Patents by Inventor Daniel J. Cho
Daniel J. Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12295090Abstract: A system for generating a plasma discharge in liquid utilizes first and second electrodes spaced apart in an interior space of a vessel holding the liquid. A channel can be defined in certain embodiments at least partially by at least one of the first and second electrodes, and an inlet in fluid communication with the interior space is configured to generate a vortical fluid flow in the vessel. A method for generating a plasma discharge in liquid is also provided. A high voltage electrode for generating a plasma discharge in liquid that includes a central solid cylindrical rod is also provided.Type: GrantFiled: February 16, 2022Date of Patent: May 6, 2025Assignee: Onvector LLCInventors: Jun Kang, Daniel J. Cho, HyoungSup Kim, Russel Ryall McAvoy
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Publication number: 20240190727Abstract: A flow-through fluid treatment system for generating a plasma discharge in a fluid includes a high-voltage electrode forming a fluid inlet into a cylindrical flow-through reactor, the fluid inlet having an inlet inner diameter, a ground electrode forming a fluid outlet out of the cylindrical flow-through reactor, the ground electrode and the high-voltage electrode disposed coaxially across a gap between the electrodes in a cylindrical flow-through reactor space, a gas inlet into the cylindrical flow-through reactor, disposed tangentially in an interior wall of the cylindrical flow-through reactor to generate a vortex gas flow within the cylindrical flow-through reactor space, thereby generating a negative gauge pressure within the fluid inlet, and a high-voltage power supply electrically connected to the high-voltage electrode for generating a plasma discharge across the gap, thereby producing plasma treated fluid.Type: ApplicationFiled: December 6, 2023Publication date: June 13, 2024Inventors: Daniel J. Cho, HyoungSup Kim, Russel R. McAvoy
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Publication number: 20230242420Abstract: A water treatment system includes a venturi injector including a venturi inlet that intakes water to be treated, a venturi throat including an orifice in fluid communication with a gas source, a discharge electrode integrated into a gas inlet in fluid communication with the orifice for generating a plasma discharge, thereby producing treated water, and a venturi outlet that discharges the treated water.Type: ApplicationFiled: June 29, 2021Publication date: August 3, 2023Inventors: Daniel J. Cho, Russel R. McAvoy
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Patent number: 11548799Abstract: A water treatment system includes a water inlet that intakes water to be treated, a high voltage (HV) electrode having a porous metal surface area in a range of between 0.1 cm2 and 5 cm2 in fluid communication with the water, such that the water flows through the porous metal surface area of the HV electrode, a ground electrode disposed across a gap from the HV electrode, in fluid communication with the water, a high voltage power supply electrically connected to the HV electrode for generating spark plasma or pulsed electric fields having a rise time equal to or less than 60 nanoseconds (ns) and an amplitude greater than or equal to 30 kV/cm across the gap, thereby producing treated water, and a water outlet that discharges the treated water.Type: GrantFiled: May 11, 2020Date of Patent: January 10, 2023Assignee: Onvector LLCInventor: Daniel J. Cho
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Publication number: 20220174808Abstract: A system for generating a plasma discharge in liquid utilizes first and second electrodes spaced apart in an interior space of a vessel holding the liquid. A channel can be defined in certain embodiments at least partially by at least one of the first and second electrodes, and an inlet in fluid communication with the interior space is configured to generate a vortical fluid flow in the vessel. A method for generating a plasma discharge in liquid is also provided. A high voltage electrode for generating a plasma discharge in liquid that includes a central solid cylindrical rod is also provided.Type: ApplicationFiled: February 16, 2022Publication date: June 2, 2022Inventors: Jun Kang, Daniel J. Cho, HyoungSup Kim, Russel Ryall McAvoy
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Patent number: 11279633Abstract: A system for generating a plasma discharge in liquid utilizes first and second electrodes spaced apart in an interior space of a vessel holding the liquid. A channel can be defined in certain embodiments at least partially by at least one of the first and second electrodes, and an inlet in fluid communication with the interior space is configured to generate a vortical fluid flow in the vessel. A method for generating a plasma discharge in liquid is also provided.Type: GrantFiled: January 28, 2019Date of Patent: March 22, 2022Assignee: Onvector LLCInventors: Jun Kang, Daniel J. Cho, HyoungSup Kim
