Abstract: A gas flow control showerhead with integrated characterized restrictions for a gas delivery system. An input distribution disk with a plurality of inputs is fluidly coupled to a plurality of conduits each conduit exhausting a process gas to the input distribution disk from a controllable pressure regulator in a gas box. A plurality of restriction flow paths is formed by one or more stacked triples of plenum disks, restriction disks, and outlet diffuser disks that are grouped with each group providing a pressure drop used in control of a mass flow rate of a process gas. Each outlet diffuser disk having a plurality of outputs distributed around different locations of the outlet diffuser disks exhausting the process gases for application to a wafer being processed within a process chamber at designated mass flow rates.

Abstract: A mass flow controller (MFC) has a standard envelope with an enclosure and a corresponding base. A pressure transducer is communicatively coupled to a process gas in a proportional inlet valve without being physically coupled to the base. The space formerly occupied by the pressure transducer is available for additional component integration, or reduction of the standard envelope size. A second pressure transducer is located remotely and shared by multiple MFCs. A relief valve can quickly relieve a P1 pressure of a P1 volume of process gas. A first laminar flow element (LFE) and a second LFE and in series high conductance valve configured in parallel to produce a wide-range MFC that maintains accuracy.

Abstract: A wave generation component during an off cycle when the on-off valve is closed to build pressure from the process gas in an accumulation volume. During an on cycle when the on-off valve is open the wave generation component releases the process gas according to a time constant. A flow restrictor installed downstream in a throat of the on-off valve, outputs the rapid square waves to the conduit at a predefined magnitude. The flow restrictor is selected to have an impedance that is high enough to significantly raise the time constant during the on cycle such that pressure decay in each square wave pulse over the on cycle decreases to within a tolerance, wherein the time constant is at least in part a function of the flow restrictor impedance.

Abstract: In one embodiment, a control apparatus for delivery of a process gas includes an inlet conduit; a valve operably coupled to the inlet conduit and alterable between an open condition and a closed condition, the valve having a first conductance and being downstream of the inlet conduit; a characterized restrictor operably coupled to the valve, the characterized restrictor having a second conductance and being downstream of the valve; and an outlet conduit operably coupled to the characterized restrictor and being downstream of the characterized restrictor; wherein a ratio of the first conductance to the second conductance is 10:1 or higher.

Abstract: A reverse flow mode depressurizes process gas from an accumulated volume in an MFC or other gas delivery apparatus for faster pressure bleed down when transitioning to lower internal pressures. For example, a semiconductor process receiving nitrogen gas at a certain mass flow rate can require a reduction of apparatus internal pressure in order to quickly reduce the mass flow rate. During the reverse flow mode, a gas supply valve is closed and an upstream purge valve is opened to reduce pressure upstream of a proportional valve. Also, the proportional valve is further opened for decreasing target pressure quickly.

Abstract: A gas delivery apparatus to overcome the shortcomings of the prior art by evacuating process gas upstream of a pressurized volume with a reverse flow mode.

Abstract: A flow node includes characterized restrictor in series and adjacent with a valve to provide a primary flow restriction with a minimized volume between the two. A conductance of the characterized restrictor is low enough relative to the valve seat to cause a pressure drop that is sufficiently large relative to the pressure drop across the valve seat that a pressure measurement device is located upstream of the valve is used to determine the pressure to the inlet of the restrictor. A vent can be included to reduce bleed time. Multiple flow nodes in parallel increase a dynamic range.

Abstract: A flow node includes characterized restrictor in series and adjacent with the valve seat to provide a primary flow restriction with a minimized volume between the two. A conductance of the characterized restrictor is low enough relative to the valve seat to cause a pressure drop that is sufficiently large relative to the pressure drop across the valve seat that a pressure measurement device is located upstream of the valve seat and poppet assembly is used to determine the pressure to the inlet of the restrictor. A vent can be included to reduce bleed time. Multiple flow nodes in parallel increase a dynamic range.

Abstract: A wave generation component during an off cycle when the on-off valve is closed to build pressure from the process gas in an accumulation volume. During an on cycle when the on-off valve is open the wave generation component releases the process gas according to a time constant. A flow restrictor installed downstream in a throat of the on-off valve, outputs the rapid square waves to the conduit at a predefined magnitude. The flow restrictor is selected to have an impedance that is high enough to significantly raise the time constant during the on cycle such that pressure decay in each square wave pulse over the on cycle decreases to within a tolerance, wherein the time constant is at least in part a function of the flow restrictor impedance.

Abstract: A low flow injector controls remote delivery of low flows of gas. A higher flow carrier gas is provided by an MFC to a conduit. A remote flow restrictor is located to exhaust a critical process gas directly into the conduit. An electronic regulator controls a pressure of the critical gas responsive to a pressure point received from a controller corresponding to a desired mass flow. Also, a large flow restrictor vents the critical process gas.

Abstract: A mass flow controller (MFC) has a standard envelope with an enclosure and a corresponding base. A pressure transducer is communicatively coupled to a process gas in a proportional inlet valve without being physically coupled to the base. The space formerly occupied by the pressure transducer is available for additional component integration, or reduction of the standard envelope size. A second pressure transducer is located remotely and shared by multiple MFCs. A relief valve can quickly relieve a P1 pressure of a P1 volume of process gas. A first laminar flow element (LFE) and a second LFE and in series high conductance valve configured in parallel to produce a wide-range MFC that maintains accuracy.

