Abstract: Control systems and methods for an earthmoving machine and control architecture to generate a surface associated with a curved surface of an earthmoving implement, project the surface onto a two-dimensional (2D) plane associated with the earthmoving implement, determine a continuous curve based on the surface projected on to the 2D plane, determine a derivative of the continuous curve, project a design plane normal n* of a ground surface for smoothing onto the 2D plane associated with the earthmoving implement, determine a point of perpendicular intersection between the derivative of the continuous curve and the design plane normal n* of the ground surface projected onto the 2D plane, and operate the earthmoving machine using one or more linkage assembly actuators and the point of perpendicular intersection.

Abstract: Grade control systems and methods for an earthmoving machine and control architecture to generate a continuous differential surface associated with a rear curved surface of an earthmoving implement, project the continuous differential surface onto a two-dimensional (2D) plane associated with the earthmoving implement, determine a piecewise-derivative continuous curve based on the continuous differential surface projected on to the 2D plane, determine a derivative of the piecewise-derivative continuous curve, project a design plane normal n* of a ground surface for smoothing onto the 2D plane associated with the earthmoving implement, determine a point of perpendicular intersection between the derivative of the piecewise-derivative continuous curve and the design plane normal n* of the ground surface projected onto the 2D plane, and operate the earthmoving machine using one or more linkage assembly actuators and the point of perpendicular intersection to smooth the ground surface.

Abstract: A MEMS microphone includes a substrate, a lower membrane supported on the substrate, an upper membrane suspended above the lower membrane, a first electrode supported on the lower membrane, and a second electrode supported on the upper membrane. The lower membrane and the upper membrane enclose a cavity in which the first electrode and the second electrode are located. The lower membrane and the upper membrane are each formed of silicon carbonitride (SiCN). The first electrode and the second electrode are each formed of polysilicon.

Abstract: A MEMS microphone system comprises a transducer die having a pierce-less diaphragm and a motion sensor suspended from the diaphragm. The system further comprises a housing and the diaphragm divided a volume inside the housing into a front volume and a back volume. The motion sensor suspended from the diaphragm is located in the back volume having a gas pressure that is substantially equal or lower than an ambient pressure.

Abstract: A MEMS microphone system comprises a transducer die having a pierce-less diaphragm and a motion sensor suspended from the diaphragm. The system further comprises a housing and the diaphragm divided a volume inside the housing into a front volume and a back volume. The motion sensor suspended from the diaphragm is located in the back volume having a gas pressure that is substantially equal or lower than an ambient pressure.

Abstract: A MEMS microphone system with encapsulated movable electrode is provided. The MEMS microphone system comprises a MEMS sensor having an access channel, a plug, and first and second members. The access channel configured to receive the plug is formed on at least one of the first and second member. A vacuum having a pressure different from a pressure outside the MEMS sensor is formed between the first and second members.

Abstract: A microphone system includes first diaphragm element, second diaphragm element spaced apart from the first diaphragm element and connected to the first diaphragm element via a spacer. Disposed between the diaphragm elements is a plate capacitor element.

Abstract: A MEMS microphone system comprises a transducer die having a pierce-less diaphragm and a motion sensor suspended from the diaphragm. The system further comprises a housing and the diaphragm divided a volume inside the housing into a front volume and a back volume. The motion sensor suspended from the diaphragm is located in the back volume having a gas pressure that is substantially equal or lower than an ambient pressure.

Abstract: A MEMS microphone includes a substrate, a lower membrane supported on the substrate, an upper membrane suspended above the lower membrane, a first electrode supported on the lower membrane, and a second electrode supported on the upper membrane. The lower membrane and the upper membrane enclose a cavity in which the first electrode and the second electrode are located. The lower membrane and the upper membrane are each formed of silicon carbonitride (SiCN). The first electrode and the second electrode are each formed of polysilicon.

Abstract: A MEMS microphone system comprises a transducer die having a pierce-less diaphragm and a motion sensor suspended from the diaphragm. The system further comprises a housing and the diaphragm divided a volume inside the housing into a front volume and a back volume. The motion sensor suspended from the diaphragm is located in the back volume having a gas pressure that is substantially equal or lower than an ambient pressure.

Abstract: A MEMS microphone system with encapsulated movable electrode is provided. The MEMS microphone system comprises a MEMS sensor having an access channel, a plug, and first and second members. The access channel configured to receive the plug is formed on at least one of the first and second member. A vacuum having a pressure different from a pressure outside the MEMS sensor is formed between the first and second members.

Abstract: A microphone system includes first diaphragm element, second diaphragm element spaced apart from the first diaphragm element and connected to the first diaphragm element via a spacer. Disposed between the diaphragm elements is a plate capacitor element.

Abstract: The invention relates to a method for producing a large variety of photoresist structures, wherein a volume of photosensitive material (5) is exposed at least once by means of at least two light beams (1, 2), which are superposed inside the photosensitive material (5), and is subsequently subjected to a developing process, wherein the light beams (1, 2) penetrate at least one transparent optical element (3). The optical element (3) is a polyhedron with planar or curved surfaces which largely prevents refraction of the light beams on the surface of the volume of photosensitive material (5) when the beams are fed-in and/or fed-out of the volume of photosensitive material (5), so that the angle of refraction for the light beams (1, 2) can be greater in the volume of photosensitive material (5) than the critical angle of the total reflection, which has a limiting effect without optical element (3).

Abstract: The invention relates to a method for producing a large variety of photoresist structures, wherein a volume of photosensitive material (5) is exposed at least once by means of at least two light beams (1, 2), which are superposed inside the photosensitive material (5), and is subsequently subjected to a developing process, wherein the light beams (1, 2) penetrate at least one transparent optical element (3). The optical element (3) is a polyhedron with planar or curved surfaces which largely prevents refraction of the light beams on the surface of the volume of photosensitive material (5) when the beams are fed-in and/or fed-out of the volume of photosensitive material (5), so that the angle of refraction for the light beams (1, 2) can be greater in the volume of photosensitive material (5) than the critical angle of the total reflection, which has a limiting effect without optical element (3).