Patents by Inventor Daniel S. Mackin

Daniel S. Mackin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6525009
    Abstract: An aqueous alkaline cleaning composition for efficient removal of Mo, Cu, W, or Cu/Ni-based conductive paste residue from screening masks, associated screening equipment and the like by using alkali metal salt and/or tetramethyl ammonium salt of polyacrylic acid, acrylic acid-methacrylic acid co-polymer, polyaspartic acid, polylactic acid, poly(acrylic acid-co-maleic anhydride), poly(maleic acid), with excess alkali for pH adjustment in the range of about 11.5-13.5, and a surfactant which may be a medium foam, low foam or no-foam surfactant, and is preferably an amphoteric and/or non-ionic and/or ionic surfactant.
    Type: Grant
    Filed: December 7, 2000
    Date of Patent: February 25, 2003
    Assignee: International Business Machines Corporation
    Inventors: Krishna G. Sachdev, Glenn A. Pomerantz, Daniel S. Mackin
  • Publication number: 20020072482
    Abstract: An aqueous alkaline cleaning composition for efficient removal of Mo, Cu, W, or Cu/Ni-based conductive paste residue from screening masks, associated screening equipment and the like by using alkali metal salt and/or tetramethyl ammonium salt of polyacrylic acid, acrylic acid-methacrylic acid co-polymer, polyaspartic acid, polylactic acid, poly(acrylic acid-co-maleic anhydride), poly(maleic acid), with excess alkali for pH adjustment in the range of about 11.5-13.5, and a surfactant which may be a medium foam, low foam or no-foam surfactant, and is preferably an amphoteric and/or non-ionic and/or ionic surfactant.
    Type: Application
    Filed: December 7, 2000
    Publication date: June 13, 2002
    Inventors: Krishna G. Sachdev, Glenn A. Pomerantz, Daniel S. Mackin
  • Patent number: 6351871
    Abstract: This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.
    Type: Grant
    Filed: June 17, 1999
    Date of Patent: March 5, 2002
    Assignee: International Business Machines Corporation
    Inventors: Krishna G. Sachdev, John T. Butler, Michael E. Cropp, Donald W. DiAngelo, John F. Harmuth, James N. Humenik, John U. Knickerbocker, Daniel S. Mackin, Glenn A. Pomerantz, David E. Speed, Candace A. Sullivan, Bruce E. Tripp, James C. Utter
  • Patent number: 6280527
    Abstract: This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.
    Type: Grant
    Filed: June 12, 1998
    Date of Patent: August 28, 2001
    Assignee: International Business Machines Corporation
    Inventors: Krishna G. Sachdev, John T. Butler, Michael E. Cropp, Donald W. DiAngelo, John F. Harmuth, James N. Humenik, John U. Knickerbocker, Daniel S. Mackin, Glenn A. Pomerantz, David E. Speed, Candace A. Sullivan, Bruce E. Tripp, James C. Utter
  • Patent number: 6032683
    Abstract: A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.
    Type: Grant
    Filed: February 26, 1999
    Date of Patent: March 7, 2000
    Assignee: International Business Machines Corporation
    Inventors: Jon A. Casey, Michael E. Cropp, Donald W. DiAngelo, John F. Harmuth, John U. Knickerbocker, David C. Long, Daniel S. Mackin, Glenn A. Pomerantz, Krishna G. Sachdev, David E. Speed, Candace A. Sullivan, Robert J. Sullivan, Bruce E. Tripp, James C. Utter
  • Patent number: 5927193
    Abstract: An apparatus and method is provided for vacuum screen printing a greensheet having vias and both vias and open areas whereby vacuum leakage in the apparatus is minimized and avoids bowing of the screen over the open area of the greensheet. An interposer apparatus is provided comprising at least two layers having vertical through openings in registration with the via openings of the greensheet and screen. The interposer also comprises vertical through openings communicating with the open area of the greensheet and with vent channels of the interposer. A porous membrane is also used either alone or in conjunction with the interposer to provide enhanced screening results.
    Type: Grant
    Filed: October 16, 1997
    Date of Patent: July 27, 1999
    Assignee: International Business Machines Corporation
    Inventors: James G. Balz, Cynthia J. Calli, Jon A. Casey, David C. Long, Daniel S. Mackin, Keith C. O'Neil, Brenda L. Peterson, Glenn A. Pomerantz
  • Patent number: 5916374
    Abstract: A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.
    Type: Grant
    Filed: February 9, 1998
    Date of Patent: June 29, 1999
    Assignee: International Business Machines Corporation
    Inventors: Jon A. Casey, Michael E. Cropp, Donald W. DiAngelo, John F. Harmuth, John U. Knickerbocker, David C. Long, Daniel S. Mackin, Glenn A. Pomerantz, Krishna G. Sachdev, David E. Speed, Candace A. Sullivan, Robert J. Sullivan, Bruce E. Tripp, James C. Utter
  • Patent number: 5635000
    Abstract: The present invention relates generally to a new apparatus and method for screening using electrostatic adhesion. More particularly, the invention encompasses an apparatus that uses an electrostatic charge during the screening process for a semiconductor substrate. Basically, a backing layer is adhered to a green ceramic sheet using an electrostatic charge, while the green ceramic sheet is processed.
    Type: Grant
    Filed: December 22, 1995
    Date of Patent: June 3, 1997
    Assignee: International Business Machines Corporation
    Inventors: Jon A. Casey, Cynthia J. Calli, Darren T. Cook, David B. Goland, John U. Knickerbocker, Mark J. LaPlante, David C. Long, Daniel S. Mackin, Kathleen M. McGuire, Keith C. O'Neil, Kevin M. Prettyman, Michael T. Puchalski, Joseph C. Saltarelli, Candace A. Sullivan