Abstract: A mechanism to electrically evaluate signals within an encapsulated semiconductor device package without the need for redesigning the package substrate is provided. Test bond pads are provided on a top surface of a semiconductor device die being placed within the semiconductor device package. One or more wire bonds having an elevated loop height are formed on the test bond pads. After encapsulating the semiconductor device package, the package encapsulant is subject to a backgrind process to expose a portion of the test connection wire bonds. Only an amount of the package encapsulant sufficient to expose each test connection wire bond is removed, so that the remaining encapsulant will continue to have the same effect on the package as would be present in a production device. Test probes can then be applied to the exposed test connection wire bonds.

Abstract: A test system having an improved physical layout and electrical design allows the 1/f noise of metal interconnects to be measured at levels close to that of Johnson or thermal noise. A detailed description of examples of operation of the test system provides evidence of the effectiveness of the test system in minimizing system noise to a level significantly lower than Johnson noise. This permits quantitative measurment of the noise contribution attributable to variations in cross-sectional area of connections for various applications and for qualitative prediction of electromigration lifetimes of metal films, particularly aluminum, having different microstructures. The test system includes an enclosure which includes several nested groups of housings including a sample oven within a device under test box which is, in turn, contained within the system enclosure.

Abstract: A method of providing interconnections to a semiconductor integrated chip designed to eliminate electromigration. The method includes the steps of forming an interconnection with segments of Al interspersed with segments of a refractory metal, wherein each aluminum segments is followed by a segment of refractory metal, aligning the aluminum and refractory metal segments with respect to each other ensuring electrical continuity.

Abstract: A test system having an improved physical layout and electrical design allows the 1/f noise of metal interconnects to be measured at levels close to that of Johnson or thermal noise. A detailed description of examples of operation of the test system provides evidence of the effectiveness of the test system in minimizing system noise to a level significantly lower than Johnson noise. This permits quantitative measurment of the noise contribution attributable to variations in cross-sectional area of connections for various applications and for qualitative prediction of electromigration lifetimes of metal films, particularly aluminum, having different microstructures. The test system includes an enclosure which includes several nested groups of housings including a sample oven within a device under test box which is, in turn, contained within the system enclosure.