Abstract: Photoresist rework of metal-containing photoresist is disclosed. Rework can be accomplished using a thermal process by exposing a substrate to an elevated temperature and an etch gas. Rework can be also accomplished using a wet process by exposing the substrate to an inorganic acidic solution. Residue or other contaminants may be cleaned up from the substrate after rework by exposure to high temperatures, plasma, or wet clean.

Abstract: Materials for coating paper sleeve blanks are provided, wherein the paper sleeve blank includes a multilayer coating. The multilayer coating includes a barrier layer and a top coat. At least two polymeric layers, including a top coat, are added to one side of the paper sleeve blank and the bottom blank. A container forming machine wraps and seals the multilayer coated paper sleeve blank to the coated bottom blank.

Abstract: Disclosed is an apparatus for forming plastic preforms into plastic containers with a movable carrier on which a plurality of forming stations for forming the plastic preforms into the plastic containers is arranged, wherein the forming stations each have valve arrangements for applying a flowable medium to the plastic preforms in order to expand them, and wherein each valve arrangement has at least two controllable valve devices, having movable piston devices which can switch the valve devices between at least two valve positions, characterized in that the device has a monitoring device for checking a state of wear of at least one of the valve devices. The monitoring device has at least one detection device which is configured for detecting the state of wear of the valve device optically and without contact.

Abstract: A cleaning system includes a dissolvable cleaner head and a wand for removable attachment to the cleaner head. The cleaner head has a top surface, a bottom surface, and a height extending from the top surface to the bottom surface and includes an indentation having a depth same as the height of the cleaner head. The wand has a first end, a second end, and an attachment arrangement movable between an engaged position, wherein the wand is removably coupled to the cleaner head, and a disengaged position, wherein the wand is released from the cleaner head. The cleaner head also has a first sealing member sealing against the top surface of the cleaner head when engaged with the attachment arrangement and a second sealing member sealing against an inner surface of the indentation when engaged with the attachment arrangement to impede liquid intrusion toward the attachment arrangement.

Abstract: Development of resists are useful, for example, to form a patterning mask in the context of high-resolution patterning. Development can be accomplished using a halide-containing chemistry such as a hydrogen halide. A metal-containing resist film may be deposited on a semiconductor substrate using a dry or wet deposition technique. The resist film may be an EUV-sensitive organo-metal oxide or organo-metal-containing thin film resist. After exposure, the photopatterned metal-containing resist is developed using wet or dry development.

Abstract: Systems and methods for manufacturing a product include at least one fabricating system to create a substrate with a lattice structure. A form receives the substrate. The form defines a cavity around the substrate. A forming system delivers a material into the cavity of the form so that the material flows into the lattice structure interweaving the material with the substrate to create a feature on the substrate from the material that is locked to the substrate by the lattice structure.

Abstract: Systems and methods for securing a product joint with a lattice structure. A system includes at least one fabricating system to create a connector with the lattice structure. A force system applies a force to the connector so that a material of the product flows into the lattice structure interweaving the material with the lattice structure to secure the joint by the lattice structure.

Abstract: The invention disclosed generally relates to sensors, systems and methods for the detection of an analyte in a complex sample.

Abstract: Development of resists are useful, for example, to form a patterning mask in the context of high-resolution patterning. Development can be accomplished using a halide-containing chemistry such as a hydrogen halide. A metal-containing resist film may be deposited on a semiconductor substrate using a dry or wet deposition technique. The resist film may be an EUV-sensitive organo-metal oxide or organo-metal-containing thin film resist. After exposure, the photopatterned metal-containing resist is developed using wet or dry development.

Abstract: Disclosed herein are radiative heating systems and methods for use with dry development processes. Such systems and methods may, in some instances, allow for volatile halides that may be trapped on the surface of a wafer after dry development processing has completed to be driven out of the wafer through radiative heating thereof. Such systems and methods may, in some instances, be provided in an in-situ context in which the wafers being heated are radiatively heated within the same chamber as the dry development process is performed. In other contexts, such radiative heating may be performed in other locations, e.g., as the wafer transits from the processing chamber to another chamber or in another chamber entirely.

Abstract: A plastic bottle including a body portion, a neck portion extending from the body portion, and a plurality of equally sized and spaced ribs disposed around a circumference of the neck portion. The body portion can be configured to contain liquid. The neck portion can define an opening for dispensing liquid from the bottle and have a central axis. Each of the plurality of ribs can extend across an interface region between the neck portion and the body portion. Each of the plurality of ribs can extend across the interface region at an angle relative to the central axis of the neck. Each of the plurality of ribs can have a length of 1 mm to 10 mm.

Abstract: Development of resists are useful, for example, to form a patterning mask in the context of high-resolution patterning. Development can be accomplished using a halide-containing chemistry such as a hydrogen halide. A metal-containing resist film may be deposited on a semiconductor substrate using a dry or wet deposition technique. The resist film may be an EUV-sensitive organo-metal oxide or organo-metal-containing thin film resist. After exposure, the photopatterned metal-containing resist is developed using wet or dry development.

Abstract: The present invention relates to anti-IL1RAP binding compounds, in particular new anti-IL1RAP antibodies and therapeutic and diagnostic methods and compositions for using the same.

Abstract: An apparatus for forming plastic preforms into plastic containers, having a transport device which transports the plastic preforms to be formed along a predetermined transport path, wherein the transport device has a rotatable transport carrier wherein a plurality of forming stations are arranged. The forming stations each have blow-molding devices within which the plastic preforms can be formed into the plastic containers by applying a flowable medium. The forming stations each have application devices for applying the flowable medium to the plastic preforms, and the apparatus has a feed device for feeding plastic preforms to be formed to the transport apparatus, and a discharge device for discharging formed containers from the transport device. The apparatus has a clean room within which the plastic preforms or the plastic containers are transported at least sectionally. The apparatus has an ejection device to eject plastic preforms or plastic containers from the transport path.