Abstract: The disclosure is directed to a system and method for determining at least one characteristic of an illumination beam emanating from an illumination source. A substrate having a plurality of apertures may be actuated through an illumination beam so that apertures at different spatial offsets are scanned through the illumination beam at one or more levels of focus. Portions of illumination directed through scanned apertures may be received by at least one detector. At least one characteristic of the illumination beam may be extracted from data points associated with intensity levels associated with detected portions of illumination. Furthermore, multiple determinations of a beam characteristic made over a period of time may be utilized to calibrate the illumination source.