Patents by Inventor Daniel Rondi

Daniel Rondi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9093271
    Abstract: The invention relates to a method for manufacturing, by means of epitaxy, a monocrystalline layer of GaN on a substrate, wherein the coefficient of thermal expansion is less than the coefficient of thermal expansion of GaN, comprising the following steps: (b) three-dimensional epitaxial growth of a layer of GaN relaxed at the epitaxial temperature, (c1) growth of an intermediate layer of BwAlxGayInzN, (c2) growth of a layer of BwAlxGayInzN, (c3) growth of an intermediate layer of BwAlxGayInzN, at least one of the layers formed in steps (c1) to (c3) being an at least ternary III-N alloy comprising aluminium and gallium, (d) growth of said layer of GaN.
    Type: Grant
    Filed: June 28, 2012
    Date of Patent: July 28, 2015
    Assignees: Soitec, Centre National de la Recherche Scientifique (CNRS)
    Inventors: David Schenk, Alexis Bavard, Yvon Cordier, Eric Frayssinet, Mark Kennard, Daniel Rondi
  • Publication number: 20140327013
    Abstract: The invention relates to a method for manufacturing, by means of epitaxy, a monocrystalline layer of GaN on a substrate, wherein the coefficient of thermal expansion is less than the coefficient of thermal expansion of GaN, comprising the following steps: (b) three-dimensional epitaxial growth of a layer of GaN relaxed at the epitaxial temperature, (c1) growth of an intermediate layer of BwAlxGayInzN, growth of a layer of BwAlxGayInzN, (c3) growth of an intermediate layer of BwAlxGayInzN, at least one of the layers formed in steps (c1) to (c3) being an at least ternary III-N alloy comprising aluminium and gallium, (d) growth of said layer of GaN.
    Type: Application
    Filed: June 28, 2012
    Publication date: November 6, 2014
    Applicants: SOITEC, OMMIC, CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)
    Inventors: David Schenk, Alexis Bavard, Yvon Cordier, Eric Frayssinet, Mark Kennard, Daniel Rondi
  • Patent number: 5424242
    Abstract: A method for making an optical amplifier according to which a stack of the following layers is made by epitaxy: a first optical guiding layer; a first chemical attack barrier layer; a second optical guiding layer; a second chemical attack barrier layer; an active layer; a confinement layer; and a contact layer. Then at least one amplifier element followed by an optical guide located beneath this amplifier element are etched in these layers. The method can be applied to the making of optoelectronic devices such as modulators, change-over switches, distributors, etc.
    Type: Grant
    Filed: April 29, 1993
    Date of Patent: June 13, 1995
    Assignee: Thomson-CSF
    Inventors: Robert Blondeau, Yannick Bourbin, Daniel Rondi
  • Patent number: 5262656
    Abstract: An opto-electronic device which monolithically integrates a laser emitter and an optical detector positioned in-line on a single waveguide, in which the laser emitter and detector operate at different wavelengths. Such an opto-electronic device may find particular application in various transmission or telecommunication systems.
    Type: Grant
    Filed: June 3, 1992
    Date of Patent: November 16, 1993
    Assignee: Thomson-CSF
    Inventors: Robert Blondeau, Daniel Rondi, Jean-Charles Renaud
  • Patent number: 5214661
    Abstract: Disclosed is an optoelectronic device on a semi-insulator substrate, of the type comprising, stacked on one another, at least:- one substrate made of semi-insulator material,- one lower confinement layer with a first type of conductivity,- at least one active layer in strip form, and- an upper confinement layer with a second type of conductivity. In this device, the lower confinement layer covers one side of the semi-insulator substrate in passing beneath the active layer and coming to a stop substantially vertically to this active layer and the upper confinement layer covers the other side of the semi-insulator substrate in passing over the active layer and coming to a stop substantially vertically to this active layer. The disclosure can be applied notably to the fabrication of lasers.
    Type: Grant
    Filed: December 9, 1991
    Date of Patent: May 25, 1993
    Assignee: Thomson - CSF
    Inventors: Robert Blondeau, Daniel Rondi, Genevieve Glastre, Michel Krakowski
  • Patent number: 5033816
    Abstract: The method consists of the following successive steps: the deposition on a substrate, by epitaxy, of an optical confinement layer, formed by a first semiconducting material; the deposition, by epitaxy of an active layer, formed by a second semiconducting material; the deposition, by epitaxy, of a stop layer, formed by a third semiconducting material, with a thickness of between 0.005 and 0.02 microns; the deposition, by epitaxy, of a guide layer, formed by a fourth semiconducting material, with a thickness of between 0.01 and 0.
    Type: Grant
    Filed: December 15, 1988
    Date of Patent: July 23, 1991
    Assignee: Thomson-CSF
    Inventors: Robert Blondeau, Daniel Rondi, Anne Taineau, Gervaise Vilain, Baudouin de Cremoux