Patents by Inventor Daniel J. Baer

Daniel J. Baer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for etch processing with end point detection thereof
    Patent number: 7329328
    Abstract: A method for performing process end point detection in a semiconductor substrate processing system by monitoring for an increase in a flow of backside gas above a predetermined limit.
    Type: Grant
    Filed: December 10, 2004
    Date of Patent: February 12, 2008
    Assignee: Applied Materials, Inc.
    Inventors: Aaron D. Gustafson, Daniel J. Baer, Leonard D. Moravek, John P. Kettley, Jr.
  • Method and apparatus for etch processing with end point detection thereof
    Patent number: 6837965
    Abstract: A method and apparatus performing process end point detection in a semiconductor substrate processing system by monitoring for an increase in a flow of backside gas above a predetermined limit.
    Type: Grant
    Filed: August 14, 2002
    Date of Patent: January 4, 2005
    Inventors: Aaron D. Gustafson, Daniel J. Baer, Leonard D. Moravek, John P. Kettley, Jr.
  • Method and apparatus for etch processing with end point detection thereof
    Publication number: 20040087040
    Abstract: A method and apparatus performing process end point detection in a semiconductor substrate processing system by monitoring for an increase in a flow of backside gas above a predetermined limit.
    Type: Application
    Filed: August 14, 2002
    Publication date: May 6, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Aaron D. Gustafson, Daniel J. Baer, Leonard D. Moravek, John P. Kettley
  • Autocalibrating trip controller with dual adjustable trip points
    Patent number: 5275035
    Abstract: A trip controller for a wafer processing system provides for adjustable hysteresis and autocalibration. Adjustable hysteresis implements different trip points for upward pressure changes and downward pressure changes in the wafer processing chamber. Autocalibration is implemented using a digital potentiometer with on-chip storage. The trip controller provides more reliable operation than conventional single trip-point indicators. Yet, the inventive trip controller is readily inserted as a replacement in systems formerly using conventional trip controllers. Further advantages include a single-rail power supply and flexibility to adapt to different systems requiring trip controllers.
    Type: Grant
    Filed: October 8, 1991
    Date of Patent: January 4, 1994
    Assignee: VLSI Technology, Inc.
    Inventor: Daniel J. Baer