Abstract: A method and apparatus is disclosed for operating a laser output light beam pulse line narrowing mechanism that may comprise a nominal center wavelength and bandwidth selection optic; a static wavefront compensation mechanism shaping the curvature of the selection optic; an active wavefront compensation mechanism shaping the curvature of the selection optic and operating independently of the static wavefront compensation mechanism. The method and apparatus may comprise the nominal center wavelength and bandwidth selection optic comprises a grating; the static wavefront compensation mechanism applies a pre-selected bending moment to the grating; the active wavefront compensation mechanism applies a separate selected bending moment to the grating responsive to the control of a bending moment controller based on bandwidth feedback from a bandwidth monitor monitoring the bandwidth of the laser output light beam pulses. The active wavefront compensation mechanism may comprise a pneumatic drive mechanism.

Abstract: In a first aspect, a lithography apparatus may comprise a mask designed using optical proximity correction (OPC), a pulsed laser source, and an active bandwidth control system configured to increase the bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is below a predetermined bandwidth range and increase a bandwidth of a subsequent pulse in response to a measured pulse bandwidth that is above the predetermined bandwidth range. In another aspect an active bandwidth control system may include an optic for altering a wavefront of a laser beam in a laser cavity of the laser source to selectively adjust an output laser bandwidth in response to the control signal. In yet another aspect, the bandwidth of a laser having a wavelength variation across an aperture may be actively controlled by an aperture blocking element that is moveable to adjust a size of the aperture.

Abstract: An apparatus and method is disclosed which may comprise a high power excimer or molecular fluorine gas discharge laser DUV light source system which may comprise: a pulse stretcher which may comprise: an optical delay path mirror, an optical delay path mirror gas purging assembly which may comprise: a purging gas supply system directing purging gas across a face of the optical delay line mirror. The optical delay path mirror may comprise a plurality of optical delay path mirrors; the purging gas supply system may direct purging gas across a face of each of the plurality of optical delay line mirrors. The purging gas supply system may comprise: a purging gas supply line; a purging gas distributing and directing mechanism which may direct purging gas across the face of the respective optical delay path mirror.

Abstract: A method and apparatus is disclosed for operating a laser output light beam pulse line narrowing mechanism that may comprise a nominal center wavelength and bandwidth selection optic; a static wavefront compensation mechanism shaping the curvature of the selection optic; an active wavefront compensation mechanism shaping the curvature of the selection optic and operating independently of the static wavefront compensation mechanism. The method and apparatus may comprise the nominal center wavelength and bandwidth selection optic comprises a grating; the static wavefront compensation mechanism applies a pre-selected bending moment to the grating; the active wavefront compensation mechanism applies a separate selected bending moment to the grating responsive to the control of a bending moment controller based on bandwidth feedback from a bandwidth monitor monitoring the bandwidth of the laser output light beam pulses. The active wavefront compensation mechanism may comprise a pneumatic drive mechanism.

Abstract: A modular three-dimensional (3D) optical switch that is scalable and that provides monitor and control of MEMS mirror arrays. A first switch module includes an array of input channels. Light beams received from the input channels are directed toward a first wavelength selective mirror. The light beams are reflected off of the first wavelength selective mirror and onto a first array of moveable micromirrors. The moveable micromirrors are adjusted so that the light beams reflect therefrom and enter a second switch module where they impinge upon a second array of moveable micromirrors. The light beams reflect off of the second array of moveable micromirrors and impinge upon a second wavelength selective mirror. The light beams reflect off of the second wavelength selective mirror and into an array of output channels. The alignment or misalignment of a data path through the switch is detected by directing two monitor beams through the data path, one in the forward direction and one in the reverse direction.

Abstract: A polarimeter with a polarization state generator and a polarization state analyzer mounted together on a single rotary mount. This novel structure allows built-in alignment and synchronization of the polarization state analyzer and the polarization state generator. Because of this built-in alignment and synchronization, polarization properties of samples can be measured quickly, accurately, inexpensively, and reliably. The instrument can measure polarization properties of remote samples, without placing the sample inside the instrument. The surrounding lenses and mirrors are designed in such a way that light leaving the instrument will pass through the polarization state generator and light returning into the instrument will pass through the polarization state analyzer and onto a photodetector. Samples can be measured directly in reflection or in small-angle backscatter; or they can be measured in double-pass transmission with the addition of a mirror or retroreflector.