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Patent number: 11124431Abstract: A water treatment system includes an adsorption column including granular activated carbon (GAC) that adsorbs contaminants from untreated water onto the GAC, thereby producing treated water, a first electrode disposed at a proximal side of the adsorption column, with a gap between the first electrode and the GAC, a second electrode disposed at a distal side of the adsorption column, a drain outlet in fluid communication with the adsorption column for draining water out of the adsorption column, a gas inlet in fluid communication with the adsorption column for injecting a displacement gas into the adsorption column, a high voltage power supply electrically connected to one of the first electrode and the second electrode for generating a plasma discharge within the GAC, thereby regenerating the GAC within the adsorption column, and a gas outlet in fluid communication with the adsorption column for venting waste gas produced by the plasma discharge.Type: GrantFiled: November 27, 2019Date of Patent: September 21, 2021Assignee: Onvector LLCInventor: Daniel J. Cho
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Publication number: 20200361797Abstract: A water treatment system includes a water inlet that intakes water to be treated, a high voltage (HV) electrode having a porous metal surface area in a range of between 0.1 cm2 and 5 cm2 in fluid communication with the water, such that the water flows through the porous metal surface area of the HV electrode, a ground electrode disposed across a gap from the HV electrode, in fluid communication with the water, a high voltage power supply electrically connected to the HV electrode for generating spark plasma or pulsed electric fields having a rise time equal to or less than 60 nanoseconds (ns) and an amplitude greater than or equal to 30 kV/cm across the gap, thereby producing treated water, and a water outlet that discharges the treated water.Type: ApplicationFiled: May 11, 2020Publication date: November 19, 2020Applicant: ONVECTOR LLCInventor: Daniel J. Cho
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Publication number: 20200171409Abstract: A water treatment system includes an adsorption column including granular activated carbon (GAC) that adsorbs contaminants from untreated water onto the GAC, thereby producing treated water, a first electrode disposed at a proximal side of the adsorption column, with a gap between the first electrode and the GAC, a second electrode disposed at a distal side of the adsorption column, a drain outlet in fluid communication with the adsorption column for draining water out of the adsorption column, a gas inlet in fluid communication with the adsorption column for injecting a displacement gas into the adsorption column, a high voltage power supply electrically connected to one of the first electrode and the second electrode for generating a plasma discharge within the GAC, thereby regenerating the GAC within the adsorption column, and a gas outlet in fluid communication with the adsorption column for venting waste gas produced by the plasma discharge.Type: ApplicationFiled: November 27, 2019Publication date: June 4, 2020Applicant: ONVECTOR LLCInventor: Daniel J. Cho
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Patent number: 10598580Abstract: The present invention relates to the field of liquid viscosity measurement using a capillary tube. The invention pertains to novel methods that use surface tension driven flow for the measurement of viscosity of a liquid over a range of shear rates.Type: GrantFiled: December 21, 2015Date of Patent: March 24, 2020Assignee: HEALTH ONVECTOR INCInventors: Daniel J. Cho, Joseph Weidman
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Publication number: 20190241447Abstract: A system for generating a plasma discharge in liquid utilizes first and second electrodes spaced apart in an interior space of a vessel holding the liquid. A channel can be defined in certain embodiments at least partially by at least one of the first and second electrodes, and an inlet in fluid communication with the interior space is configured to generate a vortical fluid flow in the vessel. A method for generating a plasma discharge in liquid is also provided.Type: ApplicationFiled: January 28, 2019Publication date: August 8, 2019Inventors: Jun Kang, Daniel J. Cho, HyoungSup Kim
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Patent number: 10167209Abstract: A treatment system for treating water, such as produced water that is produced during hydraulic fracturing. The system employs a combination of a plasma spark discharge and an RF oscillating electric field. The plasma spark discharge and the RF oscillating electric field may be employed simultaneously or in an overlapping manner within a chamber to treat the water. The treatment system is able to kill microorganisms as well as reduce or eliminate fouling due to, for example, bicarbonates. In some embodiments, grids are employed to further enhance the heat produced by the RF oscillating electric field.Type: GrantFiled: November 30, 2015Date of Patent: January 1, 2019Assignee: DREXEL UNIVERISITYInventors: Young I. Cho, Alexander Fridman, Daniel J. Cho, Alexander Rabinovich
