Abstract: A metal-containing photoresist film may be deposited on a semiconductor substrate using a dry deposition technique. Unintended metal-containing photoresist material may form on internal surfaces of a process chamber during deposition, bevel and backside cleaning, baking, development, or etch operations. An in situ dry chamber clean may be performed to remove the unintended metal-containing photoresist material by exposure to an etch gas. The dry chamber clean may be performed at elevated temperatures without striking a plasma. In some embodiments, the dry chamber clean may include pumping/purging and conditioning operations.

Abstract: Rivet dispenser systems and methods of use thereof are provided. In a non-limiting embodiment, the rivet dispenser system comprises a rivet receiving member defining a channel therein, and a seat member. The channel includes a curved region. The rivet receiving member comprises a first port and a second port. The first port communicates with the channel and is configured to receive rivets. The second port communicates with the channel and is configured to dispense rivets. The channel extends between the first port and the second port and is configured to transport rivets from the first port to the second port in a series arrangement and in a preselected orientation. The seat member communicates with the second port and is configured to selectively engage with a rivet holder of a resistance spot rivet welding apparatus and introduce a single rivet to the rivet holder at one time.

Abstract: A container for dispensing a liquid includes a body and a piercing device. The body includes an interior storage volume, an outlet through the first wall for dispensing the liquid, a first track disposed in a first side wall of the body, and a second track disposed in a second side wall of the body, the second side wall opposite the first side wall. The piercing device can be slidably coupled to the body and includes a first rail configured to slide within the first track, a second rail configured to slide within the second track, and a piercer that includes a piercing end. The piercer can slide from a first position to a second position to pierce the body and create a vent opening.

Abstract: A container for dispensing a liquid that includes a body, a closure, and an overcap. The body includes an interior storage volume, a neck finish on a first wall of the body, and a protrusion on a second wall of the body. The neck finish defined outlet through the first wall for dispensing the liquid. The closure for sealing the outlet and coupled to the neck finish. The overcap is removably coupled to the closure and includes a first end including a recess configured to receive a portion of the closure when the overcap is coupled to the closure and a second end including a shield defining a shield recess and a piercer. The shield is configured is configured to at least partially surround the protrusion of the body such that the piercer pierces the protrusion to create a vent opening when the shield at least partially surrounds the protrusion.

Abstract: A method for selectively etching a first region of a structure with respect to a second region of the structure is provided. The method comprises at least one cycle. Each cycle comprises selectively depositing an inhibitor layer on the first region of the structure, providing an atomic layer deposition over the structure, wherein the atomic layer deposition selectively deposits a mask on the second region of the structure with respect to the inhibitor layer, and selectively etching the first region of the structure with respect to the mask. The selectively depositing an inhibitor layer on the first region of the structure comprises providing an inhibitor layer gas and forming the inhibitor layer gas into inhibitor layer radicals, wherein the inhibitor layer radicals selectively deposit on the first region of the structure with respect to the second region of the structure.

Abstract: An assembly includes an attachment arm having an axle extending from a first end of the attachment arm. The attachment arm of the detachable wheel assembly further includes a securing portion forming a second end of the attachment arm, the securing portion of the attachment arm including a pin positioned to extend above a first frame member of a gantry truss and to secure the first frame member between the pin and a portion of the attachment arm. The attachment arm also includes a frame support corresponding to a second frame member of the gantry truss such that the frame support supports the second frame member when the assembly is secured to the gantry truss, and the assembly includes a wheel rotatably attached to the axle of the attachment arm.

Abstract: A gantry carriage assembly includes a support plate having a first end and a second end. The gantry carriage assembly further includes first guide wheels secured to a first end of the support plate, the first guide wheels including a first pair of guide wheels configured to accommodate a longitudinal member of a gantry truss therebetween, where the first pair of guide wheels are disposed opposite from one another across the longitudinal member. The gantry carriage assembly also includes second guide wheels secured to a second end of the support plate opposite the first end, the second guide wheels including a second pair of guide wheels configured to accommodate the longitudinal member of the gantry truss therebetween, wherein the second pair of guide wheels are disposed opposite from one another across the longitudinal member.