Abstract: A flow restrictor with a first disk having at least one inlet and at least one outlet and a flow path and a second disk having no flow path. The first disk and the second disk being stacked together. A mass flow controller comprising with an input, an output, a flow path, a pressure transducer and the above flow restrictor.

Abstract: A flow restrictor with a first disk having at least one inlet and at least one outlet and a flow path and a second disk having no flow path. The first disk and the second disk being stacked together. A mass flow controller comprising with an input, an output, a flow path, a pressure transducer and the above flow restrictor.

Abstract: A mass flow controller is disclosed and includes body portion having a first internal passage and at least second internal passage formed therein, a flow control valve coupled to the body portion and in communication with the first and second internal passages, at least one pressure transducer coupled to the body portion and in communication with at least one of the first internal passage, the second internal passage, and the flow restrictor, a nonlinear flow restrictor configured to produce a high compressible laminar flow therethrough coupled to the second internal passage, a thermal sensor in communication with at least one of the first internal passage, the second internal passage, and the flow restrictor, and an exhaust vessel in communication with the flow restrictor.

Abstract: A fluid mass flow control apparatus, particularly useful for controlling low flow rates of fluids used in semiconductor manufacturing processes, comprises a first elongated flow tube connected to an inlet fitting and to a capsule like valve housing and a second elongated tube connected to the inlet fitting and the valve housing and including a flow sensor. The valve housing is connected to a magnetostrictive actuator including an elongated actuator member disposed in a conduit connected to the valve housing and serving as part of the fluid flow path through the apparatus. An electromagnetic coil is disposed about the conduit and the actuator and is responsive to energization to effect controlled elongation of the actuator to control the position of a valve closure member disposed in the valve housing. Adjustments to full-scale flow ranges of the apparatus may be obtained by inserting a tube or wire in the flow sensor tube to act as a flow restrictor.

Abstract: A fluid mass flow control apparatus, particularly adapted for use in controlling fluid flow to semiconductor fabrication processes, comprises a tubular body part having inlet and outlet fittings and a bore extending therethrough and supporting a valve seat in the bore. A closure member is connected to an arm which extends laterally through a tubular spigot portion of the body part. The body part has a reduced thickness wall at the spigot portion to allow elastic deflection of the wall and movement of the arm to control the position of the closure member. An elongated tube or rod actuator on which a resistance heating coil is supported is operably connected to a control system for heating the actuator to move the arm to control flow of fluid through the apparatus. A flow restrictor is mounted upstream of the valve seat and a mass flow sensor is in communication with the passage to provide a mass flow rate signal to the control system.

Abstract: Fluid mass flow meters, particularly for measuring a wide range of relatively low flow rates of gas used in semiconductor fabrication processes include a body adapted to be interposed in a purge gas line leading to or from a mass flow controller or in a process gas line with the mass flow controller. The flow meter body includes a flow restrictor interposed in a passage and plural mass flow sensors which sense overlapping full scale fluid mass flow ranges across the flow restrictor to increase the overall range of fluid mass flow rates sensed by the meter. The flow meter body may include series or parallel arranged flow restrictors, a second set of mass flow sensors, and valving to cause a set of mass flow sensors to sense fluid mass flow rates across one or both of the flow restrictors. Embodiments of the flow meter include a pressure transducer mass flow sensor and conduits arranged with additional flow restrictors therein to selectively vary the full scale measurement range of the mass flow sensor.

Abstract: A fluid mass flow control apparatus, particularly useful for controlling low flow rates of fluids used in semiconductor manufacturing processes, comprises a first elongated flow tube connected to an inlet fitting and to a capsulelike valve housing and a second elongated tube connected to the inlet fitting and the valve housing and including a flow sensor. The valve housing is connected to a magnetostrictive actuator including an elongated actuator member disposed in a conduit connected to the valve housing and serving as part of the fluid flow path through the apparatus. An electromagnetic coil is disposed about the conduit and the actuator and is responsive to energization to effect controlled elongation of the actuator to control the position of a valve closure member disposed in the valve housing. Adjustments to full-scale flow ranges of the apparatus may be obtained by inserting a tube or wire in the flow sensor tube to act as a flow restrictor.

Abstract: A fluid mass flow control apparatus, particularly adapted for use in controlling fluid flow to semiconductor fabrication processes, comprises a tubular body part having inlet and outlet fittings and a bore extending therethrough and supporting a valve seat in the bore. A closure member is connected to an arm which extends laterally through a tubular spigot portion of the body part. The body part has a reduced thickness wall at the spigot portion to allow elastic deflection of the wall and movement of the arm to control the position of the closure member. An elongated tube or rod actuator on which a resistance heating coil is supported is operably connected to a control system for heating the actuator to move the arm to control flow of fluid through the apparatus. A flow restrictor is mounted upstream of the valve seat and a mass flow sensor is in communication with the passage to provide a mass flow rate signal to the control system.

Abstract: A mass fluid flow controller has a valve which is controlled by a controller rod structure which is substantially pivotally mounted on a metallic diaphragm which stretches and unstretches with the movement of the rod structure. In the relationship between the controller rod structure and a ball which acts as a gate-member for the valve, an elongated stem rod having a sleeve about it may be used in fixing the ball to the controller rod structure. The stem rod may be mounted by fixing it to the elongated sleeve, a distance from the gate-member side of the controller rod structure that is substantially greater than the distance of the position of the ball from the gate-member side of the controller rod structure.