines on a target workpiece includes source of EUV radiation; a pattern-source defining 1D pattern; an illumination unit (IU) configured to irradiate the pattern-source; and projection optics (PO) configured to optically image, with a reduction factor N>1, the 1D pattern on image surface that is optically-conjugate to the 1D pattern. Irradiation of the pattern-source can be on-axis or off-axis. While 1D pattern has first spatial frequency, its optical image has second spatial frequency that is at least twice the first spatial frequency. The pattern-source can be flat or curved. The IU may include a relay reflector. A PO's reflector may include multiple spatially-distinct reflecting elements aggregately forming such reflector. The engine is configured to not allow formation of optical image of any 2D pattern that has spatial resolution substantially equal to a pitch of the 1D pattern of the pattern-source.

Abstract: A position encoder for monitoring position of an object includes a target pattern, an illumination system, an image sensor, and a control system. The illumination system generates (i) a first illumination beam that is directed toward and impinges on the target pattern, the first illumination beam having a first beam characteristic; and (ii) a second illumination beam that is directed toward and impinges on the target pattern, the second illumination beam having a second beam characteristic that is different than the first beam characteristic. The image sensor is coupled to the object and is spaced apart from the target pattern. The image sensor senses a first set of information from the first illumination beam impinging on the target pattern and senses a second set of information from the second illumination beam impinging on the target pattern. The control system analyzes the first set of information and the second set of information to monitor the position of the object.

Abstract: A catoptric system having a reference axis and including a reflective pattern-source (carrying a substantially one-dimensional pattern) and a combination of only three optical components disposed sequentially to transfer EUV radiation incident the first optical component onto the pattern-source. The combination is disposed in a fixed spatial and optical relationship with respect to the pattern-source, and represents an illumination unit (IU) of a 1D EUV exposure tool that additionally includes a projection optic sub-system configured to form an optical image of the pattern-source on an image plane with the use of only two beams of radiation. These only two beams of radiation originate at the pattern-source from the EUV radiation transferred onto the pattern-source.

Abstract: Prediction of a distribution of light in an illumination pupil of an illumination system includes identifying component(s) of the illumination system the adjustment of which affects this distribution and simulating the distribution based on a point spread function defined in part by the identified components. The point spread function has functional relationship with configurable setting of the illumination settings.

Abstract: An integrated optical assembly is provided, with enhancements that are particularly useful when the integrated optical assembly forms part of a laser radar system. The integrated optical assembly produces a reference beam that is related to the optical characteristics of a scanning reflector, or to changes in position or orientation of the scanning reflector relative to a source. Thus, if the scanning reflector orientation were to shift from its intended orientation (due e.g. to thermal expansion) or if characteristics of the scanning reflector (e.g. the index of refraction of the scanning reflector) were to change on account of temperature changes, the reference beam can be used to provide data that can be used to account for such changes. In addition, if the scanning reflector were to be positioned in an orientation other than the orientation desired, the reference beam can be used in identifying and correcting that positioning.

Abstract: Extreme ultra-violet (EUV) lithography ruling engine specifically configured to print one-dimensional lines on a target workpiece includes source of EUV radiation; a pattern-source defining 1D pattern; an illumination unit (IU) configured to irradiate the pattern-source; and projection optics (PO) configured to optically image, with a reduction factor N>1, the 1D pattern on image surface that is optically-conjugate to the 1D pattern. Irradiation of the pattern-source can be on-axis or off-axis. While 1D pattern has first spatial frequency, its optical image has second spatial frequency that is at least twice the first spatial frequency. The pattern-source can be flat or curved. The IU may include a relay reflector. A PO's reflector may include multiple spatially-distinct reflecting elements aggregately forming such reflector. The engine is configured to not allow formation of optical image of any 2D pattern that has spatial resolution substantially equal to a pitch of the 1D pattern of the pattern-source.

Abstract: An integrated optical assembly is provided, with enhancements that are particularly useful when the integrated optical assembly forms part of a laser radar system. The integrated optical assembly produces a reference beam that is related to the optical characteristics of a scanning reflector, or to changes in position or orientation of the scanning reflector relative to a source. Thus, if the scanning reflector orientation were to shift from its intended orientation (due e.g. to thermal expansion) or if characteristics of the scanning reflector (e.g. the index of refraction of the scanning reflector) were to change on account of temperature changes, the reference beam can be used to provide data that can be used to account for such changes. In addition, if the scanning reflector were to be positioned in an orientation other than the orientation desired, the reference beam can be used in identifying and correcting that positioning.

Abstract: New and useful concepts for an autofocus system and method are provided. A basic concept uses fringe projection in an autofocus system and method. A further aspect provides spatial filtering concepts for the fringe projection concept. In yet another aspect, the fringe projection autofocus system and method is provided with temporal phase shifting using no moving parts. In a still further aspect, the fringe projection autofocus system and method is provided with unambiguous height measurement concepts.

Abstract: An extreme ultraviolet lithography system (10) that creates a pattern (230) having a plurality of densely packed parallel lines (232) on a workpiece (22) includes a patterning element (16); an EUV illumination system (12) that directs an extreme ultraviolet beam (13A) at the patterning element (16); a projection optical assembly (18) that directs the extreme ultraviolet beam diffracted off of the patterning element (16) at the workpiece (22); and a pattern blind assembly (26) positioned in a beam path (55) of the extreme ultraviolet beam (13A). The pattern blind assembly (26) shapes the extreme ultraviolet beam (13A) so that an exposure field (28) on the workpiece (22) has a polygonal shape.