Abstract: A computing device is provided, including a processor. The processor may generate a three-dimensional device model at least by receiving one or more three-dimensional substrate elements and one or more two-dimensional lithography elements. Generating the three-dimensional device model may further include generating a conformal coating on the one or more three-dimensional substrate elements over a plurality of conformal coating iterations that have respective iteration layer thicknesses. Each conformal coating iteration may include, for each two-dimensional lithography element, generating an iteration layer overlaid on the one or more three-dimensional substrate elements and having an iteration layer shape of at least a portion of that two-dimensional lithography element. Each conformal coating iteration may further include adding the iteration layer to the conformal coating.

Abstract: A computing device is provided, including a processor. The processor may generate a three-dimensional device model at least by receiving one or more three-dimensional substrate elements and one or more two-dimensional lithography elements. Generating the three-dimensional device model may further include generating a conformal coating on the one or more three-dimensional substrate elements over a plurality of conformal coating iterations that have respective iteration layer thicknesses. Each conformal coating iteration may include, for each two-dimensional lithography element, generating an iteration layer overlaid on the one or more three-dimensional substrate elements and having an iteration layer shape of at least a portion of that two-dimensional lithography element. Each conformal coating iteration may further include adding the iteration layer to the conformal coating.