Abstract: Pattern matching technology is used to find locations in mask data that are available for later processes, such as marking. These locations are found using pattern definitions. A match algorithm outputs locations that match the pattern definitions. Each pattern definition may include multiple marks. The patterns can be symmetrical or asymmetrical and the marks can be correctly placed during a marking step by using orientation information determined during the pattern matching process. Large area geometries may be located by a two-step process that generates a pattern definition by defining smaller patterns therein and by defining the spatial relationships of the smaller patterns. An additional correlation step results in high accuracy while minimizing computing resources.

Abstract: Mask data is analyzed for the presence of a notch. A notch candidate on a polygon boundary of mask data is defined as a plurality of line segments that includes an initial line segment, a final line segment and at least one line segment therebetween. The initial and final line segments define adjacent edges of the notch candidate and have an angle therebetween within a defined range. A direction of each line segment is a direction of travel from the initial line segment to the final line segment. A plurality of conditions is applied to the plurality of line segments and the direction of travel, and the notch candidate is a notch when all conditions are satisfied. The notch may be removed from the data before mask writing.

Abstract: Mask data is analyzed for the presence of a notch. A notch candidate on a polygon boundary of mask data is defined as a plurality of line segments that includes an initial line segment, a final line segment and at least two line segments therebetween. The initial and final line segments define adjacent edges of the notch candidate and have an angle therebetween within a defined range. A direction of each line segment is a direction of travel from the initial line segment to the final line segment. A plurality of conditions is applied to the plurality of line segments and the direction of travel, and the notch candidate is a notch when all conditions are satisfied. The notch may be removed from the data before mask writing.

Abstract: Fractured mask data in variable shape beam format is verified. The fractured mask data and unfractured design data from which the fractured mask data was generated is received, as is at least one control parameter related to the fractured mask data. A filter algorithm is performed with the at least one control parameter as an input. The filter algorithm identifies at least one error in the fractured mask data as compared to the unfractured design data other than approximation differences resulting from a fracture algorithm used to generate the fractured mask data. The at least one error includes an edge shift in the fractured mask data as compared to the unfractured design data that is smaller than a defined value, such as the maximum skew value in certain examples.