Patents by Inventor Daniel S. Bates

Daniel S. Bates has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240110067
    Abstract: The present invention describes a coating composition that when applied to a substrate is capable of withstanding high temperature particle ejection without perforation caused by a high energy thermal runaway event. The coating composition comprises an inorganic filler, an inorganic binder; and chopped organic fibers.
    Type: Application
    Filed: March 16, 2022
    Publication date: April 4, 2024
    Inventors: Walter R. Romanko, Mitchell T. Huang, Rhesa M. Browning, Mark A. Fairbanks, Daniel S. Bates
  • Publication number: 20230058396
    Abstract: A thermal barrier article comprising a core layer containing a plurality of fibers or a flame-retardant foam, and a supplementary layer disposed on or integrated within the core layer, where the thermal barrier article is operatively adapted to survive or withstand at least one cycle of the Torch and Grit Test.
    Type: Application
    Filed: January 15, 2021
    Publication date: February 23, 2023
    Inventors: Peter T. DIETZ, Anne N. DE ROVERE, Mark A. FAIRBANKS, Bhaskara R. BODDAKAYALA, Daniel S. BATES, Sean M. LUOPA, Bradon A. BARTLING, Kerstin C. ROSEN, Claus H.G. MIDDENDORF, Christoph KUESTERS, Jan Thomas KRAPP
  • Patent number: 10134566
    Abstract: A method of making a nanostructure and nanostructured articles by depositing a layer to a major surface of a substrate by plasma chemical vapor deposition from a gaseous mixture while substantially simultaneously etching the surface with a reactive species. The method includes providing a substrate; mixing a first gaseous species capable of depositing a layer onto the substrate when formed into a plasma, with a second gaseous species capable of etching the substrate when formed into a plasma, thereby forming a gaseous mixture; forming the gaseous mixture into a plasma; and exposing a surface of the substrate to the plasma, wherein the surface is etched and a layer is deposited on at least a portion of the etched surface substantially simultaneously, thereby forming the nanostructure. The substrate can be a (co)polymeric material, an inorganic material, an alloy, a solid solution, or a combination thereof.
    Type: Grant
    Filed: July 23, 2014
    Date of Patent: November 20, 2018
    Assignee: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Moses M. David, Ta-Hua Yu, Daniel S. Bates, Jayshree Seth, Michael S. Berger, Carsten Franke, Sebastian F. Zehentmaier
  • Patent number: 10119190
    Abstract: A method of making a nanostructure and nanostructured articles by depositing a layer to a major surface of a substrate by plasma chemical vapor deposition from a gaseous mixture while substantially simultaneously etching the surface with a reactive species. The method includes providing a substrate; mixing a first gaseous species capable of depositing a layer onto the substrate when formed into a plasma, with a second gaseous species capable of etching the substrate when formed into a plasma, thereby forming a gaseous mixture; forming the gaseous mixture into a plasma; and exposing a surface of the substrate to the plasma, wherein the surface is etched and a layer is deposited on at least a portion of the etched surface substantially simultaneously, thereby forming the nanostructure. The substrate can be a (co)polymeric material, an inorganic material, an alloy, a solid solution, or a combination thereof.
    Type: Grant
    Filed: November 17, 2016
    Date of Patent: November 6, 2018
    Assignee: 3M Innovative Properties Company
    Inventors: Moses M. David, Ta-Hua Yu, Daniel S. Bates, Jayshree Seth, Michael S. Berger, Carsten Franke, Sebastian F. Zehentmaier
  • Publication number: 20170067150
    Abstract: A method of making a nanostructure and nanostructured articles by depositing a layer to a major surface of a substrate by plasma chemical vapor deposition from a gaseous mixture while substantially simultaneously etching the surface with a reactive species. The method includes providing a substrate; mixing a first gaseous species capable of depositing a layer onto the substrate when formed into a plasma, with a second gaseous species capable of etching the substrate when formed into a plasma, thereby forming a gaseous mixture; forming the gaseous mixture into a plasma; and exposing a surface of the substrate to the plasma, wherein the surface is etched and a layer is deposited on at least a portion of the etched surface substantially simultaneously, thereby forming the nanostructure. The substrate can be a (co)polymeric material, an inorganic material, an alloy, a solid solution, or a combination thereof.
    Type: Application
    Filed: November 17, 2016
    Publication date: March 9, 2017
    Inventors: Moses M. David, Ta-Hua Yu, Daniel S. Bates, Jayshree Seth, Michael S. Berger, Carsten Franke, Sebastian F. Zehentmaier
  • Publication number: 20160141149
    Abstract: A method and apparatus for enhancing a cognitive ability of a user may comprise: conducting, via a user interface display of a user computing device, a training session which may comprise: presenting a transportation routing network having a source of travelers and a respective unique destination for each traveler and a path from the source to the respective unique destination, each path comprising at least one direction modification element operable by the user to correctly direct the traveler from the source to the respective unique destination; displaying to the user a traveler moving along a path from the source to the at least one direction modification element; allowing the user to control the position of the at least one direction modification element so as to direct the traveler from the source to the respective unique destination.
    Type: Application
    Filed: July 23, 2014
    Publication date: May 19, 2016
    Inventors: Moses M. David, Ta-Hua Yu, Daniel S. Bates, Jayshree Seth, Michael S. Berger, Carsten Franke, Sebastian F. Zehentmaier