Patents by Inventor Daniel Pulsipher

Daniel Pulsipher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma-Enhanced Chemical Vapor Deposition Coating System
    Publication number: 20250043426
    Abstract: A plasma-enhanced chemical vapor deposition coating system includes a deposition chamber including one or more zones of processing, an electrode centrally located within the deposition chamber, wherein the electrode forms a central axis in the deposition chamber, and a carousel configured to carry at least one substrate. The carousel is configured to move axially in a direction along the central axis from a first end of the deposition chamber to a second end of the deposition chamber. The carousel is further configured to rotate around the central axis such that the substrate is oriented in a plurality of different directions relative to the central axis.
    Type: Application
    Filed: September 26, 2024
    Publication date: February 6, 2025
    Inventors: Daniel Pulsipher, John Winterroth, Attila Nagy
  • Plasma-enhanced chemical vapor deposition coating system
    Patent number: 12129549
    Abstract: A plasma-enhanced chemical vapor deposition coating system includes a deposition chamber including one or more zones of processing, an electrode centrally located within the deposition chamber, wherein the electrode forms a central axis in the deposition chamber, and a carousel configured to carry at least one substrate. The carousel is configured to move axially in a direction along the central axis from a first end of the deposition chamber to a second end of the deposition chamber. The carousel is further configured to rotate around the central axis such that the substrate is oriented in a plurality of different directions relative to the central axis.
    Type: Grant
    Filed: February 28, 2022
    Date of Patent: October 29, 2024
    Inventors: Benjamin Lawrence, Daniel Pulsipher, Ludmil Zambov, Pravin Chaubey, John Winterroth, Attila Nagy
  • PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION COATING SYSTEM
    Publication number: 20220275509
    Abstract: A plasma-enhanced chemical vapor deposition coating system includes a deposition chamber including one or more zones of processing, an electrode centrally located within the deposition chamber, wherein the electrode forms a central axis in the deposition chamber, and a carousel configured to carry at least one substrate. The carousel is configured to move axially in a direction along the central axis from a first end of the deposition chamber to a second end of the deposition chamber. The carousel is further configured to rotate around the central axis such that the substrate is oriented in a plurality of different directions relative to the central axis.
    Type: Application
    Filed: February 28, 2022
    Publication date: September 1, 2022
    Inventors: Benjamin Lawrence, Daniel Pulsipher, Ludmil Zambov, Pravin Chaubey, John Winterroth, Attila Nagy