Patents by Inventor Daniel Higgs

Daniel Higgs has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Atomic layer deposition (ALD) for multi-layer ceramic capacitors (MLCCs)
    Patent number: 12533726
    Abstract: The use of Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) applied to powders and intermediates of the MLCC fabrication process can provide significant advantages. Coating metal particles within a defined range of ALD cycles is shown to provide enhanced oxidation resistance. Surprisingly, a very thin ALD layer was found to substantially increase sintering temperature.
    Type: Grant
    Filed: February 18, 2021
    Date of Patent: January 27, 2026
    Assignee: Forge Nano, Inc.
    Inventors: Daniel Higgs, Chris Gump, Karen Buechler, Jennette Warner, Paul Nelson, David M. King, Arrelaine Dameron, James Trevey
  • Hydrophobic Coatings on Glass Having Superior Properties and Methods of Coating Using Atomic or Molecular Deposition
    Publication number: 20250215174
    Abstract: The invention provides substrates coated with a hydrocarbon or fluorocarbon layer. The coated substrate has superior properties such as improved hydrophobicity and/or oleophobicity. Also disclosed are methods of making coatings on substrates using atomic layer deposition (ALD) and/or molecular layer deposition (MLD).
    Type: Application
    Filed: January 2, 2025
    Publication date: July 3, 2025
    Inventors: Chris Gump, Daniel Higgs, Markus Groner, Robert Hall
  • Modification of particles for additive manufacturing
    Patent number: 12275065
    Abstract: Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) provide precise and conformal coatings that are employed to modify the properties of powders for additive manufacturing (AM). We have surprisingly discovered that use of a limited number of ALD cycles can impart improved flowability. In various aspects, the coating may provide one or more advantages such as novel material properties, increased flowability, improved sintering, enhanced stability during storage, and prevention of premature sintering.
    Type: Grant
    Filed: July 9, 2019
    Date of Patent: April 15, 2025
    Assignee: Forge Nano, Inc.
    Inventors: John Barnes, Karen Buechler, Christopher Gump, Daniel Higgs, Paul Nelson, Wayne Simmons
  • Hydrophobic coatings on glass having superior properties and methods of coating using atomic or molecular deposition
    Patent number: 12221519
    Abstract: The invention provides substrates coated with a hydrocarbon or fluorocarbon layer. The coated substrate has superior properties such as improved hydrophobicity and/or oleophobicity. Also disclosed are methods of making coatings on substrates using atomic layer deposition (ALD) and/or molecular layer deposition (MLD).
    Type: Grant
    Filed: April 9, 2019
    Date of Patent: February 11, 2025
    Inventors: Chris Gump, Daniel Higgs, Markus Groner, Robert Hall
  • Atomic Layer Deposition (ALD) for Multi-Layer Ceramic Capacitors (MLCCs)
    Publication number: 20230374659
    Abstract: The use of Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) applied to powders and intermediates of the MLCC fabrication process can provide significant advantages. Coating metal particles within a defined range of ALD cycles is shown to provide enhanced oxidation resistance. Surprisingly, a very thin ALD layer was found to substantially increase sintering temperature.
    Type: Application
    Filed: May 30, 2023
    Publication date: November 23, 2023
    Inventors: Daniel Higgs, Chris Gump, Karen Buechler, Jennette Warner, Paul Nelson
  • Atomic Layer Deposition (ALD) for Multi-Layer Ceramic Capacitors (MLCCs)
    Publication number: 20230104924
    Abstract: The use of Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) applied to powders and intermediates of the MLCC fabrication process can provide significant advantages. Coating metal particles within a defined range of ALD cycles is shown to provide enhanced oxidation resistance. Surprisingly, a very thin ALD layer was found to substantially increase sintering temperature.
    Type: Application
    Filed: February 18, 2021
    Publication date: April 6, 2023
    Inventors: Daniel Higgs, Chris Gump, Karen Buechler, Jeanette Warner, Paul Nelson, David M. King, Arrelaine Dameron, James Trevey
  • Modification Of Particles For Additive Manufacturing
    Publication number: 20210387259
    Abstract: Atomic Layer Deposition (ALD) and Molecular Layer Deposition (MLD) provide precise and conformal coatings that are employed to modify the properties of powders for additive manufacturing (AM). We have surprisingly discovered that use of a limited number of ALD cycles can impart improved flowability. In various aspects, the coating may provide one or more advantages such as novel material properties, increased flowability, improved sintering, enhanced stability during storage, and prevention of premature sintering.
    Type: Application
    Filed: July 9, 2019
    Publication date: December 16, 2021
    Inventors: John Barnes, Karen Buechler, Christopher Gump, Daniel Higgs, Paul Nelson, Wayne Simmons
  • Hydrophobic Coatings on Glass Having Superior Properties and Methods of Coating Using Atomic or Molecular Deposition
    Publication number: 20210163348
    Abstract: The invention provides substrates coated with a hydrocarbon or fluorocarbon layer. The coated substrate has superior properties such as improved hydrophobicity and/or oleophobicity. Also disclosed are methods of making coatings on substrates using atomic layer deposition (ALD) and/or molecular layer deposition (MLD).
    Type: Application
    Filed: April 9, 2019
    Publication date: June 3, 2021
    Inventors: Chris Gump, Daniel Higgs, Markus Groner, Rob Hall
  • Solar Conversion System And Methods
    Publication number: 20140315291
    Abstract: Generally, culturing systems and methods for making and using culturing systems. Specifically, photobioreactor systems and methods for making and using photobioreactor systems to culture photosynthetic organisms, such as algae.
    Type: Application
    Filed: April 18, 2014
    Publication date: October 23, 2014
    Applicant: Superior Ecotech LLC
    Inventors: Daniel Higgs, Philip Calabrese, Martin Gross