Patents by Inventor Daniel M. Heenan

Daniel M. Heenan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Planarization system and method using a carbonate containing fluid
    Patent number: 7214623
    Abstract: Disclosed herein are a system and method of polishing a layer of a substrate. The disclosed method includes providing a polishing apparatus adapted to impart relative movement between a polishing pad and a substrate having a first layer to be polished; providing a liquid medium having a pH between 4 and 11 to an interface between the substrate and the polishing pad, the liquid medium including a pH controlling substance including at least one of an acid and a base, a carbonate and a stabilizer additive comprising at least one selected from the group consisting of amino acids and polyacrylic acid; and moving at least one of the substrate and the polishing pad relative to the other to polish the layer of the substrate.
    Type: Grant
    Filed: October 13, 2003
    Date of Patent: May 8, 2007
    Assignee: International Business Machines Corporation
    Inventors: Donald J. Delehanty, James W. Hannah, Daniel M. Heenan, Fen F. Jamin, Laertis Economikos