Patents by Inventor Daniel P. Holt

Daniel P. Holt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11851407
    Abstract: Methods, and related compositions, for the improved synthesis of [18F]DCFPyL are disclosed. Also provided are methods, and related compositions, for the use of [18F]DCFPyL so produced.
    Type: Grant
    Filed: March 9, 2021
    Date of Patent: December 26, 2023
    Assignee: THE JOHNS HOPKINS UNIVERSTY
    Inventors: Hayden T. Ravert, Daniel P. Holt, Ying Chen, Ronnie C. Mease, Hong Fan, Martin G. Pomper, Robert F. Dannals
  • Publication number: 20220055991
    Abstract: Methods, and related compositions, for the improved synthesis of [18F]DCFPyL are disclosed. Also provided are methods, and related compositions, for the use of [18F]DCFPyL so produced.
    Type: Application
    Filed: March 9, 2021
    Publication date: February 24, 2022
    Inventors: Hayden T. Ravert, Daniel P. Holt, Ying Chen, Ronnie C. Mease, Hong Fan, Martin G. Pomper, Robert F. Dannals
  • Patent number: 10947197
    Abstract: Methods, and related compositions, for the improved synthesis of [18F]DCFPyL are disclosed. Also provided are methods, and related compositions, for the use of [18F]DCFPyL so produced.
    Type: Grant
    Filed: June 9, 2017
    Date of Patent: March 16, 2021
    Assignee: The Johns Hopkins University
    Inventors: Hayden T. Ravert, Daniel P. Holt, Ying Chen, Ronnie C. Mease, Hong Fan, Martin G. Pomper, Robert F. Dannals
  • Publication number: 20190177275
    Abstract: Methods, and related compositions, for the improved synthesis of [18F]DCFPyL are disclosed. Also provided are methods, and related compositions, for the use of [18F]DCFPyL so produced.
    Type: Application
    Filed: June 9, 2017
    Publication date: June 13, 2019
    Inventors: Hayden T. Ravert, Daniel P. Holt, Ying Chen, Ronnie C. Mease, Hong Fan, Martin G. Pomper, Robert F. Dannals