Abstract: Approaches for remotely controlling a robotic surgery system located at a patient-side location are disclosed. Disclosed approaches reduce transmission delay and ensure reliable transmission for controlling a robotic surgery system from a remote location, which may be in a different city, state, or country. For surgeons, remote surgery facilitates optimal utilization of their time and provides access to a sufficient volume of patients to perfect their skills. For patients, remote surgery creates ample access to the right surgeon and the right care at an affordable price, decreases the need for travel, and reduces delayed care.

Abstract: Approaches for remotely controlling a robotic surgery system located at a patient-side location are disclosed. Disclosed approaches reduce transmission delay and ensure reliable transmission for controlling a robotic surgery system from a remote location, which may be in a different city, state, or country. For surgeons, remote surgery facilitates optimal utilization of their time and provides access to a sufficient volume of patients to perfect their skills. For patients, remote surgery creates ample access to the right surgeon and the right care at an affordable price, decreases the need for travel, and reduces delayed care.

Abstract: Approaches for remotely controlling a robotic surgery system located at a patient-side location are disclosed. Disclosed approaches reduce transmission delay and ensure reliable transmission for controlling a robotic surgery system from a remote location, which may be in a different city, state, or country. For surgeons, remote surgery facilitates optimal utilization of their time and provides access to a sufficient volume of patients to perfect their skills. For patients, remote surgery creates ample access to the right surgeon and the right care at an affordable price, decreases the need for travel, and reduces delayed care.

Abstract: The polarization and diffraction characteristics of x-rays incident upon a magnetic material are manipulated to provide a desired magnetic sensitivity in the material. The contrast in diffracted intensity of opposite helicities of circularly polarized x-rays is measured to permit separation of magnetic signals by element type and by atomic environment. This allows for the direct probing of magnetic signals from elements of the same species in nonequivalent atomic environments to better understand the behavior and characteristics of permanent magnetic materials. By using known crystallographic information together with manipulation of the polarization of x-rays having energies tuned near element-specific electronic excitations and by detecting and comparing the incident and diffracted photons at the same frequency, more accurate magnetic measurements can be made over shorter observation periods.

Abstract: A combination CMP-etch method for forming a thin planar layer over the surface of a device includes the steps of providing a substrate including a plurality of surface projections defining gaps therebetween, forming an etchable layer on the substrate, performing a CMP process on the etchable layer to form a planar layer having a first thickness in excess of 1,000 Angstroms, and etching the planar layer to a second thickness less than 1,000 Angstroms. In a particular method, the step of forming the etchable layer includes the steps of forming an etch resistant layer on the substrate, forming a fill layer on the etch-resistant layer, etching the fill layer to expose portions of the etch-resistant layer overlying the projections, and to leave a portion of the fill layer in the gaps, and forming the etchable layer on the exposed portions of the etch-resistant layer and the fill layer.

Abstract: A method for manufacturing a planar reflective light valve backplane includes the steps of providing a substrate (e.g., a reflective backplane) including a plurality of surface projections (e.g., pixel mirrors) defining gaps therebetween, forming an etch-resistant layer on the substrate, forming a fill layer on the etch resistant layer, and etching the fill layer to expose portions of the etch resistant layer overlying the projections, leaving a portion of the fill layer in the gaps. A particular method includes an optional step of forming a protective layer over the exposed portions of the etch-resistant layer and the fill layer. In another particular method, the etch resistant layer includes an optical thin film layer and an etch-resistant cap layer.

Abstract: A planar wafer based device (e.g., a reflective light valve backplane) includes a substrate having a plurality of surface projections (e.g., pixel mirrors) defining gaps therebetween, an etch-resistant layer formed on the substrate, and a fill layer formed on a portion of the etch-resistant layer in the gaps. In a particular embodiment, the fill layer is a spin-on coating. An optional protective layer formed on the exposed portions of the etch-resistant layer and the fill layer protects the underlying layers during subsequent processing steps.

Abstract: According to one aspect of the invention, a method of fabricating N+ and P+ silicided gates limits diffusion when using a Tungsten, Titanium or Cobalt silicide in the gate fabrication. An example method involves doping a polysilicon structure in first and second dual gate regions and on either side of an undoped polysilicon region, forming a silicide is over the polysilicon structure, and then stuffing the undoped polysilicon region with a species selected to inhibit lateral diffusion of dopant from the polysilicon in the silicide. Subsequently, each gate is completed so that is includes a dielectric layer arranged over the silicide and one of the doped gate poly regions. Applications include logic circuits having embedded-DRAM, and circuits directed to stand-alone logic or stand-alone DRAM.