Patents by Inventor Daniel N. Zhang

Daniel N. Zhang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout
    Patent number: 7934174
    Abstract: One embodiment provides a system for using a database to quickly identify a manufacturing problem area in a layout. During operation, the system receives a first check-figure which identifies a first area in a first layout, wherein the first area is associated with a first feature. Next, the system determines a first sample using the first check-figure, wherein the first sample represents the first layout's geometry within a first ambit of the first check-figure, wherein the first sample's geometry is expected to affect the shape of the first feature. The system then performs a model-based simulation using the first sample to obtain a first simulation-result which indicates whether the first feature is expected to have manufacturing problems. Next, the system stores the first simulation-result in a database which is used to quickly determine whether a second feature is expected to have manufacturing problems.
    Type: Grant
    Filed: July 27, 2009
    Date of Patent: April 26, 2011
    Assignee: Synopsys, Inc.
    Inventors: Zong Wu Tang, Daniel N. Zhang, Juhwan Kim, Hua Song, Weiping Fang, Lawrence S. Melvin, III
  • METHOD AND APPARATUS FOR USING A DATABASE TO QUICKLY IDENTIFY AND CORRECT A MANUFACTURING PROBLEM AREA IN A LAYOUT
    Publication number: 20090288047
    Abstract: One embodiment provides a system for using a database to quickly identify a manufacturing problem area in a layout. During operation, the system receives a first check-figure which identifies a first area in a first layout, wherein the first area is associated with a first feature. Next, the system determines a first sample using the first check-figure, wherein the first sample represents the first layout's geometry within a first ambit of the first check-figure, wherein the first sample's geometry is expected to affect the shape of the first feature. The system then performs a model-based simulation using the first sample to obtain a first simulation-result which indicates whether the first feature is expected to have manufacturing problems. Next, the system stores the first simulation-result in a database which is used to quickly determine whether a second feature is expected to have manufacturing problems.
    Type: Application
    Filed: July 27, 2009
    Publication date: November 19, 2009
    Applicant: SYNOPSYS, INC.
    Inventors: Zong Wu Tang, Daniel N. Zhang, Juhwan Kim, Hua Song, Weiping Fang, Lawrence S. Melvin, III
  • Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout
    Patent number: 7584450
    Abstract: One embodiment provides a system for using a database to quickly identify a manufacturing problem area in a layout. During operation, the system receives a first check-figure which identifies a first area in a first layout, wherein the first area is associated with a first feature. Next, the system determines a first sample using the first check-figure, wherein the first sample represents the first layout's geometry within a first ambit of the first check-figure, wherein the first sample's geometry is expected to affect the shape of the first feature. The system then performs a model-based simulation using the first sample to obtain a first simulation-result which indicates whether the first feature is expected to have manufacturing problems. Next, the system stores the first simulation-result in a database which is used to quickly determine whether a second feature is expected to have manufacturing problems.
    Type: Grant
    Filed: December 12, 2006
    Date of Patent: September 1, 2009
    Assignee: Synopsys, Inc.
    Inventors: Zong Wu Tang, Daniel N. Zhang, Juhwan Kim, Hua Song, Weiping Fang, Lawrence S. Melvin, III
  • Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout
    Publication number: 20070198958
    Abstract: One embodiment provides a system for using a database to quickly identify a manufacturing problem area in a layout. During operation, the system receives a first check-figure which identifies a first area in a first layout, wherein the first area is associated with a first feature. Next, the system determines a first sample using the first check-figure, wherein the first sample represents the first layout's geometry within a first ambit of the first check-figure, wherein the first sample's geometry is expected to affect the shape of the first feature. The system then performs a model-based simulation using the first sample to obtain a first simulation-result which indicates whether the first feature is expected to have manufacturing problems. Next, the system stores the first simulation-result in a database which is used to quickly determine whether a second feature is expected to have manufacturing problems.
    Type: Application
    Filed: December 12, 2006
    Publication date: August 23, 2007
    Inventors: Zong Wu Tang, Daniel N. Zhang, Juhwan Kim, Hua Song, Weiping Fang, Lawrence S. Melvin