Abstract: A mask reuse methodology process in which the soft logic is implemented with a generic array type cell structure mask and a custom blocking mask. A method is provided comprising printing a set of component cores onto a die at predetermined locations with a reusable mask set; providing a custom blocking mask that includes opaque regions that positionally correspond with the component cores on the die; superimposing the custom blocking mask with a generic array type cell mask to form superimposed masks; and using the superimposed masks to print generic array type cells onto the die with the exception of the predetermined locations where the set of component cores reside.

Abstract: An integrated circuit (IC) including at least one combinational logic path. The features in the combinational logic path are self compensating for out-of-focus effects. In particular, field effect transistor (FET) gates may be iso-focally spaced such that the gate (critical dimension) may move with changing focus, but the gate length remains the same. Alternately, logic circuits in a path may self-compensate for focus effects on individual circuits.

Abstract: An integrated circuit (IC) including at least one combinational logic path. The combinational logic path includes two types of logic blocks cells that compensate each other for fabrication parameter effects on cell transistors. The two types may be dense cells with field effect transistor (FET) gates on contacted pitch and isolated cells with FET gates on wider than contacted pitch. Dense cell delay changes from the FET gates being printed out of focus are offset by isolated cell delay changes.

Abstract: A novel method and system for layout optimization relative to lithographic process windows which facilitates lithographic constraints to be non-localized in order to impart a capability of printing a given circuit with a process window beyond the process windows which are attainable with conventional simplified design rules.