Patents by Inventor Daniel H. Choe

Daniel H. Choe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma reactive ion etching of aluminum and aluminum alloys
    Patent number: 4505782
    Abstract: A process for a selective plasma-based reactive ion etching of aluminum and aluminum alloys with silicon and copper, employing gas mixtures having BCl.sub.3 as a major constituent and Cl.sub.2, SiF.sub.4, and O.sub.2 as the minor constituents. The major constituent should constitute 40% to 65% by volume of the mixture.
    Type: Grant
    Filed: September 26, 1983
    Date of Patent: March 19, 1985
    Assignee: LFE Corporation
    Inventors: Adir Jacob, Daniel H. Choe