Abstract: Semiconductor devices and methods of forming the devices are provided. Semiconductor devices include a semiconductor layer structure comprising a trench in an upper surface thereof, a dielectric layer in a lower portion of the trench, and a gate electrode in the trench and on the dielectric layer opposite the semiconductor layer structure. The trench may include rounded upper corner and a rounded lower corner. A center portion of a top surface of the dielectric layer may be curved, and the dielectric layer may be on opposed sidewalls of the trench. The dielectric layer may include a bottom dielectric layer on a bottom surface of the trench and on lower portions of the sidewalls of the trench and a gate dielectric layer on upper portions of the sidewalls of the trench and on the bottom dielectric layer.

Abstract: Semiconductor devices and methods of forming the devices are provided. Semiconductor devices include a semiconductor layer structure comprising a trench in an upper surface thereof, a dielectric layer in a lower portion of the trench, and a gate electrode in the trench and on the dielectric layer opposite the semiconductor layer structure. The trench may include rounded upper corner and a rounded lower corner. A center portion of a top surface of the dielectric layer may be curved, and the dielectric layer may be on opposed sidewalls of the trench. The dielectric layer may include a bottom dielectric layer on a bottom surface of the trench and on lower portions of the sidewalls of the trench and a gate dielectric layer on upper portions of the sidewalls of the trench and on the bottom dielectric layer.

Abstract: Semiconductor devices and methods of forming the devices are provided. Semiconductor devices include a semiconductor layer structure comprising a trench in an upper surface thereof, a dielectric layer in a lower portion of the trench, and a gate electrode in the trench and on the dielectric layer opposite the semiconductor layer structure. The trench may include rounded upper corner and a rounded lower corner. A center portion of a top surface of the dielectric layer may be curved, and the dielectric layer may be on opposed sidewalls of the trench. The dielectric layer may include a bottom dielectric layer on a bottom surface of the trench and on lower portions of the sidewalls of the trench and a gate dielectric layer on upper portions of the sidewalls of the trench and on the bottom dielectric layer.

Abstract: Semiconductor devices include a plurality of gate fingers extending on a wide bandgap semiconductor layer structure. An inter-metal dielectric pattern is formed on the gate fingers, the inter-metal dielectric pattern including a plurality of dielectric fingers that cover the respective gate fingers. A top-side metallization is provided on the inter-metal dielectric pattern and on exposed portions of the upper surface of the wide bandgap semiconductor layer structure. The top-side metallization includes a first conductive diffusion barrier layer on the inter-metal dielectric pattern and on the exposed portions of the upper surface of the wide bandgap semiconductor layer structure, a conductive contact layer on an upper surface of the first conductive diffusion barrier layer, and a grain stop layer buried within the conductive contact layer.

Abstract: Semiconductor devices include a plurality of gate fingers extending on a wide bandgap semiconductor layer structure. An inter-metal dielectric pattern is formed on the gate fingers, the inter-metal dielectric pattern including a plurality of dielectric fingers that cover the respective gate fingers. A top-side metallization is provided on the inter-metal dielectric pattern and on exposed portions of the upper surface of the wide bandgap semiconductor layer structure. The top-side metallization includes a first conductive diffusion barrier layer on the inter-metal dielectric pattern and on the exposed portions of the upper surface of the wide bandgap semiconductor layer structure, a conductive contact layer on an upper surface of the first conductive diffusion barrier layer, and a grain stop layer buried within the conductive contact layer.