Abstract: A composition is provided comprising: a) polyvinylchloride, b) inorganic solid particles, and c) a polymer having a polyether segment, wherein at least 60 mol-% of the end groups of the polymer are selected from the group consisting of carboxylic acid groups and hydroxyl groups, and wherein at least a part of the end groups of the polymer is a carboxylic acid group, wherein the carboxylic acid end groups are linked to the polyether segment via a linking segment comprising an ester group.

Abstract: The invention relates to block copolymer comprising i) A first block wherein at least 65 mol-% of the repeating units of the first block are repeating units of the formula (I)—[CH2—CH2—O]—, ii) A second block wherein at least 90 mol-% of the repeating units of the second block are repeating units of at least one of formulae (II) or (III), wherein the groups R1, R2, and R3 independent of each occurrence are selected from hydrocarbyl groups having 1 to 40 carbon atoms, which are optionally substituted by ether or hydroxyl groups, and wherein the groups R1 and R2 are optionally linked to each other such that a nitrogen heterocyclic structure is present, iii) A third block which is different from the first block and the second block and which is more hydrophobic than the first block.

Abstract: A composition is provided comprising: a) polyvinylchloride, b) inorganic solid particles, and c) a polymer having a polyether segment, wherein at least 60 mol-% of the end groups of the polymer are selected from the group consisting of carboxylic acid groups and hydroxyl groups, and wherein at least a part of the end groups of the polymer is a carboxylic acid group, wherein the carboxylic acid end groups are linked to the polyether segment via a linking segment comprising an ester group.

Abstract: The present application is directed to a crosslinkable copolymer comprising styrene and 4-vinyl benzocyclobutene monomers and at least one alkoxysilane group, a method for generating an ultrathin copolymer film, which contains at least one crosslinked copolymer as defined herein, on a silicon-containing substrate, a composition or film comprising at least one copolymer as defined herein, as well as the use of this copolymer or composition containing it for electrical insulation and/or bonding of silicon-containing substrates.