Patents by Inventor Daniel Glöß

Daniel Glöß has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9994950
    Abstract: A method for depositing a piezoelectric film may be provided containing AlN on a substrate by means of magnetron sputtering of at least two targets—of which at least one target contains aluminum—within a vacuum chamber, into which a mixture of gases containing at least reactive nitrogen gas and an inert gas is introduced, and during which magnetron sputtering the unipolar pulse mode and the bipolar pulse mode are alternately used. A film may be provided containing AlN of formula AlXNYOZ, where (0.1?X?1.2); (0.1?Y?1.2) and (0.001?Z?0.1).
    Type: Grant
    Filed: June 24, 2014
    Date of Patent: June 12, 2018
    Assignees: FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V., TU DRESDEN
    Inventors: Hagen Bartzsch, Daniel Glöß, Peter Frach, Stephan Barth
  • Publication number: 20160369390
    Abstract: A method for depositing a piezoelectric film may be provided containing AIN on a substrate by means of magnetron sputtering of at least two targets—of which at least one target contains aluminum—within a vacuum chamber, into which a mixture of gases containing at least reactive nitrogen gas and an inert gas is introduced, and during which magnetron sputtering the unipolar pulse mode and the bipolar pulse mode are alternately used. A film may be provided containing AIN of formula AlXNYOZ, where (0.1?X?1.2); (0.1?Y?1.2) and (0.001?Z?0.
    Type: Application
    Filed: June 24, 2014
    Publication date: December 22, 2016
    Inventors: Hagen Bartzsch, Daniel Glöß, Peter Frach, Stephan Barth