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Publication number: 20180356325Abstract: The present invention relates to the field of liquid viscosity measurement using a capillary tube. The invention pertains to novel methods that use surface tension driven flow for the measurement of viscosity of a liquid over a range of shear rates.Type: ApplicationFiled: December 21, 2015Publication date: December 13, 2018Inventors: Daniel J. Cho, Joseph Weidman
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Patent number: 9695068Abstract: The present invention consists of a method of pre-treatment of adulterated water for distillation, including adulterated water produced during hydraulic fracturing (“fracking”) of shale rock during natural gas drilling. In particular, the invention is directed to a method of treating adulterated water, said adulterated water having an initial level of bicarbonate ion in a range of about 250 ppm to about 5000 ppm and an initial level of calcium ion in a range of about 500 ppm to about 50,000 ppm, said method comprising contacting the adulterated water with a non-thermal arc discharge plasma to produce plasma treated water having a level of bicarbonate ion of less than about 100 ppm. Optionally, the plasma treated water may be further distilled.Type: GrantFiled: November 5, 2013Date of Patent: July 4, 2017Assignee: Drexel UniversityInventors: Young I. Cho, Alexander Fridman, Alexander Rabinovich, Daniel J. Cho
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Patent number: 9540257Abstract: A plasma spark discharge reactor for treating water. The plasma spark discharge reactor comprises a HV electrode with a head and ground electrode that surrounds at least a portion of the HV electrode. A passage for gas may pass through the reactor to a location proximate to the head to provide controlled formation of gas bubbles in order to facilitate the plasma spark discharge in a liquid environment.Type: GrantFiled: November 4, 2015Date of Patent: January 10, 2017Assignee: Drexel UniversityInventors: Young I. Cho, Daniel J. Cho, Alexander Fridman, Hyoungsup Kim
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Publication number: 20170000414Abstract: The invention comprises a method of using blood flow parameters to optimize the therapeutic efficacy of an antiplatelet agent in the treatment of a disease or disorder associated with abnormal hemodynamic thrombogenicity in a subject.Type: ApplicationFiled: February 4, 2015Publication date: January 5, 2017Inventor: Daniel J. Cho
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Publication number: 20160152494Abstract: A treatment system for treating water, such as produced water that is produced during hydraulic fracturing. The system employs a combination of a plasma spark discharge and an RF oscillating electric field. The plasma spark discharge and the RF oscillating electric field may be employed simultaneously or in an overlapping manner within a chamber to treat the water. The treatment system is able to kill microorganisms as well as reduce or eliminate fouling due to, for example, bicarbonates. In some embodiments, grids are employed to further enhance the heat produced by the RF oscillating electric field.Type: ApplicationFiled: November 30, 2015Publication date: June 2, 2016Applicant: Drexel UniversityInventors: Young I. Cho, Alexander Fridman, Daniel J. Cho, Alexander Rabinovich
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Publication number: 20160137529Abstract: A plasma spark discharge reactor for treating water. The plasma spark discharge reactor comprises a HV electrode with a head and ground electrode that surrounds at least a portion of the HV electrode. A passage for gas may pass through the reactor to a location proximate to the head to provide controlled formation of gas bubbles in order to facilitate the plasma spark discharge in a liquid environment.Type: ApplicationFiled: November 4, 2015Publication date: May 19, 2016Applicant: DREXEL UNIVERSITYInventors: Young I. Cho, Daniel J. Cho, Alexander Fridman, Hyoungsup Kim
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Publication number: 20140124357Abstract: The present invention consists of a method of pre-treatment of adulterated water for distillation, including adulterated water produced during hydraulic fracturing (“fracking”) of shale rock during natural gas drilling. In particular, the invention is directed to a method of treating adulterated water, said adulterated water having an initial level of bicarbonate ion in a range of about 250 ppm to about 5000 ppm and an initial level of calcium ion in a range of about 500 ppm to about 50,000 ppm, said method comprising contacting the adulterated water with a non-thermal arc discharge plasma to produce plasma treated water having a level of bicarbonate ion of less than about 100 ppm. Optionally, the plasma treated water may be further distilled.Type: ApplicationFiled: November 5, 2013Publication date: May 8, 2014Applicant: DREXEL UNIVERSITYInventors: YOUNG I. CHO, ALEXANDER FRIDMAN, ALEXANDER RABINOVICH, DANIEL J. CHO
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Patent number: 8536123Abstract: A method that includes a measurement of hemoglobin or hematocrit with a measurement of hemodynamic parameters to monitor and/or control a modality of treatment of a patient suffering from anemia.Type: GrantFiled: January 9, 2009Date of Patent: September 17, 2013Assignee: Health Onvector Inc.Inventor: Daniel J. Cho