Patents by Inventor Daniel Gomez-Sanchez

Daniel Gomez-Sanchez has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Deposition of Thick Layers of Silicon Dioxide
    Publication number: 20240096616
    Abstract: Silicon dioxide can be deposited onto a substrate by plasma enhanced chemical vapour deposition (PECVD). The substrate includes at least one silicon dioxide layer deposited thereon. A plasma enhanced chemical vapour deposition apparatus can be used to deposit silicon dioxide onto a substrate by plasma enhanced chemical vapour deposition.
    Type: Application
    Filed: August 9, 2023
    Publication date: March 21, 2024
    Inventors: Matt Edmonds, William Royle, Caitlin Lane Jones, Daniel Gomez-Sanchez, Kathrine Crook