Abstract: A power supply system includes a digital-to-analogue converter (DAC) configured to generate an analogue signal and an amplifier path on which the analogue signal is amplified to generate a high-frequency power signal to be provided to a plasma chamber for supplying a plasma process with high-frequency power. The DAC is configured to be connected to an arc detection device that is configured to monitor the plasma chamber for arcs and be controlled by the arc detection device to modify the analogue signal in response to detecting an occurrence of an arc.

Abstract: A method for producing an arc detection signal on the basis of a plurality of observation signals comprises producing an arc detection part-signal for each of at least two observation signals. Producing each of the part-signals includes correlating the respective observation signal with a correlation signal by influencing the correlation signal with the respective observation, thereby producing a correlation result; producing or modifying a coefficient on the basis of the correlation result; and weighting the respective observation signal with the coefficient. The arc detection part-signals are added to form the arc detection signal.

Abstract: A power supply system includes a digital-to-analogue converter (DAC) configured to generate an analogue signal and an amplifier path on which the analogue signal is amplified to generate a high-frequency power signal to be provided to a plasma chamber for supplying a plasma process with high-frequency power. The DAC is configured to be connected to an arc detection device that is configured to monitor the plasma chamber for arcs and be controlled by the arc detection device to modify the analogue signal in response to detecting an occurrence of an arc.

Abstract: A power supply system includes a power converter configured to generate a high-frequency power signal and connected to a load to supply a plasma process or a gas laser process with power. The power converter has at least one amplifier path including at least one amplifier, an analog signal generated from a digital signal by a digital-analog converter (DAC) being supplied to the amplifier path, and a logic circuit unit configured to generate the digital signal and connected upstream of the DAC. The logic circuit unit has a signal data memory for storing signal data values for generating an analog signal form, an amplitude data memory for storing amplitude data values for influencing amplitudes of the analog signals, and a multiplier for multiplying the signal data values by the amplitude data values. The power converter includes an adjustable voltage supply for supplying the amplifier with a voltage.

Abstract: An arc extinguishing method for extinguishing arcs in a plasma chamber of a plasma system, comprising providing a plasma operating power during a plasma operation to the plasma chamber for generating plasma in the plasma chamber and carrying out a plasma-processing process using the generated plasma, by generating an analog signal by a digital-to-analog converter (DAC) and amplifying the generated analog signal on an amplifier path, monitoring, by an arc detection device, the plasma system for arcs, and in response to detecting an occurrence of an arc, controlling the DAC by the arc detection device such that the generated analog signal by the DAC is modified.

Abstract: A power supply system includes a power converter configured to generate a high-frequency power signal and connected to a load to supply a plasma process or a gas laser process with power. The power converter has at least one amplifier path including at least one amplifier, an analog signal generated from a digital signal by a digital-analog converter (DAC) being supplied to the amplifier path, and a logic circuit unit configured to generate the digital signal and connected upstream of the DAC. The logic circuit unit has a signal data memory for storing signal data values for generating an analog signal form, an amplitude data memory for storing amplitude data values for influencing amplitudes of the analog signals, and a multiplier for multiplying the signal data values by the amplitude data values. The power converter includes an adjustable voltage supply for supplying the amplifier with a voltage.

Abstract: A power-supply system has a power converter configured to generate a high-frequency power signal and supply the high-frequency power signal to a load such as a plasma or gas laser process. The power converter includes a digital-to-analog converter (DAC) configured to generate an analog signal from a digital signal, an amplifier path in which the generated analog signal is amplified, and a logic-circuit unit coupled upstream of the DAC and configured to generate the digital signal and supply the generated digital signal to the DAC. The logic-circuit unit includes a signal-data buffer storing a signal-data value for generating a shape of the analog signal, an amplitude-data buffer storing an amplitude-data value for influencing an amplitude of the analog signal, and a multiplier configured to multiply the signal-data value by the amplitude-data value.

Abstract: An arc extinguishing method for extinguishing arcs in a plasma chamber of a plasma system, comprising providing a plasma operating power during a plasma operation to the plasma chamber for generating plasma in the plasma chamber and carrying out a plasma-processing process using the generated plasma, by generating an analogue signal by a digital-to-analogue converter (DAC) and amplifying the generated analogue signal on an amplifier path, monitoring, by an arc detection device, the plasma system for arcs, and in response to detecting an occurrence of an arc, controlling the DAC by the arc detection device such that the generated analogue signal by the DAC is modified.

