Abstract: A processing device has a plurality of interfaces and a plurality of processors. During different phases of execution of a computer program, different processors are associated with different interfaces, such that the connectivity between processors and interfaces for the sending of egress data and the receiving of ingress data may change during execution of that computer program. The change in this connectivity is directed by the compiled code running on the processors. The compiled code selects which buses associated with which interfaces, given processors are to connect to for receipt of ingress data. Furthermore, the compiled code causes control messages to be sent to circuitry associated with the interfaces, so as to control which buses associated with which processors, given interfaces are to connect to.

Abstract: A multi-tile processing unit in which the tiles in the processing unit may be divided between two or more different external sync groups for performing barrier synchronisations. In this way, different sets of tiles of the same processing unit each sync with different sets of tiles external to that processing unit.

Abstract: Methods for recovering manganese etchant solutions are provided wherein a process solution used to rinse or neutralize a nonconductive substrate after etching the substrate is collected and evaporated to provide a concentrated process solution that is fed back into the manganese etchant solution or acid rinse.

Abstract: Methods for recovering manganese etchant solutions are provided wherein a process solution used to rinse or neutralize a nonconductive substrate after etching the substrate is collected and evaporated to provide a concentrated process solution that is fed back into the manganese etchant solution or acid rinse.

Abstract: Methods for recovering manganese etchant solutions are provided wherein a process solution used to rinse or neutralize a nonconductive substrate after etching the substrate is collected and evaporated to provide a concentrated process solution that is fed back into the manganese etchant solution or acid rinse.

Abstract: Methods for recovering manganese etchant solutions are provided wherein a process solution used to rinse or neutralize a nonconductive substrate after etching the substrate is collected and evaporated to provide a concentrated process solution that is fed back into the manganese etchant solution or acid rinse.

Abstract: Methods and systems for removing water from a manganese-based etchant bath are disclosed. Water is removed from the manganese-based etchant bath by transferring a portion of the manganese-based etchant bath to a vacuum evaporator for processing and transferring the concentrated portion of the manganese-based etchant bath back to the manganese-based etchant bath.