Patents by Inventor Daniel Luzet

Daniel Luzet has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Device for cathodic sputtering at a high deposition rate
    Patent number: 4094764
    Abstract: The target of a device for cathodic sputtering at a high deposition rate on a substrate placed within a pumped enclosure is brought to a negative potential with respect to an anode. A gas is admitted at a pressure P into the space formed between the target and the anode, a high gas-pressure gradient being established between the target and the substrate. A magnetic field H is produced in a direction parallel to the target surface located opposite to the substrate and a suppressor screen is placed around the target.
    Type: Grant
    Filed: September 13, 1976
    Date of Patent: June 13, 1978
    Assignees: Commissariat a l'Energie Atomique, Agence Nationale de Valorisation de la Recherche (ANVAR)
    Inventors: Bernard Boucher, Daniel Luzet, Claude Sella