Abstract: A rotary wing aircraft including a vehicle vibration control system.

Abstract: A rotary wing aircraft including a vehicle vibration control system.

Abstract: A rotary wing aircraft including a vehicle vibration control system.

Abstract: A system and method is described for controlling flight trajectories of at least two flying vehicles towards goal positions. The system includes at least two flying vehicles with onboard inertial measurement units for determining and updating orientation, angular velocities, position and linear velocities of the at least two flying vehicles, a motion capture system to detect current position and velocity of each of the at least two flying vehicles, and a base controller in communication with the motion capture system and in communication with the plurality of flying vehicles. The base controller calculates for each of the flying vehicles, at predetermined intervals of time, optimum trajectory paths using piece-wise smooth polynomial functions, applying weighting factors, and enforcing overlap constraints.

Abstract: A rotary wing aircraft including a vehicle vibration control system.

Abstract: A rotary wing aircraft including a vehicle vibration control system.

Abstract: A system and method is described for controlling flight trajectories of at least two flying vehicles towards goal positions. The system includes at least two flying vehicles with onboard inertial measurement units for determining and updating orientation, angular velocities, position and linear velocities of the at least two flying vehicles, a motion capture system to detect current position and velocity of each of the at least two flying vehicles, and a base controller in communication with the motion capture system and in communication with the plurality of flying vehicles. The base controller calculates for each of the flying vehicles, at predetermined intervals of time, optimum trajectory paths using piece-wise smooth polynomial functions, applying weighting factors, and enforcing overlap constraints.

Abstract: A rotary wing aircraft including a vehicle vibration control system.

Abstract: A rotary wing aircraft including a vehicle vibration control system. The vehicle vibration control system includes a rotating hub mounted vibration control system, the rotating hub mounted vibration control system mounted to the rotating rotary wing hub with the rotating hub mounted vibration control system rotating with the rotating rotary wing hub.

Abstract: A rotary wing aircraft including a vehicle vibration control system. The vehicle vibration control system includes a rotating hub mounted vibration control system, the rotating hub mounted vibration control system mounted to the rotating rotary wing hub with the rotating hub mounted vibration control system rotating with the rotating rotary wing hub.

Abstract: The present invention provides photolithographic device and method for photolithography process window. The photolithography device comprises a substrate; and a pattern layer having radiant energy transparent portions and radiant energy blocking portions, where the pattern layer has features with a varying overlay. The overlay tolerance is determined by varying the misalignment the features of the pattern. The photolithography device is a reticle. The method for determining an optimum photolithography process window comprises exposing a portion of a wafer to a pattern produced by a reticle, the pattern having a varying overlay that produces multiple photolithography conditions, wherein each photolithography condition has an overlay tolerance; and stepping the reticle across a remaining portion of the wafer, where each step exposes an other region of the wafer to the pattern producing multiple photolithography conditions.

Abstract: The present invention provides photolithographic device and method for optimizing the photolithography process window. The photolithography device comprises a substrate; and a pattern layer having radiant energy transparent portions and radiant energy blocking portions, where the pattern layer has features with a varying overlay. The overlay tolerance is determined by varying the misalignment the features of the pattern. The photolithography device is a reticle. The method for determining an optimum photolithography process window comprises exposing a portion of a wafer to a pattern produced by a reticle, the pattern having a varying overlay that produces multiple photolithography conditions, wherein each photolithography condition has an overlay tolerance; and stepping the reticle across a remaining portion of the wafer, where each step exposes an other region of the wafer to the pattern producing multiple photolithography conditions.