Patents by Inventor Daniel Lacey

Daniel Lacey has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200222825
    Abstract: Methods for recovering manganese etchant solutions are provided wherein a process solution used to rinse or neutralize a nonconductive substrate after etching the substrate is collected and evaporated to provide a concentrated process solution that is fed back into the manganese etchant solution or acid rinse.
    Type: Application
    Filed: January 20, 2020
    Publication date: July 16, 2020
    Applicant: SRG GLOBAL, LLC
    Inventors: Mark Bauman, DANIEL LACEY, GERRY VOGELPOHL
  • Patent number: 10569186
    Abstract: Methods for recovering manganese etchant solutions are provided wherein a process solution used to rinse or neutralize a nonconductive substrate after etching the substrate is collected and evaporated to provide a concentrated process solution that is fed back into the manganese etchant solution or acid rinse.
    Type: Grant
    Filed: July 10, 2018
    Date of Patent: February 25, 2020
    Assignee: SRG GLOBAL, INC.
    Inventors: Mark Bauman, Daniel Lacey, Gerry Vogelpohl
  • Patent number: 10537824
    Abstract: Methods for recovering manganese etchant solutions are provided wherein a process solution used to rinse or neutralize a nonconductive substrate after etching the substrate is collected and evaporated to provide a concentrated process solution that is fed back into the manganese etchant solution or acid rinse.
    Type: Grant
    Filed: July 10, 2018
    Date of Patent: January 21, 2020
    Assignee: SRG GLOBAL, INC.
    Inventors: Mark Bauman, Daniel Lacey, Gerry Vogelpohl
  • Publication number: 20190009185
    Abstract: Methods and systems for removing water from a manganese-based etchant bath are disclosed. Water is removed from the manganese-based etchant bath by transferring a portion of the manganese-based etchant bath to a vacuum evaporator for processing and transferring the concentrated portion of the manganese-based etchant bath back to the manganese-based etchant bath.
    Type: Application
    Filed: July 9, 2018
    Publication date: January 10, 2019
    Applicant: SRG Global, Inc.
    Inventors: Mark Bauman, Daniel Lacey, Gerry Vogelpohl
  • Publication number: 20190009184
    Abstract: Methods for recovering manganese etchant solutions are provided wherein a process solution used to rinse or neutralize a nonconductive substrate after etching the substrate is collected and evaporated to provide a concentrated process solution that is fed back into the manganese etchant solution or acid rinse.
    Type: Application
    Filed: July 10, 2018
    Publication date: January 10, 2019
    Applicant: SRG Global, Inc.
    Inventors: Mark Bauman, Daniel Lacey, Gerry Vogelpohl
  • Patent number: D921814
    Type: Grant
    Filed: August 28, 2019
    Date of Patent: June 8, 2021
    Assignee: Vara Corporation
    Inventors: Timothy Oh, Jorel Lalicki, Austin Rivera, Connor Laliberte, Francine Pataray, Daniel Lacey, Tianyu Zuo