Abstract: A power-supply system has a power converter configured to generate a high-frequency power signal and supply the high-frequency power signal to a load such as a plasma or gas laser process. The power converter includes a digital-to-analogue converter (DAC) configured to generate an analogue signal from a digital signal, an amplifier path in which the generated analogue signal is amplified, and a logic-circuit unit coupled upstream of the DAC and configured to generate the digital signal and supply the generated digital signal to the DAC. The logic-circuit unit includes a signal-data buffer storing a signal-data value for generating a shape of the analogue signal, an amplitude-data buffer storing an amplitude-data value for influencing an amplitude of the analogue signal, and a multiplier configured to multiply the signal-data value by the amplitude-data value.

Abstract: A method for producing an arc detection signal on the basis of a plurality of observation signals comprises producing an arc detection part-signal for each of at least two observation signals. Producing each of the part-signals includes correlating the respective observation signal with a correlation signal by influencing the correlation signal with the respective observation, thereby producing a correlation result; producing or modifying a coefficient on the basis of the correlation result; and weighting the respective observation signal with the coefficient. The arc detection part-signals are added to form the arc detection signal.

Abstract: One aspect of the invention includes a directional coupler having a coupling factor in the forward direction determined from the equation Cf=Cf·ej?Cf, a coupling factor in the reverse direction determined from the equation Cr=Cr·ej?Cr, an isolation in the forward direction determined from the equation If=If·ej?If, and an isolation in the reverse direction determined from the equation Ir=Ir·ej?Ir, wherein at least one condition is met from among the group consisting of: (1) the absolute value of ??=?Cr+?Cf?(?Ir+?If) being less than or equal to 20°, K = C f C r * I r I f ( 2 ) is less than or equal to 1.6, and (3) Cf=Cr and If=Ir.

Abstract: An HF plasma process excitation configuration includes an HF generator that is connected to a plasma load through a directional coupler. The directional coupler includes a transmission line, a first coupling line for detecting reflected power from the plasma load, and a second coupling line for detecting forward power from the HF generator, is the first coupling line is spaced apart from the transmission line and is terminated at least at one end with a termination resistance. The second coupling line is spaced apart from the transmission line and is terminated at least at one end with a termination resistance. Each coupling line has a predetermined and adjusted characteristic impedance, and the termination resistances each have a resistance value that corresponds within a tolerance to the characteristic impedance of the associated coupling line with a tolerance.

Abstract: One aspect of the invention includes a directional coupler having a coupling factor in the forward direction determined from the equation Cf=Cf·ej?Cf, a coupling factor in the reverse direction determined from the equation Cr=Cr·ej?Cr, an isolation in the forward direction determined from the equation If=If·ej?If, and an isolation in the reverse direction determined from the equation Ir=Ir·ej?Ir, wherein at least one condition is met from among the group consisting of: (1) the absolute value of ??=?Cr+?Cf?(?Ir+?If) being less than or equal to 20°, K = C f C r * I r I f ( 2 ) is less than or equal to 1.6, and (3) Cf=Cr and If=Ir.

Abstract: An HF plasma process excitation configuration includes an HF generator that is connected to a plasma load through a directional coupler. The directional coupler includes a transmission line, a first coupling line for detecting reflected power from the plasma load, and a second coupling line for detecting forward power from the HF generator, is the first coupling line is spaced apart from the transmission line and is terminated at least at one end with a termination resistance. The second coupling line is spaced apart from the transmission line and is terminated at least at one end with a termination resistance. Each coupling line has a predetermined and adjusted characteristic impedance, and the termination resistances each have a resistance value that corresponds within a tolerance to the characteristic impedance of the associated coupling line with a tolerance.

Abstract: A measuring device of an HF plasma system includes an uncoupling device for uncoupling one or a plurality of signals related to a power and at least one filter arrangement to which such a signal is transmitted. The filter arrangement is designed as a band pass filter arrangement and includes a first and a second filter element between which a decoupling device is arranged.