Patents by Inventor Daniel J. Teff

Daniel J. Teff has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Additives to prevent degradation of cyclic alkene derivatives
    Patent number: 8252704
    Abstract: This disclosure relates to compositions that include (a) at least one substituted or unsubstituted cyclic alkene, and (b) an antioxidant composition including at least one compound of Formula (I): R1 through R4 in Formula (I) are described in the specification.
    Type: Grant
    Filed: July 11, 2011
    Date of Patent: August 28, 2012
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Daniel J. Teff, John L. Chagolla
  • Additives to Prevent Degradation of Cyclic Alkene Derivatives
    Publication number: 20110259242
    Abstract: This disclosure relates to compositions that include (a) at least one substituted or unsubstituted cyclic alkene, and (b) an antioxidant composition including at least one compound of Formula (I): R1 through R4 in Formula (I) are described in the specification.
    Type: Application
    Filed: July 11, 2011
    Publication date: October 27, 2011
    Applicant: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Daniel J. Teff, John L. Chagolla
  • Additives to prevent degradation of cyclic alkene derivatives
    Patent number: 7985350
    Abstract: This disclosure relates to compositions that include (a) at least one substituted or unsubstituted cyclic alkene, and (b) an antioxidant composition including at least one compound of Formula (I): R1 through R4 in Formula (I) are described in the specification.
    Type: Grant
    Filed: December 21, 2010
    Date of Patent: July 26, 2011
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Daniel J. Teff, John L. Chagolla
  • Additives to prevent degradation of cyclic alkene derivatives
    Patent number: 7931823
    Abstract: A stabilized cyclic alkene composition comprising one or more cyclic alkenes, and at least one antioxidant compound having the formula (I), wherein R1 through R5 can each independently be H, OH, C1-C8 linear, branched, or cyclic alkyl, C1-C8 linear, branched, or cyclic alkoxy or substituted or unsubstituted aryl, and wherein the antioxidant compound is present in an amount between 1 ppm and 200 ppm and has a boiling point lower than 265° C. A method for forming a layer of carbon-doped silicon oxide on a substrate, which uses the stabilized alkene composition and a silicon containing compound.
    Type: Grant
    Filed: September 12, 2006
    Date of Patent: April 26, 2011
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Daniel J. Teff, John L. Chagolla
  • Additives to Prevent Degradation of Cyclic Alkene Derivatives
    Publication number: 20110091651
    Abstract: This disclosure relates to compositions that include (a) at least one substituted or unsubstituted cyclic alkene, and (b) an antioxidant composition including at least one compound of Formula (I): R1 through R4 in Formula (I) are described in the specification.
    Type: Application
    Filed: December 21, 2010
    Publication date: April 21, 2011
    Applicant: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Daniel J. Teff, John L. Chagolla
  • Additives to prevent degradation of cyclic alkene derivatives
    Patent number: 7883639
    Abstract: A stabilized cyclic alkene composition comprising one or more cyclic alkenes, and at least one antioxidant compound having the formula (I), wherein R1 through R5 can each independently be H, OH, C1-C8 linear, branched, or cyclic alkyl, C1-C8 linear, branched, or cyclic alkoxy or substituted or unsubstituted aryl, and wherein the antioxidant compound is present in an amount between 1 ppm and 200 ppm, and wherein said composition is purged with at least one inert gas after said composition is introduced to a container intended for storage or shipping of said composition. A method for forming a layer of carbon-doped silicon oxide on a substrate, which uses the stabilized alkene composition and a silicon containing compound.
    Type: Grant
    Filed: September 12, 2006
    Date of Patent: February 8, 2011
    Assignee: Fujifilm Electronic Materials, U.S.A., Inc.
    Inventors: Daniel J. Teff, John L. Chagolla
  • Additives to prevent degradation of cyclic alkene derivatives
    Patent number: 7871536
    Abstract: This disclosure relates to compositions that includes (a) one or more substituted or unsubstituted cyclic alkenes, and (b) an antioxidant composition including at least one compound of Formula (I): R1 through R4 in Formula (I) are described in the specification.
    Type: Grant
    Filed: July 7, 2009
    Date of Patent: January 18, 2011
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Daniel J. Teff, John L. Chagolla
  • Additives to Prevent Degradation of Cyclic Alkene Derivatives
    Publication number: 20090291210
    Abstract: This disclosure relates to compositions that includes (a) one or more substituted or unsubstituted cyclic alkenes, and (b) an antioxidant composition including at least one compound of Formula (I): R1 through R4 in Formula (I) are described in the specification.
    Type: Application
    Filed: July 7, 2009
    Publication date: November 26, 2009
    Applicant: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Daniel J. Teff, John L. Chagolla
  • Additives to prevent degradation of alkyl-hydrogen siloxanes
    Patent number: 7531590
    Abstract: An organohydrosiloxane composition comprising: a) one or more organohydrosiloxane compounds, each having at least one [—HSiR—O—] unit, wherein R?C1-C18 linear, branched, or cyclic alkyl, C1-C18 linear, branched, or cyclic alkoxy, or substituted or unsubstituted aryl, and b) an antioxidant compound shown in Formula (1) wherein the antioxidant compound is a phenolic compound and is present in a concentration from about 1 ppm to about 5,000 ppm and wherein R1 through R5 can each independently be H, OH, C1-C18 linear, branched, or cyclic alkyl, C1-C18 linear, branched, or cyclic alkoxy or substituted or unsubstituted aryl. The compositions of present invention exhibit stability and significantly extend the shelf life of organohydrosiloxane products and allow greater flexibility in handling these products in chemical processes or semiconductor manufacturing. The resulting stabilization of siloxanes prevents the possibility of complete polymerization (i.e.
    Type: Grant
    Filed: July 31, 2006
    Date of Patent: May 12, 2009
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Daniel J. Teff, Gregory B. Smith, John L. Chagolla, Tim S. Andreyka
  • Additives to prevent degradation of alkyl-hydrogen siloxanes
    Patent number: 7129311
    Abstract: An organohydrosiloxane composition comprising: a) one or more organohydrosiloxane compounds, each having at least one [—HSiR—O—] unit, wherein R?C1–C18 linear, branched, or cyclic alkyl, C1–C18 linear, branched, or cyclic alkoxy, or substituted or unsubstituted aryl, and b) an antioxidant compound shown in Formula (1) ?wherein the antioxidant compound is a phenolic compound and is present in a concentration from about 1 ppm to about 5,000 ppm and wherein R1 through R5 can each independently be H, OH, C1–C18 linear, branched, or cyclic alkyl, C1–C18 linear, branched, or cyclic alkoxy or substituted or unsubstituted aryl. The compositions of present invention exhibit stability and significantly extend the shelf life of organohydrosiloxane products and allow greater flexibility in handling these products in chemical processes or semiconductor manufacturing. The resulting stabilization of siloxanes prevents the possibility of complete polymerization (i.e.
    Type: Grant
    Filed: September 18, 2003
    Date of Patent: October 31, 2006
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Daniel J. Teff, Gregory B. Smith, John L. Chagolla, Tim S. Andreyka
  • Additives to prevent degradation of alkyl-hydrogen siloxanes
    Publication number: 20040127070
    Abstract: An organohydrosiloxane composition comprising:
    Type: Application
    Filed: September 18, 2003
    Publication date: July 1, 2004
    Applicant: Arch Specialty Chemicals, Inc.
    Inventors: Daniel J. Teff, Gregory B. Smith, John L. Chagolla, Tim S. Andreyka