Abstract: A delay device includes a tuning network including first and second tuning components having frequency responses that overlap in an intermediate frequency band to provide a group delay response. A delay modifier is in communication with the tuning network and configured to provide an offset frequency as an input to the tuning network, and to electronically adjust a group delay value associated with the group delay response by varying the offset frequency. The difference between a frequency of an input reference signal and a local oscillator frequency produced by the delay modifier is substantially equal to an intermediate frequency of the tuning network. The tuning network and the delay modifier cooperate to transpose the reference signal at the reference frequency down to the IF band before passing through the first and second delay lines, and back up to the RF band after passing through the first and second delay lines.

Abstract: A machine includes a frame, a first steering arm, a second steering arm, a first hydraulic actuator coupled to the frame and the first steering arm, and a second hydraulic actuator coupled to the frame and the second steering arm. A first angle sensor measures a rotational displacement of the first hydraulic actuator relative to the first steering arm. A first link couples the first hydraulic actuator and the first sensor, and isolates movements other than the first rotational displacement. A second angle sensor measures a second rotational displacement of the second hydraulic actuator relative to the second steering arm. A second link couples the second hydraulic actuator and the second sensor, and isolates movements other than the second rotational displacement.

Abstract: A machine includes a frame and an oscillating hitch. A first cylinder couples to a first side of the oscillating hitch and a first side of the frame. A second cylinder couples to a second side of the oscillating hitch and a second side of the frame. A first isolating mechanism couples to the first cylinder and rotates in response to a first rotation of the first cylinder relative to the frame or the oscillating hitch. A first angle sensor senses a first angular displacement of the first isolating mechanism about a first rotational axis. A second isolating mechanism couples to the second cylinder and rotates in response to a second rotation of the second cylinder relative to the frame or the oscillating hitch. A second angle sensor senses a second angular displacement of the second isolating mechanism about a second rotational axis.

Abstract: A method of forming a mated component pair includes forming a first geometry on a first mating surface of a first component and a complementary second geometry on a second mating surface of a second component. The first geometry and the second geometry can be determined from a geometric key associated with a component identifier, e.g., by inputting the geometric key into a mathematical algorithm or random number generator. When a replacement for the second component is needed, the component identifier may be obtained from the first component, the component identifier may be used to obtain the geometric key, and the geometric key may then be used to determine the second geometry. The second geometry may then be formed on the second component such the second component may properly mate with the mated first component.

Abstract: Development of resists are useful, for example, to form a patterning mask in the context of high-resolution patterning. Development can be accomplished using a halide-containing chemistry such as a hydrogen halide. A metal-containing resist film may be deposited on a semiconductor substrate using a dry or wet deposition technique. The resist film may be an EUV-sensitive organo-metal oxide or organo-metal-containing thin film resist. After exposure, the photopatterned metal-containing resist is developed using wet or dry development.

Abstract: A method for selectively etching a first region of a structure with respect to a second region of the structure is provided. The method comprises at least one cycle. Each cycle comprises selectively depositing an inhibitor layer on the first region of the structure, providing an atomic layer deposition over the structure, wherein the atomic layer deposition selectively deposits a mask on the second region of the structure with respect to the inhibitor layer, and selectively etching the first region of the structure with respect to the mask. The selectively depositing an inhibitor layer on the first region of the structure comprises providing an inhibitor layer gas and forming the inhibitor layer gas into inhibitor layer radicals, wherein the inhibitor layer radicals selectively deposit on the first region of the structure with respect to the second region of the structure.

Abstract: A child-resistant container includes a cap with an outer member moveable relative to the axis radially between a first position and a radially displaced position. The container also includes a container body with a neck that engages with an inner member of the cap. The container body has a projection that engages the outer member and limits rotational movement of the cap when the outer member is in the first position and the cap is contemporaneously twisted-off. The outer member bypasses the projection when the outer member is in the radially displaced position and the cap is contemporaneously twisted-off. The projection includes a receiving aperture that receives at least part of the outer member when the outer member is in the first position and the cap is contemporaneously twisted off.

Abstract: A fondant press 10 for aiding food preparation comprises a first fabiform shaped side portion 16 and a second fabiform shaped side portion 17 which are angled relative to each other such that a planar lower surface 12 of the fondant press 10 is wider than a planar upper surface 11 of the fondant press 10; the upper and lower surfaces 11, 12 of the fondant press 10 have flanged rims 30, 31 which extend around the circumference of the side portions 16, 17 and are integrally formed with a first end portion 13 and a second end portion 14 of the fondant press 10 defining a pair of curved handles 20, 21 in the upper surface 11 of the end portions 13, 14; the lower surface 12 has a recess 15 formed within it for receiving a stamp.